METHOD OF CONTROLLING FLUORINE DOPING IN SOOT PREFORMS
    81.
    发明申请
    METHOD OF CONTROLLING FLUORINE DOPING IN SOOT PREFORMS 审中-公开
    控制荧光染料的方法

    公开(公告)号:WO00058232A1

    公开(公告)日:2000-10-05

    申请号:PCT/US2000/005947

    申请日:2000-03-07

    Abstract: A method for controlling the refractive index achieved using a fluorine dopant gas, wherein CF4 is employed as the dopant gas, and the soot preform (12) is doped using the CF4 for a time and temperature sufficient to result in a decrease in fluorine dopant nearest the surface which is in contact with the CF4 gas. Preform (12) is mounted on handle (11) which is fused to handle (14) and the assembly (20) is heated in a furnace muffle (15). The CF4 flows through furnace muffle (15), as indicated by arrows (17), and preferably contains a diluent gas such as helium. An optional centerflow gas (16) may be flowed through the centerline hole (18) in several embodiments, which consists of helium. The end of the porous preform (12) may optionally include a capillary tube (19) to prevent the muffle gases (17) from entering the preform.

    Abstract translation: 控制使用氟掺杂剂气体实现的折射率的方法,其中使用CF 4作为掺杂剂气体,并且使用CF 4掺杂烟灰预制件(12)足够的时间和温度以使氟掺杂剂最近的降低 与CF4气体接触的表面。 预制件(12)安装在手柄(11)上,手柄(11)熔合到手柄(14)上,并且组件(20)在炉马弗炉(15)中被加热。 如箭头(17)所示,CF4流过炉马弗炉(15),并且优选地包含诸如氦气的稀释气体。 在由氦组成的几个实施例中,可选的中心流气体(16)可以流过中心线孔(18)。 多孔预型件(12)的端部可任选地包括毛细管(19),以防止马弗炉气体(17)进入预型件。

    PROJECTION LITHOGRAPHY PHOTOMASK BLANKS, PREFORMS AND METHOD OF MAKING
    82.
    发明申请
    PROJECTION LITHOGRAPHY PHOTOMASK BLANKS, PREFORMS AND METHOD OF MAKING 审中-公开
    投影光刻胶片,预制件和制作方法

    公开(公告)号:WO00055689A1

    公开(公告)日:2000-09-21

    申请号:PCT/US2000/003588

    申请日:2000-02-11

    Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

    Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面,产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒层,以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体,并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应,并固化成具有平行的条纹层的无孔氟硅氧化物玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料,其中条纹层的取向平行于光掩模坯料平面。

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