公开(公告)号：KR101217898B1

公开(公告)日：2013-01-02

申请号：KR1020097027399

申请日：2008-08-26

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가베요시로 ,  오타긴야 ,  기타가와준이치

IPC: H01L21/3065 ,  H01L21/31

CPC classification number: H01L21/02252 ,  H01J37/32963 ,  H01L21/02238

Abstract: 플라즈마처리장치(100)는, 챔버(1) 안에서플라즈마를생성시키는플라즈마생성수단과, 피처리체[웨이퍼(W)]를향해이동하는플라즈마안의활성종의입자수의적산값을계측하는계측부(60)와, 계측된입자수의적산값이설정값에도달한경우에, 플라즈마처리를종료시키도록제어하는제어부(50)를구비하고있다. 계측부(60)는, 광원부(61)로부터미리결정된레이저광을플라즈마를향해조사하고, VUV 모노크로미터를구비한검지부(63)로수광함으로써활성종의입자수를측정한다.

公开(公告)号：KR1020100045955A

公开(公告)日：2010-05-04

申请号：KR1020097027399

申请日：2008-08-26

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가베요시로 ,  오타긴야 ,  기타가와준이치

IPC: H01L21/3065 ,  H01L21/31

CPC classification number: H01L21/02252 ,  H01J37/32963 ,  H01L21/02238

Abstract: A plasma processing apparatus (100) is provided with a plasma generating means for generating plasma in a chamber (1); a measuring section (60) for measuring the integration value of the particle number of active species moving toward a subject to be processed (wafer (W)) in plasma; and a control section (50) which controls plasma processing to be ended when the integration value of the measured particle number reaches a set value. The measuring section (60) measures the particle number of the species by radiating a prescribed laser beam toward plasma from a light source section (61) and receiving light by a detecting section (63) having a VUV monochromator.

Abstract translation: 等离子体处理装置（100）设置有用于在室（1）中产生等离子体的等离子体产生装置; 用于测量在等离子体中朝向待处理对象（晶片（W））移动的活性物质的粒子数的积分值的测量部分（60） 以及控制部（50），当所测量的粒子数的积分值达到设定值时，控制等离子体处理结束。 测量部分（60）通过从光源部分（61）向等离子体辐射规定的激光束并通过具有VUV单色仪的检测部分（63）接收光来测量物质的粒子数。