Abstract:
본 발명은, 유로를 전환하기 위한 구동 기구의 개수를 삭감할 수 있는 유로 전환 장치를 제공하고, 또한 피처리체를 처리하는 처리 유체의 전용 배출로를 전환하기 위한 구동 기구의 개수를 삭감할 수 있는 액처리 장치를 제공하는 것을 과제로 한다. 웨이퍼(W)에 대하여 복수 종별의 처리 유체를 서로 다른 타이밍에 공급하여 처리를 행하는 액처리 유닛(3)으로부터, 이 액처리 유닛(3)의 분위기를 배기로(35), 유로 전환부(5)를 통해, 복수의 전용 배출로(접속용 유로)(61∼63)에 배기한다. 상기 유로 전환부(5)는, 외통(51)과 그 내부에 마련된 회전통(53)을 구비하고, 상기 회전통(53)의 3개의 개구부(53a∼53c)는, 상기 회전통(53)을 회전시키는 동안에, 서로 대응하는 외통(51)의 3개의 접속구(51a∼51c)와 회전통(51)의 개구부(53a∼53c)의 세트 중 하나가 겹쳐져 연통하고 또한 다른 세트에 대해서는 연통하지 않는 상태가 각 세트 사이에서 순서대로 발생하도록 배치되어 있다.
Abstract:
PURPOSE: An apparatus and a method for coating a chemical solution are provided to suppress use amount of a solvent for cleaning a rear surface of a substrate in forming a coating film. CONSTITUTION: A coating apparatus(2) includes a substrate holding part, a coating nozzle, a rotation driving part, a liquid film forming unit, and a position control unit. The substrate holding part(21) horizontally supports the substrate by holding a central part of a rear surface of the substrate. The coating nozzle supplies a coating solution to a central part of a surface of the substrate. The rotation driving part(22) rotates the substrate holding part. The liquid film forming unit(5) includes a facing surface part and a processing solution supply part. The position control unit(6) is arranged around the substrate holding part in order to suppress top and bottom shaking of a peripheral part of the substrate.
Abstract:
A liquid processing apparatus, a method of mounting and dismounting a cup body, and a storage medium are provided to facilitate operation of mounting and dismounting the cup body from the apparatus and reduce work load of an operator, since a lifting mechanism carries out lifting and lowering of the cup body holder, and notifies the detection of movement to the operator. A liquid processing apparatus(1) which supplies processing liquid from a supply nozzle to a surface of a substrate horizontally held by a substrate support within a case(10), the apparatus comprises a cup body(2), a cup body holder(3), and a lifting mechanism. The cup body surrounds a lateral side of the substrate held by the substrate support, and is detachably mounted to a base body within the case from above. The cup body holder holds the cup body to be mounted and dismounted in a lateral direction. The lifting mechanism lifts and lowers the cup body holder between a first position where the cup is mounted to the base body, and a second position above the first position.
Abstract:
[과제] 컵의둘레벽부에부착된이물질을제거할수 있는기판처리장치및 기판처리장치의세정방법을제공한다. [해결수단] 실시형태의일양태에따른기판처리장치는, 유지부와, 처리액공급부와, 제1 컵과, 제2 컵과, 세정액공급부를구비한다. 유지부는기판을유지한다. 처리액공급부는, 기판에대하여제1 처리액및 제2 처리액을공급한다. 제1 컵은, 둘레벽부를구비하고, 제1 처리액을둘레벽부에의해형성된회수부를통해회수한다. 제2 컵은, 제1 컵에인접하여배치되고, 제2 처리액을회수한다. 세정액공급부는, 제1 컵의회수부에세정액을공급한다. 기판처리장치에있어서는, 세정액공급부에의해공급된세정액을둘레벽부로부터제2 컵측으로오버플로우시킴으로써둘레벽부를세정한다.
Abstract:
본발명에따른기판액처리장치는, 기판을유지하는기판유지대와, 기판유지대를회전시키는회전구동부와, 기판유지대에유지된기판에, 복수종류의처리액을선택적으로공급하는처리액공급부와, 기판유지대의주변에설치되고, 기판유지대에유지되어회전하는기판으로부터비산된처리액을하방으로각각안내하기위해서, 위에서부터차례로설치된제1 안내컵및 제2 안내컵과, 기판유지대와, 제1 안내컵및 제2 안내컵의사이의위치관계를조정하는위치조정기구를포함하고있다. 제1 안내컵및 제2 안내컵의하방영역에, 제1 안내컵에의해안내된처리액을회수하는제1 처리액회수용탱크가설치되어있다. 제1 처리액회수용탱크의내주측에, 제2 안내컵에의해안내된처리액을회수하는제2 처리액회수용탱크가설치되어있다.
Abstract:
The supply amount of a clean gas is reduced without deteriorating process performance. The amount of the clean gas (70) supplied from a clean gas supply apparatus (70,78) to the inner space of a housing (60) when a liquid process is performed on a substrate (W) is less than that of a clean gas (78) of low humidity supplied from the clean gas supply apparatus when a drying process is performed on the substrate. In addition, the amount of a gas discharged through a housing discharge path (64) when a liquid process is performed is less than that of a gas discharged through the housing discharge path when a drying process is performed.
Abstract:
PURPOSE: A liquid processing apparatus, a liquid processing method, and a recording medium with a computer program for performing the liquid processing method are provided to suppress the variation of pressure in a liquid processing unit by controlling a valve. CONSTITUTION: A plurality of liquid processing units(3A-3E) process an object. A common exhaust duct(6) discharges the atmosphere of the liquid processing units. An individual exhaust duct(35) connects each liquid processing unit to the common exhaust duct. An opening and closing device(5) is opened or closed in the individual exhaust duct. An external air suction unit(65) suctions external air in the common exhaust duct.