公开(公告)号：US08766183B2

公开(公告)日：2014-07-01

申请号：US13058712

申请日：2009-09-10

Applicant: Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

Inventor： Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

IPC: H01J3/12 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.

Abstract translation: 散光控制处理时间通过改善像散差测量精度而降低到1秒以下。 带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。 控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向， 从运动量和方向上矫正散光。

公开(公告)号：US08188451B1

公开(公告)日：2012-05-29

申请号：US12561969

申请日：2009-09-17

Applicant: Mehran Nasser-Ghodsi

Inventor： Mehran Nasser-Ghodsi

IPC: H01J1/304 ,  H01J3/12

CPC classification number: H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06341 ,  H01J2237/0653

Abstract: Contamination may be removed from an emitter tip of a field emitter during operation of the emitter tip in a system having an electron beam column having an electrode with a beam defining aperture, an electron collector located proximate to the beam defining aperture between the electrode and the field emitter, and an electron deflector located between the emitter tip and the electron collector. At regular predetermined intervals an electron beam from the emitter tip may be deflected away from a path through the beam defining aperture and onto the electron collector. An electron beam current to the electron collector may be determined and the emitter tip may be flash heated if the current to the electron collector is below a threshold.

Abstract translation: 在具有电子束列的电子束列的系统中，在发射极尖端的操作期间，可以从场致发射体的发射极尖端去除污染，电子束具有限定孔的光束，位于电极和电极之间的光束限定孔附近的电子收集器 位于发射极尖端和电子收集器之间的电子偏转器。 以规则的预定间隔，来自发射极尖端的电子束可以偏离通过光束限定孔径的路径并且到电子收集器上。 可以确定到电子收集器的电子束电流，并且如果到电子收集器的电流低于阈值，则可以将发射极尖端闪光加热。

公开(公告)号：US4795912A

公开(公告)日：1989-01-03

申请号：US15193

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/08 ,  H01J3/12 ,  H01J3/14

CPC classification number: H01J3/12 ,  G21K1/08

Abstract: A technique for compensating for chromatic aberration in particle beams, caused by differing particle energy levels when a beam is deflected for beam steering or beam focusing. A compensating deflection is applied to the beam upstream of its intended point of deflection. When the particles reach the point of deflection, the effect of the compensating deflection is proportional to the energy level of each particle, and compensates for the aberration that would normally occur. The point at which the compensating deflection is applied is selected to be one-fourth of a cycle in longitudinal phase space and an integral number of half-cycles in transverse phase space. With this critical spacing, the compensating deflection at the point of its application is proportional to relative phase in longitudinal phase space, but is proportional to energy level at the intended point of deflection.

Abstract translation: 一种用于补偿粒子束中的色差的技术，当束被偏转以用于光束转向或光束聚焦时，由不同的粒子能级引起。 在其预期的偏转点上游向梁施加补偿偏转。 当颗粒到达偏转点时，补偿偏转的影响与每个颗粒的能级成比例，并补偿通常发生的像差。 施加补偿偏转的点被选择为纵向相位空间中的周期的四分之一和横向相位空间中的半周期的整数。 利用这个临界间距，其应用点处的补偿偏转与纵向相位空间中的相对相位成比例，但与预期的偏转点处的能级成比例。

公开(公告)号：US4763003A

公开(公告)日：1988-08-09

申请号：US15208

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/087 ,  H01J3/12

CPC classification number: G21K1/087 ,  H01J3/12

Abstract: A technique for correcting spherical and other aberrations in a particle beam. Spherical aberration is caused by variations in beam behavior dependent on the cube of the radius or radial position with respect to the beam axis. To correct for such aberration, the beam is passed through multiple compensation electric field arrays, each of which has multiple rows of parallel wires stretched transversely across the beam path, the rows being biased with separate voltages to provide an electric field that varies in proportion to the cube of the distance from the central row of the array. The multiple arrays provide a cylindrically symmetrical electric field, and are oriented at a uniform angular spacing, which, for spherical aberration, is 120 degrees.

Abstract translation: 用于校正粒子束中的球面和其他像差的技术。 球面像差由取决于相对于光束轴的半径或径向位置的立方体的光束行为的变化引起。 为了校正这种像差，光束通过多个补偿电场阵列，每个阵列具有跨行束路径横向延伸的多排平行线，这些行被单独的电压偏置以提供与...成比例地变化的电场 距阵列中心行距离的立方体。 多个阵列提供圆柱对称的电场，并且以均匀的角度间隔定向，其用于球面像差为120度。

公开(公告)号：US4511980A

公开(公告)日：1985-04-16

申请号：US388936

申请日：1982-06-16

Applicant: Susumu Watanabe

Inventor： Susumu Watanabe

IPC: H01L21/027 ,  H01J37/302 ,  H01J37/317 ,  H01J3/12

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/30488 ,  H01J2237/31762 ,  H01J2237/31769

Abstract: Dot pattern data stored in the first dot pattern memory is read out by a predetermined number of successive bits at a time under the control of a microprocessor and corrected with respect to an X direction. The corrected dot pattern data is temporarily stored in a main memory. The dot pattern data stored in the main memory is then corrected with respect to a Y direction. The resultant corrected dot pattern data is stored in a second dot pattern memory for use for electron beam blanking control.

Abstract translation: 存储在第一点阵图形存储器中的点图案数据在微处理器的控制下一次被预定数量的连续位读出，并相对于X方向被校正。 校正后的点阵图形数据临时存储在主存储器中。 然后，存储在主存储器中的点图案数据相对于Y方向被校正。 所得到的校正后的点图案数据被存储在用于电子束消隐控制的第二点阵图形存储器中。

公开(公告)号：US3450884A

公开(公告)日：1969-06-17

申请号：US3450884D

申请日：1966-10-03

Applicant: BELGE LAMPES MAT ELECTR MBLE

Inventor： SCHAYES RAYMOND ,  GOURLET ROGER

IPC: G01J1/58 ,  G01T1/115 ,  H01J3/12

CPC classification number: G01J1/58 ,  G01T1/115

公开(公告)号：IL278809D0

公开(公告)日：2021-01-31

申请号：IL27880920

申请日：2020-11-18

Applicant: KLA TENCOR CORP

IPC: H01J3/02 ,  H01J3/12 ,  H01J37/063 ,  H01J37/065 ,  H01J37/073 ,  H01J37/24 ,  H01J37/28

Abstract: Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.

公开(公告)号：MY181462A

公开(公告)日：2020-12-22

申请号：MYPI2016703717

申请日：2015-06-17

Applicant: INTELLIGENT VIRUS IMAGING INC

Inventor： SINTORN IDA-MARIA ,  NORDSTROM RICKARD ,  KYLBERG GUSTAF

IPC: H01J37/153 ,  H01J3/12 ,  H01J29/56 ,  H01J37/26

Abstract: The method is for automatic astigmatism correction of a lens system. A first image (96) is provided that is not in focus at a first stigmator setting of a set of lenses. A calculating device calculates a corresponding first Fourier spectrum image (312). A distribution and direction of pixels of the Fourier spectrum image (128, 130,312) are determined by calculating a first vector (132) and a second vector (134). The first vector (132) is compared with the second vector (134) The lens system is changed from a first stigmator setting to a second stigmator setting to provide a second image (98). A corresponding Fourier spectrum image (314) is calculated. The distribution and direction of pixels of the second Fourier spectrum image (314) is determined by calculating a third vector and a fourth vector. The third vector is compared to the fourth vector. The image that has the lowest vector ratio is selected.

公开(公告)号：DE59206009D1

公开(公告)日：1996-05-23

申请号：DE59206009

申请日：1992-08-25

Applicant: ZEISS CARL FA

Inventor： ROSE HARALD PROF DR ,  PREIKSZAS DIRK ,  DEGENHARDT RALF

IPC: H01J37/12 ,  G01Q30/06 ,  H01J3/12 ,  H01J37/04 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H01J37/29

Abstract: The invention relates to a mirror corrector for electron and ion microscopes. The corrector consists essentially of a beam deflector (3) and a mirror (5) which reflects the incident particle beam. A first plane of symmetry (3g) of the deflector (3) is imaged in the mirror (5). The mirror (5) images this first plane of symmetry (3g) into a second plane of symmetry (3h) of the deflector in the scale of the image (1:1). At the same time, the planes of symmetry are either an intermediate image or planes of diffraction. The high symmetry of the imaging system results in the second-order errors caused during a single passage through the deflector (3) being cancelled out after passing through a second time. The mirror (5) can be adjusted such that its negative chromatic error compensates for that of the objective lens and the other lenses. The aperture error can be compensated for independently thereof with the aid of a hexapole (18) which is centred in a plane of diffraction (7).

公开(公告)号：DD282323A5

公开(公告)日：1990-09-05

申请号：DD32659089

申请日：1989-03-15

Applicant: UNIV DRESDEN TECH

Inventor： ROTH PETER ,  HEGENBARTH ERNST

IPC: H01J3/12