公开(公告)号：DE3678358D1

公开(公告)日：1991-05-02

申请号：DE3678358

申请日：1986-07-30

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  KOCH HORST DR ,  SCHULZ GUENTHER DR ,  BOETTCHER ANDREAS DR ,  LOERZER THOMAS DR

IPC: C08F2/48 ,  G03F7/038

公开(公告)号：DE3924299A1

公开(公告)日：1991-01-31

申请号：DE3924299

申请日：1989-07-22

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR

IPC: G03F7/004 ,  C07C381/12 ,  C07D309/12 ,  C08F2/50 ,  G03F7/028 ,  G03F7/029 ,  G03F7/039

公开(公告)号：DE3860981D1

公开(公告)日：1990-12-13

申请号：DE3860981

申请日：1988-05-13

Applicant: BASF AG

Inventor： ALDAG REINHARD DR ,  NEUMANN PETER DR ,  BOETTCHER ANDREAS DR ,  BLUEMEL THOMAS DR ,  SEITZ FRIEDRICH DR

IPC: G03C1/00 ,  B41N1/14 ,  C07D239/91 ,  G03F7/004 ,  G03F7/031 ,  G03F7/105 ,  G03F7/26

Abstract: Photopolymerisable recording materials with at least one photopolymerisable, olefinically unsaturated organic compound, if appropriate a polymeric binder, a photopolymerisation initiator, a colour-forming system of a colour former and a photo-oxidising agent, a sensitiser and, if appropriate, further additives and/or auxiliaries contain certain quinazol-4-one compounds as sensitiser. … These photopolymerisable recording materials are particularly suitable for producing photoresist layers and planographic printing plates.

公开(公告)号：DE3844443A1

公开(公告)日：1990-07-05

申请号：DE3844443

申请日：1988-12-31

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS DR ,  HENKELMANN JOCHEM DR

IPC: C07B61/00 ,  C07C68/02 ,  C07C69/96 ,  C07C225/22 ,  C07C253/30 ,  C07C255/56 ,  C07C323/22 ,  C07D311/86 ,  C07D335/16

公开(公告)号：DE3834029A1

公开(公告)日：1990-04-12

申请号：DE3834029

申请日：1988-10-06

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS DR

IPC: B01J31/02 ,  C07B61/00 ,  C07C45/64 ,  C07C45/71 ,  C07C49/84

公开(公告)号：DE3820463A1

公开(公告)日：1989-12-21

申请号：DE3820463

申请日：1988-06-16

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS DR ,  REHMER GERD DR

IPC: B01J31/02 ,  C07B61/00 ,  C07C267/00 ,  C07C269/02 ,  C07C271/42 ,  C07C271/48 ,  C08F4/32 ,  C08F20/36 ,  C08F220/18 ,  C08G18/00

公开(公告)号：DE3817010A1

公开(公告)日：1989-11-30

申请号：DE3817010

申请日：1988-05-19

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

公开(公告)号：DE3721741A1

公开(公告)日：1989-01-12

申请号：DE3721741

申请日：1987-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/10 ,  C08L61/04 ,  C08L25/18

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：DE3717034A1

公开(公告)日：1988-12-08

申请号：DE3717034

申请日：1987-05-21

Applicant: BASF AG

Inventor： ALDAG REINHARD DR ,  NEUMANN PETER DR ,  BOETTCHER ANDREAS DR ,  BLUEMEL THOMAS DR ,  SEITZ FRIEDRICH DR

IPC: G03C1/00 ,  B41N1/14 ,  C07D239/91 ,  G03F7/004 ,  G03F7/031 ,  G03F7/105 ,  G03F7/26 ,  G03C1/72 ,  G03C1/68 ,  G03F7/10

Abstract: Photopolymerisable recording materials with at least one photopolymerisable, olefinically unsaturated organic compound, if appropriate a polymeric binder, a photopolymerisation initiator, a colour-forming system of a colour former and a photo-oxidising agent, a sensitiser and, if appropriate, further additives and/or auxiliaries contain certain quinazol-4-one compounds as sensitiser. … These photopolymerisable recording materials are particularly suitable for producing photoresist layers and planographic printing plates.