公开(公告)号：DE58909788D1

公开(公告)日：1997-05-07

申请号：DE58909788

申请日：1989-10-27

Applicant: BASF AG

Inventor： NGUYEN-KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/039 ,  C08F4/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, wherein the organic compound (c) is a beta -ketoacide ester. This radiation-sensitive mixture may be used to prepare photoresists.

公开(公告)号：DE59305524D1

公开(公告)日：1997-04-03

申请号：DE59305524

申请日：1993-09-08

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  HOFFMANN GERHARD DR ,  BRAUN FRANK ,  KRATZ DETLEF DR ,  BRUDERMUELLER MARTIN DR ,  WITZEL TOM DR

IPC: C07D319/12

公开(公告)号：AT149161T

公开(公告)日：1997-03-15

申请号：AT93114381

申请日：1993-09-08

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  HOFFMANN GERHARD DR ,  BRAUN FRANK ,  KRATZ DETLEF DR ,  BRUDERMUELLER MARTIN DR ,  WITZEL TOM DR

IPC: C07D319/12

公开(公告)号：DE58909028D1

公开(公告)日：1995-03-30

申请号：DE58909028

申请日：1989-10-27

Applicant: BASF AG

Inventor： NGUYEN-KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.

公开(公告)号：DE58907834D1

公开(公告)日：1994-07-14

申请号：DE58907834

申请日：1989-12-01

Applicant: BASF AG

Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST ,  SCHUHMACHER RUDOLF DR

IPC: B41M5/26 ,  G03F7/004 ,  G03F7/039 ,  G11B7/00 ,  G11B7/004 ,  G11B7/24

公开(公告)号：DE4223887A1

公开(公告)日：1994-01-27

申请号：DE4223887

申请日：1992-07-21

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  HARTH KLAUS DR ,  HOFFMANN GERHARD DR ,  HIBST HARTMUT DR

IPC: B05D7/00 ,  B05D7/14 ,  B32B15/08 ,  C08J5/12 ,  C23C14/12 ,  C23F1/02 ,  H01L21/312 ,  H05K1/05 ,  H05K3/02 ,  H05K3/38 ,  B32B7/04 ,  B32B27/06 ,  B32B31/00 ,  B32B33/00 ,  H01B17/62 ,  C23C14/24 ,  C23C14/34 ,  C23F4/00

Abstract: The invention relates to a process for producing a polymer/metal or polymer/semiconductor composite with an adhesion layer between the polymer and the metal or between the polymer and the semiconductor, a layer of at least two different chemical elements being applied onto the metal or onto the semiconductor by the vapour coating or the cathodic sputtering thereof, then at least one chemical element of this layer being removed selectively or partly in an etching process and the polymer being applied thereon. This process is suitable for producing composite components.

公开(公告)号：DE4107851A1

公开(公告)日：1992-09-17

申请号：DE4107851

申请日：1991-03-12

Applicant: BASF AG

Inventor： WUENSCH THOMAS DR ,  HOESSEL PETER DR ,  HOFFMANN GERHARD DR ,  LANGEN JUERGEN DR

IPC: C08G2/08 ,  B29C35/08 ,  C08J3/28 ,  G03F7/039 ,  G03F7/20

Abstract: The invention relates to a process for making microstructures having a high aspect ratio by imagewise irradiation of polymers with high-energy parallel radiation from X-ray sources, homo- or copolyoxymethylene being used as polymer.

公开(公告)号：DE3939389A1

公开(公告)日：1991-06-06

申请号：DE3939389

申请日：1989-11-29

Applicant: BASF AG

Inventor： BAUER GERHARD DR ,  HOFFMANN GERHARD DR ,  SEITZ FRIEDRICH DR

IPC: G03F7/004 ,  C07D233/88 ,  G03F7/029 ,  G03F7/033

公开(公告)号：DE3914408A1

公开(公告)日：1990-10-31

申请号：DE3914408

申请日：1989-04-29

Applicant: BASF AG

Inventor： SEITZ FRIEDRICH DR ,  HOFFMANN GERHARD DR ,  BAUER GERHARD DR

IPC: C08F2/50 ,  G03F7/085

公开(公告)号：DE3909248A1

公开(公告)日：1990-09-27

申请号：DE3909248

申请日：1989-03-21

Applicant: BASF AG

Inventor： BAUER GERHARD DR ,  HOFFMANN GERHARD DR ,  HUNGER JUERGEN DR ,  SEITZ FRIEDRICH DR

IPC: G03F7/004 ,  G03F7/00 ,  G03F7/033 ,  G03F7/105 ,  H01L21/027