公开(公告)号：KR1020140037770A

公开(公告)日：2014-03-27

申请号：KR1020130110463

申请日：2013-09-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오타요시하루 ,  고다마무네히사 ,  미야자키후미히로 ,  이케다가츠히로

IPC: H01L21/208

Abstract: The purpose of the present invention is to improve the layer thickness uniformity of a coating layer by efficiently and easily preventing a frame phenomenon (coffee strain) of the coating layer formed on a substrate. The coating apparatus includes a long-chuck-type slit nozzle (10), a chemical solution supply part (12), a scanning unit (14), a stage (16), a solvent atmosphere generation part (18), and a control part (20), is installed in a clean room, and is operated under the down flow of clean air. The solvent atmosphere generation part (18) generates the atmosphere of solvent vapor around the substrate (G) of the stage (16), and has a solvent absorption and desorption of moisture part which is installed around a region where the substrate (G) of the stage (16) is arranged, and a solvent supply part (28) for supplying a solvent to the solvent absorption and desorption of moisture part through a solvent supply line (26). [Reference numerals] (12) Chemical solution supply part; (14) Scanning unit; (16) Stage; (20) Control part; (28) Solvent supply part

Abstract translation: 本发明的目的是通过有效且容易地防止在基板上形成的涂层的框架现象（咖啡变形）来改善涂层的层厚均匀性。 涂布装置包括长卡盘式狭缝喷嘴（10），化学溶液供给部（12），扫描单元（14），载物台（16），溶剂气体生成部（18） 部件（20）安装在洁净室内，并在清洁空气的下流下运行。 溶剂气体产生部件（18）在工作台（16）的基板（G）的周围产生溶剂蒸气的气氛，并且具有吸收和解吸部分的水分，该部分被安装在基板 布置了工作台（16），以及溶剂供应部件（28），用于通过溶剂供应管线（26）将溶剂供给溶剂吸收和解吸湿部件。 （附图标记）（12）化学溶液供给部; （14）扫描单元; （16）阶段; （20）控制部分; （28）溶剂供给部

公开(公告)号：KR102122613B1

公开(公告)日：2020-06-12

申请号：KR1020130110463

申请日：2013-09-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오타요시하루 ,  고다마무네히사 ,  미야자키후미히로 ,  이케다가츠히로

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/687

公开(公告)号：KR1020140043863A

公开(公告)日：2014-04-11

申请号：KR1020130109049

申请日：2013-09-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이케다가츠히로 ,  사카이미츠히로 ,  가지와라히로노부 ,  오가타츠네모토 ,  히메노가즈오미

IPC: H01L21/208 ,  H01L21/302

CPC classification number: G03F7/168

Abstract: The objective of the present invention is to conveniently and efficiently suppress the generation of frames at the peripheral part of the coating film (RM) formed at a substrate (G) in a drying process and to improve uniformity in the thickness of the film after drying. In a process for suppressing the generation of a frame, when solvent is drying at each part of the coating film (RM), which is in a liquid state, of the substrate (G) in an infrared radiation chamber in a drying process, the liquid flows from the central part to the peripheral part at the coating film (RM) due to the high drying speed of the solvent at the peripheral part where the surface in contact with the outer part is larger than the central part of the coating film, and also certain temperature difference between the central part and the peripheral part of the coating film (RM) is generated due to the local infrared radiation for the peripheral part of the coating film (RM). Therefore, the generation of a frame is prevented or suppressed, since surface tension between the central part and the peripheral part of the coating film (RM) is balanced.

Abstract translation: 本发明的目的是在干燥过程中方便有效地抑制在形成于基板（G）的涂膜（RM）的周边部分处的框架的产生，并且改善干燥后的膜厚度的均匀性 。 在抑制框的产生的过程中，当在干燥过程中在红外线辐射室中的基板（G）的液膜状态的各部分的溶剂干燥时， 由于在与外部部分接触的表面大于涂膜中心部分的周边部分处的溶剂的高干燥速度，液体在涂膜（RM）从中心部​​分流向周边部分， 并且由于涂膜（RM）的周边部分的局部红外辐射，也产生涂膜（RM）的中心部分和周边部分之间的某些温度差。 因此，由于涂膜（RM）的中心部分和周边部分之间的表面张力平衡，所以防止或抑制了框架的产生。