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公开(公告)号：KR1020110040808A
公开(公告)日：2011-04-20
申请号：KR1020110025725
申请日：2011-03-23
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/3065
CPC classification number: H01J37/32458 , H01J37/32633
Abstract: PURPOSE: A substrate processing apparatus is provided to prevent particles from falling on a substrate from a rectification member, thereby preventing the substrate from being contaminated. CONSTITUTION: A mounting table(3) is installed on the bottom part of a chamber(2). A glass substrate is mounted on the mounting table. The mounting table comprises a metal base plate(5), an electrostatic chuck(6), a shield ring(7), and an insulating ring(8). The electrostatic chuck suctions a glass substrate placed on a convex part(5a) of a base plate. An elevation pin(10) loads or unloads the glass substrate. A power supply line(12) is connected to the base plate of the mounting table and supplies high frequency power.
Abstract translation: 目的：提供一种基板处理装置，以防止颗粒从整流部件落在基板上，从而防止基板被污染。 构成：安装台（3）安装在室（2）的底部。 玻璃基板安装在安装台上。 安装台包括金属基板（5），静电卡盘（6），屏蔽环（7）和绝缘环（8）。 静电吸盘吸附放置在基板的凸部（5a）上的玻璃基板。 升降销（10）装载或卸载玻璃基板。 电源线（12）连接到安装台的底板，并提供高频电力。
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公开(公告)号：KR1020090106997A
公开(公告)日：2009-10-12
申请号：KR1020090029228
申请日：2009-04-06
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/3065
CPC classification number: H01J37/32458 , H01J37/32633
Abstract: PURPOSE: A substrate processing apparatus is provided to prevent a particle from dropping from a rectification unit to a substrate. CONSTITUTION: A substrate processor(1) includes a process container(2), a substrate input and output unit, a mounting unit(3), a process gas supply unit, a plasma generator, an exhaust device, and a rectification unit(9a). The process container receives a substrate(G). The substrate input and output unit inputs and outputs the substrate formed in a lateral side of the process container. The mounting unit mounts the substrate in the process container. The process gas supply unit supplies the process gas to the process container. The plasma generator generates the plasma of the process gas in the process container. The exhaust unit exhausts the process container. The rectifying unit surrounds the substrate on the mounting unit and includes a moving unit for inputting and outputting the substrate on the mounting unit in the position corresponding to the substrate input and output unit.
Abstract translation: 目的：提供一种基板处理装置，用于防止颗粒从精馏单元滴落到基板上。 构成：基板处理器（1）包括处理容器（2），基板输入和输出单元，安装单元（3），处理气体供应单元，等离子体发生器，排气装置和整流单元（9a ）。 处理容器接收基板（G）。 衬底输入和输出单元输入和输出形成在处理容器的侧面的衬底。 安装单元将基板安装在处理容器中。 处理气体供应单元将处理气体供应到处理容器。 等离子体发生器在处理容器中产生处理气体的等离子体。 排气单元排出处理容器。 整流单元围绕安装单元上的基板，并且包括用于在与基板输入和输出单元相对应的位置中在安装单元上输入和输出基板的移动单元。
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公开(公告)号：KR102100032B1
公开(公告)日：2020-04-10
申请号：KR1020180050946
申请日：2018-05-03
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: F16K3/314 , F16K27/04 , F16K51/02 , H01L21/3065
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公开(公告)号：KR101063127B1
公开(公告)日：2011-09-07
申请号：KR1020090029228
申请日：2009-04-06
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/3065
Abstract: PURPOSE: A substrate processing apparatus is provided to prevent a particle from dropping from a rectification unit to a substrate. CONSTITUTION: A substrate processor(1) includes a process container(2), a substrate input and output unit, a mounting unit(3), a process gas supply unit, a plasma generator, an exhaust device, and a rectification unit(9a). The process container receives a substrate(G). The substrate input and output unit inputs and outputs the substrate formed in a lateral side of the process container. The mounting unit mounts the substrate in the process container. The process gas supply unit supplies the process gas to the process container. The plasma generator generates the plasma of the process gas in the process container. The exhaust unit exhausts the process container. The rectifying unit surrounds the substrate on the mounting unit and includes a moving unit for inputting and outputting the substrate on the mounting unit in the position corresponding to the substrate input and output unit.
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