Abstract:
A chromatography stand for supporting a chromatographic column in use for chromatographic analysis has a first and a second platen adapted to receive and hold the chromatographic column therebetween. The first and second platens are mounted on a frame in generally opposed relation for relative movement toward and away from each other. At least one of the first and second platens is constructed for plug-in connection to the chromatographic column such that the column is positively located relative to the platens and placed in fluid connection through said at least one platen. In one embodiment, the cartridges can be stacked between the platens. The cartridges can be quickly and efficiently pre-loaded with sample. In one embodiment, the cartridges have an end cap adapted to contact an interior surface of a tube to form a fluid-tight connection between the end cap and the tube.
Abstract:
An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.
Abstract:
Systems and methods for handling wafers include retrieving a first wafer from a wafer cassette using a first arm, transferring the first wafer from the first transfer arm to a second arm, delivering the first wafer for processing to a process chamber using the second arm, removing the first wafer from the process chamber using the first arm, and returning the first wafer to the cassette using the first arm. The systems and methods can include retrieving a first wafer from a wafer cassette using a first arm, delivering the first wafer for processing to a process chamber using the first arm, removing a processed wafer from the process chamber using a second arm, returning the processed wafer to the cassette using the second arm, and iteratively retrieving, delivering, removing and returning wafers from the cassette while alternating arms between iterations.
Abstract:
An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.