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公开(公告)号：WO9929477A9
公开(公告)日：1999-09-16
申请号：PCT/US9825631
申请日：1998-12-03
Applicant: ADVANCED REFRACTORY TECH
Inventor： BRAY DONALD J , VENKATRAMAN CHANDRA , OUTTEN CRAIG A , HALTER CHRISTOPHER G , GOEL ARVIND
IPC: B26B21/60 , B01J3/06 , B05D5/12 , B32B3/00 , B32B7/00 , B32B9/00 , B32B9/04 , B32B15/04 , B32B17/00 , B32B19/00 , C23C16/02 , C23C16/26 , C23C16/27 , C30B29/02 , B26B21/54 , B01J3/08 , B24D3/02 , B32B15/00 , C23C16/00 , H05H1/24
CPC classification number: B26B21/60 , C23C16/0245 , C23C16/0272 , C23C16/26 , Y10T428/24975 , Y10T428/265 , Y10T428/30 , Y10T428/31678
Abstract: The invention relates to fluorine-doped coatings which include a diamond-like composition containing carbon, silicon, oxygen, hydrogen, and fluorine on various substrates. Preferred substrates include flexible substrates, precision-edged substrates, and electrosurgical instruments. The present invention also relates to a method of making a substrate coated with a fluorine-doped diamond-like coating which includes positioning the substrate in a vacuum coating chamber and depositing a diamond-like composition containing carbon, silicon, oxygen, hydrogen, and fluorine onto the substrate by co-deposition of clusterless particle beams comprised of ions, atoms, or radicals of the carbon, silicon, oxygen, hydrogen, and fluorine, the mean free path of each particle species being in excess of the distance between its source and the growing particle coating surface of the substrate.
Abstract translation: 本发明涉及氟掺杂涂层，其包括在各种基材上含有碳，硅，氧，氢和氟的类金刚石组合物。 优选的基底包括柔性基底，精密边缘基底和电外科器械。 本发明还涉及一种制备涂覆有氟掺杂的类金刚石涂层的基材的方法，其包括将基材定位在真空涂覆室中并沉积含有碳，硅，氧，氢和氟的金刚石组合物 通过共沉积由碳，硅，氧，氢和氟的离子，原子或自由基组成的无簇粒子束，每个颗粒物质的平均自由程超过其源和 衬底生长的颗粒涂层表面。
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公开(公告)号：WO9850936A3
公开(公告)日：1999-03-25
申请号：PCT/US9809396
申请日：1998-05-07
Applicant: ADVANCED REFRACTORY TECH
Inventor： GOEL ARVIND , OUTTEN CRAIG A
CPC classification number: H01J9/20 , H01J9/146 , H01J31/127 , H01J2329/88 , Y10S977/891 , Y10S977/892 , Y10S977/939
Abstract: A display device (10) includes a diamond-like carbon-containing coating material. The coating material includes both secondary electron emission coefficient of less than unity and electrical resistivity tunable over a range of from about 10e to about 10e .
Abstract translation: 显示装置（10）包括类金刚石的含碳涂层材料。 涂层材料包括小于1的二次电子发射系数和在约10e至约10e 16的范围内可调谐的电阻率。
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公开(公告)号：WO0006794A9
公开(公告)日：2000-08-03
申请号：PCT/US9917203
申请日：1999-07-27
Applicant: ADVANCED REFRACTORY TECH , VENKATRAMAN CHANDRA , BRODBECK CYNDI
Inventor： VENKATRAMAN CHANDRA , BRODBECK CYNDI
IPC: G02F1/1333 , B05D3/14 , B05D7/24 , B32B9/00 , C23C16/30 , C23C16/40 , G09F9/30 , C23C16/00 , B23B9/00
CPC classification number: C08J7/123 , B05D1/62 , B05D3/144 , B05D2201/02 , C23C16/30 , C23C16/401
Abstract: The present invention relates to a unique hard coating that provides the necessary characteristics for flat panel display plastic substrates because the coating is amorphous and is comprised of C, H, Si and O. The coating of the present invention is hard, optically transparent, scratch and abrasion resistant and hydrophobic. It is deposited by a low density, low temperature plasma enhanced chemical vapor deposition (PECVD) process and exhibits excellent barrier protection and reduced permeability to moisture, oxygen, helium and other vapors.
Abstract translation: 本发明涉及一种为平板显示器塑料基材提供必要特性的独特硬涂层，因为该涂层是无定形的并且由C，H，Si和O构成。本发明的涂层硬，光学透明，刮擦 耐磨和疏水。 它通过低密度，低温等离子体增强化学气相沉积（PECVD）工艺进行沉积，并具有出色的阻隔保护作用和降低的水分，氧气，氦气和其他蒸气的渗透性。
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公开(公告)号：EP1008157A4
公开(公告)日：2001-02-07
申请号：EP96937640
申请日：1996-09-25
Applicant: ADVANCED REFRACTORY TECH
Inventor： GOEL ARVIND , BRAY DONALD J , MARTIN STEVEN C , BLAKELY KEITH A
CPC classification number: H01G4/08 , Y10S427/103 , Y10T29/435
Abstract: A method of making capacitors (25) comprising, providing as the dielectric (27) and/or conductive layers (26), a material made from a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from Groups 1-7b and 8 of the periodic table.
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公开(公告)号：EP1027483A4
公开(公告)日：2003-09-10
申请号：EP98954990
申请日：1998-10-15
Applicant: ADVANCED REFRACTORY TECH
Inventor： NASSER-FAILI FIROZ , HERB JOHN A , MORENO MIGUEL A
Abstract: A method for polishing the surface of a diamond film with a low power density plasma in a reactor which comprises disposing O2 gas and a fluorinated gas such as SF6, NF3, and C2F6 in the reactor, providing power to the reactor so that the power density in the reactor is between about 1.0 watts/cm2 and about 1.1 watts/cm2 for a first duration, and maintaining temperature in the reactor at between about 200 DEG to about 400 DEG . The method may alternatively comprise disposing a sputter gas such as Ar,O2 or N2 in the reactor, providing power to the reactor so that the power density in the reactor is between about 3.0 watts/cm2 and about 7.5 watts/cm2 for a first duration, and performing a sputter etch, disposing O2 gas and a fluorinated gas such as SF6, NF3, and C2F6 in the reactor, and providing power to the reactor so that the power density in the reactor is between about 1.5 watts/cm2 and about 3.0 watts/cm2 for a second duration.
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Patent Agency Ranking6.发明公开METHOD FOR PRESERVING PRECISION EDGES USING DIAMOND-LIKE NANOCOMPOSITE FILM 失效法降低PREZISER直边使用金刚石状薄膜纳米复合材料
公开(公告)号：EP1007351A4
公开(公告)日：2000-06-14
申请号：EP96935946
申请日：1996-09-25
Applicant: ADVANCED REFRACTORY TECH
Inventor： GOEL ARVIND , BRAY DONALD J
CPC classification number: C23C16/30 , B26B21/60 , B82Y30/00 , C23C16/44 , C23C16/4483 , C23C16/503 , Y10T428/265 , Y10T428/30 , Y10T428/31678
Abstract: A method for preserving the precision-edges of a precision-edged substrate by applying to a substrate a corrosion resistant coating comprising a diamond-like solid state material having interpenetrating atomic scale networks comprising a first diamond-like carbon network stabilized by hydrogen, a silicon network stabilized by oxygen, and optionally at least one network made from dopant elements or dopant compounds containing elements from Groups 1-7b and 8 of the periodic table.
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公开(公告)号：EP0832310A4
公开(公告)日：2001-04-11
申请号：EP96919077
申请日：1996-06-05
Applicant: ADVANCED REFRACTORY TECH
Inventor： DORFMAN VENIAMIN F , GOEL ARVIND
IPC: H05H1/24 , A61F2/00 , A61L27/30 , B05D5/12 , B32B37/00 , C01B31/06 , C04B41/50 , C04B41/85 , C23C14/00 , C23C14/06 , C23C14/22 , C23C16/30 , C23C16/42 , C23C16/44 , C23C16/448 , C23C16/455 , C23C16/503 , C30B29/04 , F42B12/80 , G02B1/10 , G11B5/72 , G11B5/84 , B01J3/06 , B32B3/00 , B32B9/00 , C23C16/00 , C23C16/27 , H01G4/08 , H05H1/02 , H05H1/20
CPC classification number: A61L27/30 , A61F2310/00574 , A61L27/303 , A61L27/306 , B82Y30/00 , C04B41/5002 , C04B41/85 , C23C14/0036 , C23C14/06 , C23C14/0605 , C23C14/221 , C23C16/30 , C23C16/4483 , C23C16/4485 , C23C16/45568 , C23C16/503 , F42B12/80 , G02B1/105 , G02B1/111 , G02B1/16 , G11B5/72 , G11B5/8408 , Y10T428/24917 , Y10T428/24926 , Y10T428/30
Abstract: An electrically tunable coating and method for its fabrication and deposition comprising, as a coating on a substrate, a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups 1-7b and 8 of the periodic table.
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公开(公告)号：AU5326499A
公开(公告)日：2000-02-21
申请号：AU5326499
申请日：1999-07-27
Applicant: ADVANCED REFRACTORY TECH , VENKATRAMAN CHANDRA , BRODBECK CYNDI
Inventor： VENKATRAMAN CHANDRA , BRODBECK CYNDI
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公开(公告)号：AU7294498A
公开(公告)日：1998-11-27
申请号：AU7294498
申请日：1998-05-07
Applicant: ADVANCED REFRACTORY TECH
Inventor： GOEL ARVIND , OUTTEN CRAIG A
Abstract: A diamond-like carbon-containing material useful as a coating for electronic devices including field emission devices and color television tubes, the coatings having both low secondary electron emission coefficients of less than unity and electrical resistivity tunable over a range of from about 10e-2 to about 10e16.
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公开(公告)号：MX9709649A
公开(公告)日：1998-10-31
申请号：MX9709649
申请日：1997-12-05
Applicant: ADVANCED REFRACTORY TECH
Inventor： DORFMAN VENIAMIN F , GOEL ARVIND
IPC: A61F2/00 , A61L27/30 , B05D5/12 , B32B37/00 , C01B31/06 , C04B41/50 , C04B41/85 , C23C14/00 , C23C14/06 , H05H1/24 , C23C14/22 , C23C16/30 , C23C16/42 , C23C16/44 , C23C16/448 , C23C16/455 , C23C16/503 , C30B29/04 , F42B12/80 , G02B1/10 , G11B5/72 , G11B5/84 , H05H01/02 , H05H01/20 , H05H01/24 , C23C16/00 , B05D05/12 , B01J03/06 , B32B03/00 , B32B09/00
Abstract: Se describe un recubrimiento eléctricamente afinable y el método para su fabricacion y deposicion que comprende, como un recubrimiento sobre un sstato, un material en estado solido nanocompuesto, similar al damante, que tiene redes de intetpenetracion a escala atomica de carbono en una red de carbono similar al diamante estabilizada por hidrogeno, una red de silicio similar al vidrio, estabilizada por oxígeno, y opcionalmente al menos una red adicional de elementos impurificadores o compuestos impurificadores que tienen elementos de los grupos 1-7b y 8 de la tabla periodica.
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