公开(公告)号：KR101593651B1

公开(公告)日：2016-02-12

申请号：KR1020110045876

申请日：2011-05-16

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이나다타카오 ,  오카무라나오유키 ,  야노히데츠구 ,  하치야요스케

IPC: H01L21/302

CPC classification number: H01L21/67028 ,  H01L21/67017 ,  H01L21/67051 ,  Y10S134/902

Abstract: 기판의린스처리시에기판이열 변형되거나처리액과린스액이반응하는것을방지하여린스액의비산을방지하는것이다. 본발명에서는, 기판의표면을처리액으로액처리한후에처리액보다저온의린스액으로린스처리하는기판액처리에있어서, 액처리와린스처리와의사이에기판의표면의온도를처리액의액 온도미만또한린스액의액 온도보다높은온도로하는중간처리를행하는것으로하였다. 중간처리는, 처리액의액 온도미만또한린스액의액 온도보다높은온도의중간처리액을기판으로공급하는것으로하였다. 또한, 중간처리액을기판의이면으로만공급하는것으로하였다. 또한, 처리액및 린스액의공급을정지한상태로기판을회전시키는것으로하였다. 또한, 액처리시에처리액으로서반응열의생성을수반하는화학반응을행하는복수종류의약액의혼합액을기판으로공급하고또한, 중간처리시에어느한 약액의공급을정지하는것으로하였다.

公开(公告)号：KR101932775B1

公开(公告)日：2019-03-15

申请号：KR1020130080224

申请日：2013-07-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  기요세히로미 ,  야노히데츠구 ,  히라야마츠카사

IPC: H01L21/302

公开(公告)号：KR1020140008254A

公开(公告)日：2014-01-21

申请号：KR1020130080224

申请日：2013-07-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  기요세히로미 ,  야노히데츠구 ,  히라야마츠카사

IPC: H01L21/302

CPC classification number: H01L21/67051 ,  B08B3/04 ,  B08B13/00 ,  H01L21/68735

Abstract: The present invention is to provide a cleaning method for cleansing a cup and a member around the cup. In the cleaning method, a cleaning solution is supplied from the upper part of a cleaning jig to a cleansing jig by holding the cleaning jig (80) in a substrate holding part (52) and rotating it. The cleansing solution supplied to the cleaning jig is spread along the surface of an inclined part formed around the total cleaning jig near the outer edge of the cleaning jig. Therefore, the cup is cleaned.

Abstract translation: 本发明提供一种清洁杯子和杯子周围的部件的清洁方法。 在清洁方法中，通过将清洁夹具（80）保持在基板保持部（52）中并使其旋转，将清洁溶液从清洁夹具的上部供给到清洁夹具。 提供给清洁夹具的清洁溶液沿着靠近清洁夹具的外边缘的整个清洁夹具形成的倾斜部分的表面扩展。 因此，杯子被清洁。

公开(公告)号：KR1020110126558A

公开(公告)日：2011-11-23

申请号：KR1020110045876

申请日：2011-05-16

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이나다타카오 ,  오카무라나오유키 ,  야노히데츠구 ,  하치야요스케

IPC: H01L21/302

CPC classification number: H01L21/67028 ,  H01L21/67017 ,  H01L21/67051 ,  Y10S134/902 ,  H01L21/302

Abstract: PURPOSE: A liquid processing apparatus, a liquid processing method and a computer-readable storage medium storing liquid processing program are provided to the loss inside a substrate processing chamber by preventing the dispersion of processing liquid accompanied by substrate deformation. CONSTITUTION: In a liquid processing apparatus, a liquid processing method and a computer-readable storage medium storing liquid processing program, a substrate supporting unit(40) supports a substrate(2) therein. The substrate supporting unit has a disc turn table in a rotation shaft in horizontal. A processing liquid supply unit(41) process a liquid to a substrate to supply the process liquid to the surface of the substrate. A lines liquid supply unit(42) rinses a substrate by supplying rinse liquid at lower temperature than processing liquid. The lines liquid supply unit has an arm which is mounted in the top of a supporting shaft extended up and down.

Abstract translation: 目的：通过防止伴随基板变形的处理液的分散，向基板处理室内的损失提供液体处理装置，液体处理方法和存储液体处理程序的计算机可读存储介质。 构成：在液体处理装置，液体处理方法和存储液体处理程序的计算机可读存储介质中，基板支撑单元（40）在其中支撑基板（2）。 基板支撑单元在旋转轴中具有水平的盘转台。 处理液体供应单元（41）将液体处理到基板以将处理液体供应到基板的表面。 管线液体供给单元（42）通过在比处理液低的温度下供给冲洗液来冲洗基板。 线液供给单元具有安装在上下延伸的支撑轴的顶部的臂。