Abstract:
본발명의적외선검출기는적외선을감지하여전류신호를출력하는마이크로볼로미터셀이 N개의열 및 M개의행 (N X M, 여기서 N 및 M은 2 이상의정수) 형태로배열된셀 어레이; 및상기 N개의열 각각에대해서적분기를포함하는, 적분회로를포함하며, 상기 M개의행 중두 개이상의행에포함된상기마이크로볼로미터셀로부터의전류신호가각각의적분기를통해서동시에읽기될수 있다.
Abstract translation:本发明的红外检测器包括: 以通过感测红外线输出电流信号的微热辐射计单元布置的单元阵列具有N列和M行(N X M,N和M是2或更大的整数); 以及包括用于N列中的每一列的积分器的积分电路。 M行中包含在两行以上的微热电池单元的当前信号可以同时通过各积分器读取。
Abstract:
The present invention relates to a radio frequency (RF) distortion signal measurement device for measuring an output distortion signal of a power amplifier, a wireless power amplification device including the same, and an RF distortion signal measurement method. The RF distortion signal measurement device for measuring an output distortion signal of a power amplifier having non-linear characteristics comprises a multiplier multiplying an output signal of the power amplifier by an input signal of the power amplifier; and a filter filtering the output signal of the multiplier.
Abstract:
The present invention relates to a method for fabricating a MEMS device that has an excellent etching selectivity with respect to various types of inorganic materials, is better in performance and shape than existing MEMS devices because the thickness of a film can be easily adjusted depending on devices, allows the use of existing semiconductor processes, and uses an amorphous carbon film as a sacrificial layer, including a step for forming a lower structure; a step for forming the amorphous carbon film as the sacrificial layer on the lower structure; a step for forming an insulating supporting layer on the amorphous carbon film; a step for forming an etching protection film on the insulating supporting layer, performing a single photolithography process, etching the insulating supporting layer and the amorphous carbon film at a time, and forming via holes which expose the lower structure through the insulating supporting layer and the amorphous carbon film; a step for forming an upper structure that has a sensor structure on the insulating supporting layer; a step for forming one or more through-holes through the insulating supporting layer; and a step for entirely removing the amorphous carbon film through the through-holes so that the lower structure and the upper structure are arranged apart from each other. The sensor structure is formed within a temperature section of 250°C to 450°C.
Abstract:
본 발명은 웨이퍼기판에 대하여 수직(vertical) 또는 수평(lateral) 방향으로 가진(driving)하며 수직(vertical) 또는 수평(lateral) 방향으로 감지(sensing)하는, 높은 생산성을 갖는 멤즈 기반의 자이로스코프(gyroscope)에 관한 것으로서, 바닥 웨이퍼기판에 평행하게 배치되는 프레임;과, 가진모드에서, 상기 프레임과 함께 1자유도로 가진되고, 감지모드에서, 상기 프레임에 외부의 각속도가 입력될 때 코리올리힘에 의해 2자유도로 감지되는 센서질량체;와, 상기 센서질량체에 의한 2자유도의 각 감지변위를 측정하는 적어도 2개의 감지전극; 및 상기 센서질량체와 상기 프레임을 연결하고 상기 센서질량체가 2자유도의 각 감지변위를 갖도록 허용하는 적어도 2개의 센서질량체 지지스프링을 포함하는 것을 특징으로 한다.
Abstract:
PURPOSE: A method for manufacturing a flexible device and the flexible device are provided to maintain a flexible substrate with a high alignment by bonding the flexible device to the flexible substrate after the flexible device is manufactured on a silicon substrate. CONSTITUTION: A silicon-on-insulator includes a bottom silicon layer, an insulation layer (200), and a top silicon layer (100). A device (300) is arranged on the top silicon layer. A second silicon substrate is bonded to the top silicon layer through a bonding layer. The bottom silicon layer is removed. The top silicon layer is transferred on a flexible substrate (600) by using the second silicon substrate. A passivation layer is laminated on the flexible substrate.
Abstract:
PURPOSE: An infrared sensor chip, an infrared sensor, and an operating method and testing method thereof are provided to reduce costs for manufacturing the infrared sensor and developing the same and to improve a yield for monitoring a process. CONSTITUTION: An infrared sensor chip comprises a CMOS(Complementary Metal-Oxide Semiconductor) circuit board(110) and a bolometer(120). The CMOS circuit board is composed of an active matrix(111), a low line selecting unit, and an output multiplexer unit. The bolometer is laminated on the CMOS circuit board and composed of an active cell and a reference cell. The low line selecting unit selects a cell among the cells of the bolometer for a parametric test with respect to the bolometer of a wafer or a chip state. A voltage is applied to the selected cell. The output multiplexer unit output current properties according to the application of the voltage. [Reference numerals] (111,BB) Active matrix + SA + ADC; (120,AA) Infrared sensor; (200) Sa-FPA controller(SA/ADC/SP controller); (CC) ISP/Controller; (DD) Infrared sensor in prior art; (EE) Infrared sensor in the present invention
Abstract:
PURPOSE: An infrared sensor using a Sa-FPA(Semi-Active Focal Plane Array) and a method for manufacturing the same are provided to inspect an operation state of the sensor in advance and to enhance chip density. CONSTITUTION: An infrared sensor using a Sa-FPA comprises a switching unit(310), a wiring routing unit(320), an ROIC(Readout Integrate Circuits) connection pad unit(330), an infrared sensor(400), an address control logic unit(300), and an ROIC chip. The switching unit is formed on a circuit substrate in advance. The wiring routing unit is formed on the circuit substrate in advance and routes electrical signals by being connected to the switching unit. The ROIC connection pad unit is formed on the circuit substrate and connected to the wiring routing unit. The infrared sensor is connected to the switching unit formed in advance by using a monolithic method. The address control logic unit is formed on the circuit substrate in advance and controls the switching unit and the wiring routing unit so that the infrared sensor generates electrical signals by sensing the infrared rays. The ROIC chip is independently manufactured and comprises a sensor chip connection pad unit being connected to the ROIC connection pad, thereby reading the electrical signals generated by the infrared sensor. [Reference numerals] (300) Address control logic unit; (310) Switching unit; (320) Wiring routing unit; (330) ROIC connection pad unit; (400) Infrared sensor