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    가변성 미세패턴을 구비한 미세구조체 제조방법
    71.
    发明授权
    가변성 미세패턴을 구비한 미세구조체 제조방법 有权
    具有可变微图案的精细结构的制造方法

    公开(公告)号：KR101450464B1

    公开(公告)日：2014-10-13

    申请号：KR1020130089033

    申请日：2013-07-26

    Applicant: 서울대학교산학협력단

    Inventor： 권성훈 ,  이호원 ,  박태준 ,  정유신

    IPC: B81C1/00 ,  G01N33/48 ,  G06K7/10

    Abstract: 광색성 물질과 경화성 물질을 함유하는 혼합물을 형성하는 단계; 상기 혼합물을 미세유체관에 제공하는 단계; 상기 혼합물의 원하는 부분에 패턴화된 에너지를 인가하여 상기 혼합물을 경화함으로써 가변성 미세패턴을 형성하는 단계; 및 상기 미세유체관에 추가적인 경화성 물질을 도입하고 에너지를 인가하여 상기 미세구조체를 형성하는 단계를 포함하는 가변성 미세패턴을 구비한 미세구조체 제조방법이 제공된다.

    미세코드를 포함하는 보안입자 및 그 적용방법
    72.
    发明授权
    미세코드를 포함하는 보안입자 및 그 적용방법 有权
    用于安全应用的编码微粒

    公开(公告)号：KR101398659B1

    公开(公告)日：2014-05-27

    申请号：KR1020120147292

    申请日：2012-12-17

    Applicant: 한국조폐공사 ,  서울대학교산학협력단

    Inventor： 윤준희 ,  조동제 ,  김동후 ,  권성훈 ,  배형종 ,  장지성

    IPC: G06K9/58 ,  G07D7/00

    Abstract: The purpose of the present invention is to provide a security particle and an application method thereof. A process is simple. It is easy to control the shape, thickness, or diameter of the security particle and to form a micro-code inside. The identifiability for the micro-code can be improved by providing the light-sensitive characteristics to the security particles in a simple way. The present invention provides the security particle with the micro-code with optical properties different from the outside or with the empty inside by exposing a photocurable polymeric resin with a photoinitiator to an optofluidic lithography system without a mask and the application method thereof.

    Abstract translation: 本发明的目的是提供一种安全粒子及其应用方法。 一个过程很简单 很容易控制安全粒子的形状，厚度或直径，并在其中形成微码。 可以通过以简单的方式向安全粒子提供光敏特性来改善微码的可识别性。 本发明通过将具有光引发剂的光固化性聚合物树脂暴露于不具有掩模的光流体光刻系统及其应用方法，为安全粒子提供具有与外部或空的内部不同的光学特性的微码。

    컬러 코드화된 자성 구조물
    73.
    发明公开
    컬러 코드화된 자성 구조물 有权
    彩色编码磁性结构

    公开(公告)号：KR1020130064809A

    公开(公告)日：2013-06-18

    申请号：KR1020137010161

    申请日：2010-04-13

    Applicant: 서울대학교산학협력단

    Inventor： 권성훈 ,  이호원 ,  김준회 ,  김효기

    IPC: G01N33/52 ,  G01N21/25 ,  G01N33/48 ,  G01N33/53

    CPC classification number: H01F1/28 ,  B22F1/0003 ,  B22F1/02 ,  B22F2301/155 ,  B22F2301/35 ,  B22F2302/256 ,  B22F2999/00 ,  B82Y25/00 ,  H01F1/0054 ,  H01F1/0063 ,  B22F1/0018 ,  C22C2202/02 ,  B22F2301/15

    Abstract: PURPOSE: A method for analyzing a color code is provided to change the intensity of a magnetic field, to sequentially solidify several parts of a composition, and to fix a plurality of color codes. CONSTITUTION: A method for analyzing a color code comprises: a step of providing a magnetic structure with a probe region and a code region which is encoded by a color code; a step of binding a target to the probe region; and a step of decoding information of the magnetic structure. The code region contains a photonic crystal of magnetic nanoparticles. In the color encoded magnetic structure, the probe region has a binding point for binding with an external target. [Reference numerals] (AA) Fluid flow; (BB) Sequentially UV pattern; (CC) Magnetic field intensity; (DD) DMD dynamic mask; (EE) Time

    Abstract translation: 目的：提供用于分析色码的方法以改变磁场的强度，以顺序地固化组合物的若干部分，并固定多个颜色代码。 构成：用于分析颜色代码的方法包括：提供具有探针区域的磁性结构和由颜色代码编码的代码区域的步骤; 将靶结合到探针区域的步骤; 以及解码磁结构的信息的步骤。 代码区域包含磁性纳米粒子的光子晶体。 在彩色编码的磁性结构中，探针区域具有用于与外部靶标结合的结合点。 （附图标记）（AA）流体流动; （BB）顺序UV图案; （CC）磁场强度; （DD）DMD动态面膜; （EE）时间

    코드화된 입자 기반의 플랫폼을 이용하는 분석방법
    74.
    发明授权
    코드화된 입자 기반의 플랫폼을 이용하는 분석방법 有权
    使用基于代码粒子的平台的测定方法

    公开(公告)号：KR101101310B1

    公开(公告)日：2011-12-30

    申请号：KR1020110046183

    申请日：2011-05-17

    Applicant: 서울대학교산학협력단

    Inventor： 권성훈 ,  정수은 ,  오스틴제임스헤인츠 ,  이승훈 ,  박욱 ,  송영훈 ,  장지성 ,  김효기 ,  이호원

    IPC: G01N33/48 ,  G01N33/58 ,  G01N35/10

    CPC classification number: G01N33/585 ,  G01N33/54313 ,  Y10T436/143333

    Abstract: PURPOSE: An analysis method using a coded particle-based platform is provided to form various kinds of codes in particles containing a target material. CONSTITUTION: An analysis method using a coded particle-based platform comprises: a step of preparing a plurality of coded particles with distinguishable codes according to the kinds of a target material(210); a step of providing coded particles to a plate having plural wells by pipetting for placing the plural coded particles inside the plural wells by self-assembly(220); a step of providing an analyte to the plural wells(230); a step of decoding the code of the particles(240); and a step of reacting the target material and the analyte(250).

    Abstract translation: 目的：提供使用基于编码粒子的平台的分析方法，以形成包含目标材料的粒子中的各种代码。 构成：使用基于编码粒子的平台的分析方法包括：根据目标材料（210）的种类，制备具有可区分代码的多个编码粒子的步骤; 通过自动组装（220）将经编码的颗粒提供给具有多个井的板的步骤，通过移液将多个编码颗粒放置在多个井内部; 向多个井（230）提供分析物的步骤; 解码颗粒（240）的代码的步骤; 和使靶材与分析物（250）反应的工序。

    영상 처리 기반 리소그래피 시스템 및 표적물 코팅 방법
    78.
    发明公开
    영상 처리 기반 리소그래피 시스템 및 표적물 코팅 방법 有权
    基于图像处理的图像系统和涂覆目标对象的方法

    公开(公告)号：KR1020110085349A

    公开(公告)日：2011-07-27

    申请号：KR1020100005094

    申请日：2010-01-20

    Applicant: 서울대학교산학협력단

    Inventor： 권성훈 ,  정수은 ,  장지성 ,  한상권

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70383 ,  G03F7/2051 ,  G03F7/70391 ,  G03F7/7055

    Abstract: PURPOSE: An image processing based lithography system and a method for coating a target object are provided to thermally harden a coating layer, thereby compensating for ununiform coating on a lateral wall. CONSTITUTION: One target object is arranged on a substrate. A processing device(140) makes the target object by an image to determine an optical pattern for a coating layer of the target object. A light exposure device(150) provides light with a light pattern determined by the processing device to the substrate. A first coating device supplies photoresist to partial areas of the surfaces of the substrate and the target object. The photoresist includes a fluorescent substance. A second coating device forms a conductive film or an insulating film on at least partial areas of the surfaces of the substrate and the target object.

    Abstract translation: 目的：提供基于图像处理的光刻系统和涂覆目标物体的方法以热涂覆涂层，从而补偿侧壁上的不均匀涂层。 构成：将一个目标物体排列在基板上。 处理装置（140）通过图像使目标物体确定目标物体的涂层的光学图案。 曝光装置（150）将由处理装置确定的光图案的光提供给基板。 第一涂层装置将光致抗蚀剂供应到基板和目标物体的表面的部分区域。 光致抗蚀剂包括荧光物质。 第二涂覆装置在基板和目标物体的表面的至少部分区域上形成导电膜或绝缘膜。

    리소그래피 시스템과 리소그래피 방법
    79.
    发明公开
    리소그래피 시스템과 리소그래피 방법 有权
    LITHOGRAPHY系统和LITHOGRAPHY方法

    公开(公告)号：KR1020100053097A

    公开(公告)日：2010-05-20

    申请号：KR1020080112077

    申请日：2008-11-12

    Applicant: 서울대학교산학협력단

    Inventor： 권성훈 ,  박현성 ,  유경식 ,  박남규

    IPC: H01L21/027

    CPC classification number: G03F7/70291

    Abstract: PURPOSE: A lithography system and a lithography method are provided to obtain a microstructure with a high resolution by transferring modulated light along the flow of a photo-curable fluid. CONSTITUTION: A photo-curable fluid flows through a microfluidic channel(110). A light projection unit supplies light which is transferred along the flow of the photo-curable fluid to the microfluidic channel. The light projection unit includes light source(160) and a spatial light modulator(150). The spatial light modulator modulates light from the light source. The speed of the light is the same as the speed of the photo-curable fluid.

    Abstract translation: 目的：提供光刻系统和光刻方法以通过沿光可固化流体的流动传递调制光以获得高分辨率的微结构。 构成：可光固化的流体流过微流体通道（110）。 光投射单元将沿着光可固化流体的流动传递的光提供给微流体通道。 光投影单元包括光源（160）和空间光调制器（150）。 空间光调制器调制来自光源的光。 光速与光固化液体的速度相同。

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