METHOD FOR EXPOSING PHOTOSENSITIVE INTAGLIO PRINTING PLATE

    公开(公告)号:JPS63153552A

    公开(公告)日:1988-06-25

    申请号:JP17074787

    申请日:1987-07-08

    Inventor: FUJIKAWA JUNICHI

    Abstract: PURPOSE:To prevent a trouble caused by defective sticking of a positive film by coating the upper surface of a photosensitive layer of the photosensitive intaglio printing material providing a substrate and the photosensitive layer with a transparent plastic film having the thickness of 1-50mum. CONSTITUTION:The upper surface of the photosensitive layer of the photosensitive intaglio printing material providing the substrate and the photosensitive layer is coated with the transparent plastic film having the thickness of 1-50mum, thereafter by image-wisely exposing the photosensitive layer through the transparent film. The used transparent plastic film has

    PHOTOSENSITIVE RESIN COMPOSITION
    73.
    发明专利

    公开(公告)号:JPS63146030A

    公开(公告)日:1988-06-18

    申请号:JP12133487

    申请日:1987-05-20

    Abstract: PURPOSE:To obtain the titled composition which has excellent workability and good compatibility and form stability for a plate material, and is suitable to use for a soft, a thick and a flexographic plate by incorporating a compd. selected from the group comprising a N-acylamino acid derivative, a hydroxy carboxylic acid or its derivative, a condensate of an aliphatic or an aromatic aldehyde and the polyhydric alcohol, an acylate of polysaccharide and a metallic soap to the titled composition. CONSTITUTION:The titled composition contains at least one or more kinds of the compds. comprising the N-acylamino acid derivative, the hydroxy carboxylic acid or its derivative, the condensate of the aliphatic or aromatic aldehyde and the polyhydric alcohol, the acylate of polysaccharide, and the metallic soap. The acylamino acid derivative is exemplified by a N-acylamino acid amine salt, a N-acylamino acid amide and a N-acylamino acid ester, etc. Thus, the titled composition which has the excellent workability and the good compatibility and form stability, and especially, is suitable for the use of the thick molded article, and the soft and flexographic photosensitive resin plate material, is obtd.

    PHOTOSENSITIVE RESIN COMPOSITION
    75.
    发明专利

    公开(公告)号:JPS62260141A

    公开(公告)日:1987-11-12

    申请号:JP10310986

    申请日:1986-05-07

    Abstract: PURPOSE:To enable effective reduction of the crystallinity of a polymer without changing water developability and to enhance flexibility, ink transferability, and reproductivity of the fine parts of an image by using a copolymer of alpha- olefin and polyvinyl acetate partially saponified in the part of the polyvinyl acetate. CONSTITUTION:The photosensitive resin composition comprises (a) the copolymer of the 4-24C alpha-olefin in an amount of 0.2-15.0mol% and polyvinyl acetate partially saponified in the polyvinyl acetate part to a saponification degree of 50-99mol% in an amount of 10-90wt%; (b) a photopolymerizable unsaturated compound having a boiling point of >=150 deg.C and at least one terminal ethylene group in an amount of 10-90wt%; and (c) a photosensitizer in an amount of 0.001-10wt%. It is preferred for the part of the partially saponified polyvinyl acetate to have a lower polymerization degree from the viewpoint of water solubility, but to have a higher one from the viewpoint of image reproducibility and the toughness of a printing plate material. It is possible to use a mixture of >=2 kinds of polyvinyl acetate copolymer different in the content of alpha-olefin and the saponification degree and polymerization degree of the partially saponified polyvinyl acetate part.

    PHOTOSENSITIVE RESIN COMPOSITION
    76.
    发明专利

    公开(公告)号:JPS62215262A

    公开(公告)日:1987-09-21

    申请号:JP5713186

    申请日:1986-03-17

    Abstract: PURPOSE:To remarkably reduce the odor of a material for a plate and the odor of a spent developing soln. without deteriorating the satisfactory developability, photosensitive characteristics or suitability to printing by using a base resin as a binder, a photopolymerizable unsatd. compound, an inorg. ammonium salt compound and at least one kind of polyether. CONSTITUTION:This photosensitive resin composition contains 100pts.wt. base resin as a binder, 20-200pts.wt. photopolymerizable unsatd. compound having ethylenic double bonds at the terminals and >=150 deg.C b.p., 0.01-20pts.wt. inorg. ammonium salt compound, and 0.1-30pts.wt. at least one kind of polyether selected among polyoxyethylene, polyoxypropylene and an oxyethylene- oxypropylene copolymer each having 150-5,000mol.wt. The inorg. ammonium salt compound and the polyether can deodorize the photosensitive resin composition.

    PHOTOSENSITIVE RESIN COMPOSITION
    77.
    发明专利

    公开(公告)号:JPS61264339A

    公开(公告)日:1986-11-22

    申请号:JP10590085

    申请日:1985-05-20

    Abstract: PURPOSE:To obtain a wholly or partially saponified polyvinyl acetate type printing plate material good in water-developability, and superior in image reproductivity, ink receptivity, solvent resistance, and the like by incorporating a compd. having a specified ammonium base. CONSTITUTION:The photosensitive resin compsn. comprises 100pts.wt. of wholly or partially saponified polyvinyl acetate having a saponification degree of 50-100mol%, 20-200pts.wt. of a photopolymerizable monomer, and 0.5-50pts. wt. of the compd. having a mol.wt of is a counter ion. As a result, the photosensitive resin compsn. superior in flexibility, solvent resistance, and durability, and useful for the photosensitive layer of the printing plate material, and good in water developability can be obtained.

Patent Agency Ranking