플라즈마 처리에 플라즈마 튜닝 봉을 이용하는 방법 및 시스템
    1.
    发明公开
    플라즈마 처리에 플라즈마 튜닝 봉을 이용하는 방법 및 시스템 审中-实审
    用于等离子体处理的等离子体调谐器的方法和系统

    公开(公告)号:KR1020140113464A

    公开(公告)日:2014-09-24

    申请号:KR1020140029756

    申请日:2014-03-13

    CPC classification number: H01J37/32256

    Abstract: Provided is a plasma tuning rod which can be used with a microwave processing system. A wave guide includes a first dielectric part having a first external diameter. A second dielectric part having a second external diameter which is larger than the first external diameter surrounds the first dielectric part. The axis of the second dielectric part can be equal to the axis of the first dielectric part. In some embodiments of the present invention, the dielectric constant of the first dielectric part can be the same as or greater than the dielectric constant of the second dielectric part.

    Abstract translation: 提供了可以与微波处理系统一起使用的等离子体调音杆。 波导包括具有第一外径的第一介电部分。 具有大于第一外径的第二外径的第二电介质部分包围第一电介质部分。 第二电介质部分的轴线可以等于第一电介质部分的轴线。 在本发明的一些实施例中,第一电介质部分的介电常数可以与第二电介质部分的介电常数相同或更大。

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