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    INSPECTION DEVICE AND ALIGNER USING IT
    81.
    发明专利
    INSPECTION DEVICE AND ALIGNER USING IT 失效

    公开(公告)号：JPH1123225A

    公开(公告)日：1999-01-29

    申请号：JP13113298

    申请日：1998-04-25

    Applicant: CANON KK

    Inventor： HASEGAWA MASANORI ,  OSAKI YOSHINORI ,  YOSHII MINORU

    IPC: G01B11/00 ,  G01B11/26 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To obtain an inspection device by which position information or the like on the direction of an optical axis on the surface of a wafer is detected with high accuracy and by which a high-integration-degree device can be manufactured easily by a method wherein a pattern which is formed by a pattern generator is projected on an object face from an oblique direction. SOLUTION: In a projection optical system 23, a pattern which is formed by a pattern generator is projected on an object face from an oblique direction, and a pattern image is formed on the object face. In a light-receiving optical system, a light-receiving element detects light from the pattern image. That is to say, by using respective face detecting devices 1 to 5, 11 to 16, 19, face-position information on a wafer 6 is detected. Thereby, the height in the direction of the optical axis of the projection optical system 23 in the face position of the wafer 6 is set to a conjugate relationship with a reticle 21 regarding the projection optical system 23. Then, a stage 10 is driven and controlled by a driver 25 in such a way that the wafer 6 is situated in the best image formation face of the projection optical system 23. Thereby, position information and inclination information on the direction of an optical axis on the surface of the wafer 6 are detected with high accuracy, and the wafer 6 can be situated in the image formation position of the projection optical system 23.

    BEST FOCUS DECISION METHOD AND DECISION METHOD OF EXPOSURE REQUIREMENT USING IT
    82.
    发明专利
    BEST FOCUS DECISION METHOD AND DECISION METHOD OF EXPOSURE REQUIREMENT USING IT 失效

    公开(公告)号：JPH0945609A

    公开(公告)日：1997-02-14

    申请号：JP21123095

    申请日：1995-07-26

    Applicant: CANON KK

    Inventor： HASEGAWA MASAYOSHI ,  TAKEUCHI SEIJI ,  YOSHII MINORU

    IPC: G03B27/72 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To make a best focus position and an optimum exposure amount highly accurate in a short time automatically by deciding a best focus position by calculating information regarding one frequency element of a zigzag line from an image signal obtained by imaging a plurality of photosensitive patterns on an image sensing surface of a photoelectric conversion means. SOLUTION: A reticle is arranged inside a surface which is vertical to an optical axis of a projection lens, a pattern having periodicity to one direction is arranged on a surface of the reticle and a plurality of photosensitive patterns M' are formed by transferring the pattern on a wafer W' which is a photosensitive board at different focus positions. The plurality of photosensitive patterns M' are imaged in an image sensing surface of a photoelectric conversion means 105 and a best focus position is decided by calculating information regarding one frequency element of a zigzag line constituting an outline of an image of a zigzag opening from an image signal obtained by the photoelectric conversion means 105. Thereby, the best focus position and an optimum exposure amount can be made highly accurate in a short time automatically.

    87.
    发明专利
    失效

    公开(公告)号：JPH05296722A

    公开(公告)日：1993-11-09

    申请号：JP10131992

    申请日：1992-04-21

    Applicant: CANON KK

    Inventor： TAKEUCHI SEIJI ,  YOSHII MINORU ,  NOSE HIROYASU

    IPC: G01B9/02 ,  G01B11/00 ,  G01D5/38 ,  G02B27/28 ,  G03F9/00

    Abstract: PURPOSE:To simplify constitution and prevent a drop in light quantity by arranging a corner cube so that twice-diffracted light generated due to the re-incidence of the once-diffracted light of P and S waves on a diffraction grating after reflection becomes incident on the opposite side of the emission side of a polarized beam splitter. CONSTITUTION:Light from an illuminant is incident on a polarized beam splitter unit PBSU via a mirror M, and divided into a transmission P wave and a reflection S wave. The positive first-order diffracted light at a point P2 is reflected with a corner cube prism CC, and perpendicularly incident on a diffraction grating GS at a point P3. One part of twice-diffracted light is totally reflected with a mirror M2 at a point P4 and incident on a polarized beam splitter PBS at a point P5. This light passes the splitter PBS and becomes incident on a light receiving element PD2 via a polarization filter PF2. The other part of the diffracted light passes through the splitter PBS at the point P2 and becomes incident on the light receiving element PD2 via a polarization filter PF2. On the other hand, the negative first-order diffracted light of the S wave at the point 3 is reflected with the corner cube CC, and perpendicularly incident on the diffraction grating GS at the point 2. One part of the twice-diffracted light is totally reflected with a mirror M1 at a point 6 and reflected at the point 5. This light is superposed on the P wave and becomes incident on a light receiving element PD1. The other part of the twice-diffracted light is also reflected with the splitter PBS at the point 1, superposed on the P wave and incident on the light receiving element PD2.

    88.
    发明专利
    失效

    公开(公告)号：JPH05234852A

    公开(公告)日：1993-09-10

    申请号：JP7223592

    申请日：1992-02-21

    Applicant: CANON KK

    Inventor： HASEGAWA MASAYOSHI ,  ABE NAOTO ,  YOSHII MINORU

    IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE:To reduce an undesirable influence due to a beam of inessential light which is incident on a photodetection face and to detect a relative relationship between a mask and a wafer by properly setting a method wherein the signal of the detection sensitivity in each region of a detector is processed by using a weight factor. CONSTITUTION:A light flux from a light source 3 is detected by using a detector 38 which outputs a signal corresponding to the light intensity in an incident position of the light flux on a photodetection face via a mask 1 and a wafer 2. Then, the signal from the detector 38 is adjusted, by using a weight factor which differs according to regions, to a signal corresponding to individual regions on the photodetection face from the detector 38. After that, the regions, on the photodetection face, which are to be adjusted again on the basis of an output after the adjustment are reset; the same adjustment is performed. Thereby, a relative position between the mask and the wafer can be detected with high accuracy.

    INTERFERENCE MEASUREMENT DEVICE
    89.
    发明专利
    INTERFERENCE MEASUREMENT DEVICE 失效

    公开(公告)号：JPH0587530A

    公开(公告)日：1993-04-06

    申请号：JP27695191

    申请日：1991-09-27

    Applicant: CANON KK

    Inventor： MATSUMOTO TAKAHIRO ,  TSUJI TOSHIHIKO ,  NOSE TETSUSHI ,  YOSHII MINORU ,  SAITO KENJI ,  CHITOKU KOICHI

    IPC: G01B11/00 ,  G01D5/38 ,  G02B27/42 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE:To enable an accurate measurement to be made by eliminating influence of vibration or fluctuation of air. CONSTITUTION:Two coherent lights with a different frequency which are emitted from a light source 20 impinge on a beam splitter 21 and a reference light beat signal according to interference is obtained by a Gland Thompson prism 22 which is placed in its reflection direction and a light detector 24 and is input to a signal processing control part 25. In a transmission direction of the beam splitter 21, a prism 27 with a polarization beam splitter part 27a and reflection parts 27b and 27c is provided and a flux of light is separated into two polarization lights according to a polarization direction and is applied to diffraction gratings 31 and 33 which are placed on a mask 28 and wafer 29, respectively. A diffraction light beat signal due to interference of diffraction light is obtained by a Gland Thompson prism 35 and a photo detector 37 for a reflection light and is input to the signal processing control part 25. In the signal processing control part 25, a phase difference between the reference light beat signal and the diffraction light beat signal is obtained, thus enabling a position deviation of the diffraction gratings 31 and 33 to be detected.

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