公开(公告)号：WO0156056A3

公开(公告)日：2002-01-31

申请号：PCT/EP0100857

申请日：2001-01-26

Applicant: INTEGRATED CIRCUIT TESTING ,  ADAMEC PAVEL

Inventor： ADAMEC PAVEL

IPC: G01Q70/10 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J37/10 ,  H01J29/66 ,  H01J37/14 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/141 ,  H01J37/28

Abstract: The present invention provides an improved objective lens for a charged particle beam device. The objective lens comprises a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.

Abstract translation: 本发明提供了一种用于带电粒子束装置的改进的物镜。 物镜包括磁性透镜，其产生用于将带电粒子束聚焦到样本上的第一磁场。 此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。 由此，第二磁场被引导通过磁性透镜的极片中的至少一个。 本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。

公开(公告)号：WO2023061650A1

公开(公告)日：2023-04-20

申请号：PCT/EP2022/073948

申请日：2022-08-29

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： EHBERGER, Dominik ,  BREUER, John ,  FIRNKES, Matthias

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: A method of determining a beam convergence of a charged particle beam (11) focused by a focusing lens (120) toward a sample H O) in a charged particle beam system ( 100) is provided. The 'method includes (a) taking one or more images of the sample when the sample is arranged at one or 'more defocus distances from a 'respecti ve beam focus of the charged particle beam.; (b) retrieving one or more beam, cross sections from 'the one or more images; (c) determining one or more beam widths from the one or more beam, cross sections; and (d.) calculating at least one beam convergence value based on the one or more beam widths and the one or more defocus distances. Further, a charged panicle beam system for imaging and or inspecting a sample that is configured for any of the methods described herein is provided.

公开(公告)号：WO2022144143A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/084013

申请日：2021-12-02

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： BREUER, John ,  DROESE, Christian

IPC: H01J37/244

Abstract: It is provided a current measurement module (100) for measuring a current of a primary charged particle beam (123) of a charged particle beam device, the current measurement module (100) including a detection unit (160) configured for detecting secondary and/or backscattered charged particles (127) released on impingement of the primary charged particle beam (123) on a conductive surface (142) of a beam dump (140) of the charged particle beam device.

公开(公告)号：WO2021233583A1

公开(公告)日：2021-11-25

申请号：PCT/EP2021/055854

申请日：2021-03-09

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： WINKLER, Dieter ,  WÖLLERT, Bernd ,  SCHABINGER, Birgit

IPC: H01J37/04 ,  H01J37/244

Abstract: A charged particle beam device 10 for imaging and/or inspecting a sample 140 is described. The charged particle beam device includes a beam emitter 150 for emitting a primary charged particle beam 105, the charged particle beam device adapted for guiding the primary charged particle beam along an optical axis 101 to the sample for releasing signal particles; a retarding field device 100 for retarding the primary charged particle beam before impinging on the sample, the retarding field device including an objective lens 110 and a proxy electrode 130, wherein the proxy electrode includes an opening 131 allowing a passage of the primary charged particle beam and of the signal particles; a first detector 120 for off-axial backscattered particles between the proxy electrode and the objective lens; and a pre-amplifier 121 for amplifying a signal of the first detector, wherein the pre-amplifier is at least one of (i) integrated with the first detector, (ii) arranged adjacent to the first detector inside a vacuum housing 102 of the charged particle beam device, and (iii) fixedly mounted in a vacuum chamber of the charged particle beam device. Further, a method for imaging and/or inspecting a sample with a charged particle beam device is described.

公开(公告)号：WO2021110449A1

公开(公告)日：2021-06-10

申请号：PCT/EP2020/083036

申请日：2020-11-23

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： COOK, Benjamin John ,  HORGAN, Eoin

IPC: H01J37/04

Abstract: A beam blanking device for a multi-beamlet charged particle beam apparatus is provided. The beam blanking device includes a first blanking unit, a second blanking unit and a third blanking unit. The first blanking unit includes a first blanking electrode and a first aperture. The second blanking unit includes a second blanking electrode and a second aperture. The third blanking unit includes a third blanking electrode and a third aperture. The beam blanking device includes a common electrode forming a first counter electrode for the first blanking electrode, a second counter electrode for the second blanking electrode and a third counter electrode for the third blanking electrode. The first blanking unit, the second blanking unit and the third blanking unit are arranged in a planar array and define a plane of the planar array. The first blanking electrode is arranged for generating a first electric field between the first blanking electrode and the common electrode in the first aperture for deflecting a first beamlet of the multi-beamlet charged particle beam apparatus into a first deflection direction. The second blanking electrode is arranged for generating a second electric field between the second blanking electrode and the common electrode in the second aperture for deflecting a second beamlet of the multi-beamlet charged particle beam apparatus into a second deflection direction. The third blanking electrode is arranged for generating a third electric field between the third blanking electrode and the common electrode in the third aperture for deflecting a third beamlet of the multi-beamlet charged particle beam apparatus into a third deflection direction. A dividing plane intersecting the planar array separates the first blanking unit from the second blanking unit and the third blanking unit, wherein the first deflection direction, the second deflection direction and the third deflection direction point away from the dividing plane.

公开(公告)号：WO2021099105A1

公开(公告)日：2021-05-27

申请号：PCT/EP2020/080793

申请日：2020-11-03

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： FIRNKES, Matthias ,  LAMPERSBERGER, Florian ,  LANIO, Stefan

IPC: H01J37/02 ,  H01J37/244

Abstract: A secondary charged particle imaging system comprising: a backscattered electron detector module, wherein the backscattered electron detector module is rotatable between a first angular position (5452) and a second angular position (5454) about an axis.

公开(公告)号：WO2021073811A1

公开(公告)日：2021-04-22

申请号：PCT/EP2020/075388

申请日：2020-09-10

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： COOK, Benjamin John

IPC: H01J37/153

Abstract: The charged particle beam device (100) includes a charged particle source (105) and a beamlet-forming multiaperture plate (110). The device also includes a precompensator (120) for reducing aberrations of the beamlets at a target, a scanner for scanning each of the beamlets, an objective lens (109) for focusing each beamlet onto the target, and a controller configured to synchronize the precompensator and the scanner. The precompensator includes: at least one "radially variable" multiaperture electrode (121) in which the diameter of each aperture thereof scales with the distance of the aperture from the optical axis, z; and at least one "cartesianally variable" multiaperture electrode (122) in which the diameter of each aperture thereof scales with an x component of the position of the aperture.

公开(公告)号：WO2020164872A1

公开(公告)日：2020-08-20

申请号：PCT/EP2020/051493

申请日：2020-01-22

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： COOK, Benjamin John ,  WINKLER, Dieter ,  SCHMID, Ralf

IPC: H01J37/147 ,  H01J37/28

Abstract: A method of operating a charged particle beam device is disclosed, including passing each of a plurality of beamlets through a deflector (6) and a scanner (12), in that order. Each of the beamlets is focused with an objective lens on a sample to form a plurality of focal spots, forming an array. A first beamlet (4A) is focused on a first spot (40A) and a second beamlet (4D) is focused on a second spot (40D). In a centered configuration of the device, each of the plurality of beamlets is directed by the deflector toward a coma free point (100). In a beamlet-displaced configuration of the device, the scanner is scanned such that the first beamlet passes through an acceptable aberrations point (105), the first beamlet scanning a displaced first field of view; and the first spot is displaced from the regular first focal spot to a displaced first focal spot (45A).

公开(公告)号：WO2005071708A3

公开(公告)日：2005-12-08

申请号：PCT/EP2005000598

申请日：2005-01-21

Applicant: INTEGRATED CIRCUIT TESTING ,  FEUERBAUM HANS-PETER

Inventor： FEUERBAUM HANS-PETER

IPC: H01J37/12 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/12

Abstract: The present invention relates to a focussing lens (100) for focussing a charged particle beam (7) onto a specimen (3) at a predetermined landing angle (42; 42'; 42) comprising at least one first electrode (26, 105, 105a) having a first aperture (106) to generate a focussing electric field (110) for focussing the charged particle beam (7) onto the specimen (3); and a correcting electrode having a curved surface (115) to compensate for landing angle dependent distortions of the focussing electric field (110) caused by the specimen (3). With the curved surface (115) of the correcting electrode it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.

Abstract translation: 本发明涉及一种用于以预定的着陆角（42; 42'; 42）将带电粒子束（7）聚焦到样本（3）上的聚焦透镜（100），包括至少一个第一电极（26,105， 105a）具有第一孔径（106）以产生用于将带电粒子束（7）聚焦到样本（3）上的聚焦电场（110）; 以及具有弯曲表面（115）的校正电极，用于补偿由样本（3）引起的聚焦电场（110）的着落角度相关的失真。 利用校正电极的弯曲表面（115），可以改善与垂直着陆角不同的着陆角的带电粒子束的聚焦。

公开(公告)号：WO2005071709A2

公开(公告)日：2005-08-04

申请号：PCT/EP2004/014180

申请日：2004-12-13

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Juergen

Inventor： FROSIEN, Juergen

IPC: H01J37/15

CPC classification number: H01J37/14 ,  H01J37/12 ,  H01J37/15 ,  H01J2237/1501

Abstract: The present invention relates to a beam optical component including a charged particle lens (1; 1000) for focusing a charged particle beam (3), the charged particle lens (1; 1000) comprising a first element (5; 1005) having a first opening (7) for focusing the charged particle beam (3); a second element (9; 1009) having a second opening (11) for focusing the charged particle beam (3); and first driving means (13) connected with at least one of the first element (5; 1005) and the second element (9; 1009) for aligning the first opening (7) with respect to the second opening (11). With the first driving means, the first opening (7) and the second opening (11) can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focussing. The present invention also relates to a charged particle beam device that uses said beam optical component for focussing the charged particle beam (3), and a method to align first opening (7) and second opening (11) with respect to each other.

Abstract translation: 本发明涉及一种束光学部件，其包括用于聚焦带电粒子束（3）的带电粒子透镜（1; 1000），所述带电粒子透镜（1; 1000）包括具有第一元件（5; 1005）的第一元件 用于聚焦带电粒子束（3）的开口（7）; 具有用于聚焦带电粒子束（3）的第二开口（11）的第二元件（9; 1009）; 以及与所述第一元件（5; 1005）和所述第二元件（9; 1009）中的至少一个连接的用于使所述第一开口（7）相对于所述第二开口（11）对准的第一驱动装置（13）。 利用第一驱动装置，在光束操作期间，第一开口（7）和第二开口（11）可以相对于彼此对准，以提供光束光学部件的优良对准以实现更好的光束聚焦。 本发明还涉及使用所述光束光学部件来聚焦带电粒子束（3）的带电粒子束装置，以及使第一开口（7）和第二开口（11）相对于彼此对准的方法。