Abstract:
A method a forming a resin compatible fabric (210) includes: (A) forming a fabric with a plurality of fiber strands, wherein at least one of the plurality of fiber strands includes a plurality of fibers and at least one of the plurality of fibers includes an at least partial coating (214) having at least one starch material with at least one hydroxyl group; (B) breaking a bond between a hydrogen atom of a hydroxyl group of a first starch molecule of the at least one starch material with an oxygen atom of a second starch molecule of the at least one starch material to form at least one unreacted hydroxyl group on the first starch molecule; and (C) reacting at least one functional group of a second material with the at least one unreacted hydroxyl group of the at least one starch material to form a grafted starch material after interweaving.
Abstract:
The present invention provides a method of forming an aperture (414) in an electronic support (410), comprising: A) positioning an electronic support (410) in registry with an aperture forming device (412); and B) forming an aperture (414) at least partially through the electronic support (410) with the aperture forming device (412) while dispensing a fluid stream (420) comprising at least one solid lubricant (422), proximate the aperture forming device (412) during at least a portion of the forming operation, such that the at least one solid lubricant (422) contacts at least a portion (422) of an interface (426) between the aperture forming device (412) and the electronic support (410).
Abstract:
The present invention provides an at least partially coated fiber strand comprising a plurality of fibers, the coating comprising an organic component and lamellar particles having a thermal conductivity of at least 1 Watt per meter K at a temperature of 300K. The present invention also provides an at least partially coated fiber strand comprising a plurality of fibers, the coating comprising an organic component and non-hydratable, lamellar particles. The present invention further provides an at least partially coated fiber strand comprising a plurality of fibers having a resin compatible coating composition on at least a portion of a surface of at least one of said fibers, the resin compatible coating composition comprising: (a) a plurality of discrete particles formed from materials selected from non-heat expandable organic materials, inorganic polymeric materials, non-heat expandable composite materials and mixtures thereof, the particles having an average particle size sufficient to allow strand wet out; (b) at least one lubricious material different from said plurality of discrete particles; and (c) at least one film-forming material. The present invention also provides an at least partially coated fiber strand comprising a plurality of glass fibers having a resin compatible coating composition on at least a portion of a surface of at least one of said glass fibers, the resin compatible coating composition comprising: (a) a plurality of lamellar, inorganic particles having a Mohs' hardness value which does not exceed the Mohs' hardness value of said glass fibers; and (b) at least one polymeric material. The present invention further provides an at least partially coated fiber strand comprising a plurality of glass fibers having a resin compatible coating composition on at least a portion of a surface of at least one of said glass fibers, the resin compatible coating composition comprising: (a) a plurality of hollow, non-heat expandable organic particles; and (b) at least one lubricious material different from the at least one hollow organic particle.
Abstract:
A process for roughening a metal surface is provided comprising applying a coating to the metal surface wherein the coating is a temporary barrier to an etchant attacking the metal surface and the coating is susceptible to the etchant gradually removing the coating, and then etching the coated metal surface with an aqueous bath containing the etchant effective to produce a roughened metal surface.
Abstract:
A water-soluble coating or other deposit is produced from a formulation that is comprised of a curable liquid substance and a dispersed, particulate effervescing agent. The formulation is particularly useful as a solder resist in the manufacture of PCBs, and the preferred composition contains n-vinyl-2-pyrrolidone, N,N-dimethylacrylamide, and polyvinylpyrrolidone.
Abstract:
A laser lithography process for semiconductor interconnect and semiconductor manufacture having the advantages of non-contact printing processes and being much faster than prior art laser lithography processes is disclosed. In accordance with the process, a metal layer to be patterned either for use as a patterned metal layer or as a mask for patterning a layer therebelow, such as a think polyimide layer, is first coated with a very thin layer of polymer evaporated as a monomer using a vapor deposition process. This provides a very thin layer of polymer over the metal layer, which thin polymer layer is readily and quickly patterned by laser to provide a mask for the subsequent chemical etching of the metal layer. The vapor deposited polymer layer, while being very thin and thus readily removed by laser, is also substantially fault free, thereby providing a high-quality mask for the chemical etching process free of any possible damage from ordinary sources such as mask aligners, etc., yet being readily removed when desired such as by way of example, by plasma etching thereof. Various methods and applications are disclosed.
Abstract:
A conductive pattern is prepared in a polymeric layer that has (a) a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation having a λ max of at least 150 nm and up to and including 450 nm, and (c) a crosslinking agent. The polymeric layer is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising carboxylic acid groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions. The pattern of electroless seed metal ions is then reduced to provide a pattern of corresponding electroless seed metal nuclei. The corresponding electroless seed metal nuclei are then electrolessly plated with a conductive metal.