中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

82 records (took 0.02 seconds)

    61.
    发明专利
    未知

    公开(公告)号：DE3817012A1

    公开(公告)日：1989-11-30

    申请号：DE3817012

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/023 ,  C08F8/00 ,  C08F12/22 ,  C08G8/28 ,  C08G8/36 ,  C08K5/372 ,  C08L25/18 ,  C08L61/08 ,  C09D125/18 ,  C09D161/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to positive-and negative-working radiation-sensitive mixtures and to processes for the formation of relief patterns. The radiation-sensitive mixtures contain a polymeric binder and an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid, and one additional grouping which forms a strong acid under the action of radiation, the polymeric binders used being reaction products of polymers containing phenolic hydroxyl groups with dihydropyran or alkyl vinyl ethers. These radiation-sensitive mixtures are particularly suitable for the formation of relief patterns.

    63.
    发明专利
    未知

    公开(公告)号：AT360656T

    公开(公告)日：2007-05-15

    申请号：AT03002773

    申请日：2003-02-07

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  HEISCHKEL YVONNE DR ,  WEISS HORST DR

    IPC: C07F5/02 ,  C08G61/02 ,  C09K11/06 ,  H01L51/30 ,  H01L51/50 ,  H01B1/12 ,  H05B33/14

    Abstract: Polymers with fluoranthene-based repeat units are new. Polymers containing repeat units of formula (I) are new. a = 0-3; R1-R3 = H, 1-20C alkyl, (optionally with one or more Si, N, P, O or S atoms), 6-30C (preferably 6-14C) aryl, 4-14C heteroaryl with at least one S or N atom, -N(6-14C aryl)2 or the group Y1; Y1 = vinyl, (E)- or (Z)-phenylethenyl, (meth)acryloyl, methyl styryl, vinyloxy, glycidyl, phenylethynyl or the group -Phe-O-Y2; Phe = 1,4-phenylene; Y2 = vinyl, (E)- or (Z)-phenyl-ethenyl, (meth)acryloyl, methyl styryl, vinyloxy or glycidyl, optionally with one or more groups Y1 or Y2 crosslinked together. Independent claims are also included for: (1) a method (M1) for the production of (I) from monomers of formula (II) by reaction in the presence of nickel or palladium compounds (2) monomers of formula (II) with a halogen or esterified sulfonate group on ring C (preferably at position 8 of the fluoranthene system) and a boron-containing group (c) (see below) on ring B (preferably at position 3) (i.e. monomers III) (3) a method for the preparation of (III) from the corresponding compounds with halogen or sulfonate groups, by metalation with at least 2 or at least 4 equivalents of a strong organometallic base followed by reaction with 1 or 2 equivs. of boron compounds of formula (V) (4) a method (M2) for the production of (I) by the photochemical or thermal polymerisation of monomers of formula (II) with no X1 or X2 groups (i.e. monomers VI) (5) films containing or consisting of (I) (6) organic electro luminescent diodes based on (I). X1, X2 = (a) halogen, (b) esterified sulfonate, or (c) boron-containing groups of formula -B(O-(C(R6)2)n)-O-), using either one monomer of formula (II) in which X1 is a group (a) or (b) and X2 is (c), or at least two different monomers (II), one of which has two (a) and two (b) groups, or one of each, and the other monomer has two groups (c), with (a + b) and (c) in a mol ratio of (0.8:1)-(1.2:1) ; R6 = H or 1-20C alkyl; n = 2-10; X5 = 1-6C alkoxy.

    64.
    发明专利
    未知

    公开(公告)号：DE59209708D1

    公开(公告)日：1999-07-15

    申请号：DE59209708

    申请日：1992-10-24

    Applicant: BASF AG

    Inventor： BINDER HORST ,  SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: The invention relates to a positive UV-radiation sensitive composition comprising (a1) an organic binder containing acid-labile ether, ester or carbonate groups, or (a2) a water-insoluble polymeric binder soluble in aqueous alkaline solutions and (a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid, or (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid and which contains at least one group cleavable by acid and additionally a group which forms an acid under the influence of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and b) an arylsulphonic acid ester. This radiation-sensitive composition is suitable for forming relief patterns.

Patent Agency Ranking