Abstract:
PURPOSE: A servicing apparatus and a method for transmitting music on hold in a keyphone system is provided to perform an MOH(music on hold) transmitting service without comprising additional hardware such as an MOH transmitter in a keyphone system as well as to identify a caller and a general roof start trunk by using a trunk card. CONSTITUTION: An apparatus(100) connects one central office port, which is not used among central office ports comprised in a central office circuit(112) of a prior keyphone system, with an external MOH music source(108) for the MOH transmitting service, and in case that a corresponding extension required to receive is busy, the received signal is connected to the previously established central office port connected with the external MOH music source, and then an MOH for the MOH transmitting service from the external MOH music source is provided.
Abstract:
PURPOSE: A system for fabricating a semiconductor device is provided to shorten an interval of time from a process to a measurement test by testing whether the process is normal in unloading a wafer from process equipment, and to reduce defects by previously stopping driving the process equipment. CONSTITUTION: A wafer transfer unit(36b) selectively loads or unloads the wafer between a cassette and a process chamber(32b). A measuring test apparatus(44b) tests whether a process is normally performed regarding the wafer during an unloading process. A control unit controls driving respective constitution elements through a measurement signal applied from the measuring test apparatus.
Abstract:
PURPOSE: A method for forming a micro-pattern of a semiconductor device is provided to prevent a rounding phenomenon generated from a line end of a pattern. CONSTITUTION: An etching object layer(102) is formed on an upper portion of a semiconductor substrate(100) in order to form a main pattern. A hard mask layer is formed on an upper portion of the etching object layer(102). The first hard mask layer pattern(104a) is formed by patterning the hard mask layer. An outline of the first direction of the main pattern is defined by forming the first hard mask layer. The outlines of the first direction and the second direction of the main pattern are defined and the second hard mask layer pattern is formed by patterning the first hard mask layer pattern(104a). The main pattern is formed by etching the etching object layer(102).
Abstract:
PURPOSE: A photo-mask, a photo-etching method for forming the opening having a reduced size, and a semiconductor device are to form an opening image to be applied to a photoresist flowing process, thereby forming a fine opening having a small pitch. CONSTITUTION: A plurality of opening images, which are aligned in a desire pitch, are formed in one direction on a mask for fabricating a semiconductor memory device. The opening image is transferred to a photoresist layer. A space between center portions of the opening images is larger than the pitch. The plurality of opening images are arranged in the form of zigzag. The opening image has a larger length in other direction orthogonal to the direction. The semiconductor memory device is a non-volatile memory device. The opening image is a bit line contact hole image(117). Alternatively, The semiconductor memory device is a DRAM(Dynamic Random Access Memory) device, and the opening image is a storage electrode contact hole image.
Abstract:
PURPOSE: A method for indicating messages using a key-phone is provided to give a product suitable for the user request by indicating various promises, family birthdays, other memorial days, etc., to inform a user of the main schedule. CONSTITUTION: A function of input key is identified on a key-phone(S100). If the input key is a key having a function for informing user of a certain information(S200), the user information about a user for receiving the certain information and the above certain information are recorded(S300). The recorded user information and certain information are stored in a storage according as a control signal from a controller(S400). If the set time is reached(S500), the above certain information is transmitted to the user in particular format by using the above user information(S600).
Abstract:
PURPOSE: In a conventional semiconductor, there was temperature drop of chemical fumes in the mixing process of oxygen and chemical fumes. Temperature drops caused a drop in steam pressure and generative layer uniformity problems. CONSTITUTION: The gas supplier is equipped with an oxygen supplier (2) and line heater (6) around an oxygen supplying pipe (3) that connects with a gas mixing chamber. An accumulator (7) with an inside assistant heater (7) is equipped in the line heater. Oxygen supplied through the oxygen supply pipe from the oxygen supplier to the gas mixing chamber (4) is preheated by the line heater (6). Oxygen is provided through the accumulator (7) to the gas mixing chamber (4) with equal pressure.
Abstract:
본 발명은 도전층 패턴 상에 내 식각성 버퍼층을 구비하는 반도체장치에 관해 개시한다. 상기 버퍼층은 포토공정에서 현상액에 대한 내 식각성을 갖는 물질층이다. 이 결과, 상기 도전층 패턴 형성후 실시되는 공정 예컨대, 상기 도전층 패턴 상에 비어홀을 갖는 폴리이미드층 패턴을 형성하기 위한 현상공정이나 폴리이미드층 패턴의 재 형성 공정에서 상기 도전층 패턴이 손상되는 것을 방지하여 패키지공정에서 반도체장치가 손상되는 것을 방지할 수 있다.
Abstract:
가. 청구범위에 기재된 발명이 속한 기술분야 키폰 전화기에서 기능키의 입력 시간에 대응하여 두가지 기능을 설정하여 사용하는 방법. 나. 발명이 해결하고자 하는 기술적 과제 키폰 전화기에서 모듈 확장기를 부가하여 키의 숫자를 늘리지 않고 하나의 기능키에 대응하여 두 개의 서로 다른 기능을 수행하도록 하는 방법. 다. 발명의 해결방법의 요지 다수의 기능키를 구비한 키폰 전화기의 기능키 확장 방법이, 프로그램 모드시 등록할 기능키를 선택하고 선택된 하나의 기능키에 대응하여 서로 다른 제1 기능과 제 2기능을 등록하는 과정과, 기능키 사용 모드시 사용할 기능키가 선택되면 선택된 기능키의 입력 시간을 검사하는 과정과, 검사결과 기능키 입력시간이 설정시간 이하인 경우 상기 제 1기능을 수행하는 과정과, 검사결과 기능키 입력시간이 설정시간을 초과하는 경우 상기 제 2기능을 수행하는 과정으로 이루어짐을 특징으로하는 키폰 전화기에서 입력 시간에 따른 기능키 확장 방법. 라. 발명의 중요한 용도 키폰 전화기에서 기능키의 기능확장 방법.
Abstract:
감광막 현상 장치에 관하여 개시한다. 본 발명은 현상 과정에서 현상액으로 용해되어 나오는 감광막을 상기 현상액 내에 골고루 확산시키기 위하여 현상조의 바닥면 소정 영역에 돌출되도록 설치된 복수개의 비늘판들을 구비하는 것을 특징으로 하는 감광막 현상 장치를 제공한다. 본 발명에 의하면, 상기 현상액의 유동을 더욱 활발하게 하여 상기 현상액에 용해되어 나오는 감광막을 상기 현상액에 침적되어 있는 반도체 기판으로 부터 멀리 확산시켜 보낼수 있다. 따라서 현상 및 세정 과정이 끝난 후에 미세 잔유물이 상기 반도체 기판 상에 잔존하는 것을 방지할 수 있다.