公开(公告)号：KR1020080080925A

公开(公告)日：2008-09-05

申请号：KR1020080018641

申请日：2008-02-29

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부

IPC: G02F1/13

CPC classification number: G02F1/1303 ,  G03F7/168 ,  H01L21/67034

Abstract: A substrate processing apparatus is provided to reduce costs required for the apparatus and improve productivity when processing plural processed substrates. A conveyance unit horizontally conveys a processed substrate(G) on a conveyance path as upwardly placing the processed substrate. A chamber unit(1,2,3) is installed on the conveyance path, and performs drying processing for the substrate carried by the conveyance unit. The chamber unit includes an air supply unit(81a,81b,81c) installed in a downstream side of a substrate conveyance direction, and an exhausting unit(82a,82b,82c) installed in an upstream side of the substrate conveyance direction or includes an air supply unit installed in an upstream side of the substrate conveyance direction, and an exhausting unit installed in a downstream side of the substrate conveyance direction. Drying gas is supplied by the air supply unit. The supplied drying gas is exhausted by the exhausting unit. Therefore, a drying gas flow contacted with an upper surface of the substrate conveyed into the chamber unit is formed.

Abstract translation: 提供了一种基板处理装置，以减少装置所需的成本，并且在处理多个处理的基板时提高生产率。 输送单元在向上放置经处理的基板的同时，在输送路径上水平地输送经处理的基板（G）。 在输送路径上安装有室单元（1,2,3），对由搬送单元承载的基板进行干燥处理。 室单元包括安装在基板输送方向的下游侧的供气单元（81a，81b，81c）和安装在基板输送方向的上游侧的排气单元（82a，82b，82c），或者包括 空气供给单元安装在基板输送方向的上游侧，排气单元安装在基板输送方向的下游侧。 干燥气体由供气单元提供。 供给的干燥气体由排气单元排出。 因此，形成了与输送到室单元中的基板的上表面接触的干燥气体流。

公开(公告)号：KR101366407B1

公开(公告)日：2014-02-24

申请号：KR1020090075956

申请日：2009-08-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  오오따요시하루

IPC: H01L21/67 ,  H01L21/302

Abstract: 본 발명의 과제는 직선적으로 연장되는 왕복로의 프로세스 라인을 따라서 복수의 처리 유닛을 프로세스 플로우의 순으로 배열하여 배치하는 인라인형 시스템에 있어서 전체 길이 사이즈의 단축화, 또는 택트 타임 단축화를 효율적으로 실현하는 것이다.
이 도포 현상 처리 시스템(10)에 있어서는, 카세트 스테이션(C/S)(14)과 왕로의 프로세스 라인(A)과 인터페이스 스테이션(I/F)(18)과 귀로의 프로세스 라인(B)으로 둘러싸여 X 방향으로 똑바로 연장되는 내부(courtyard)의 스페이스(NS)가 형성된다. 이 내부 스페이스(NS)에, 제3 군의 유닛으로서 2대의 감압 건조 유닛(66L, 66R)이 서로 마주 보고 소정의 위치에 각각 설치되는 동시에, 양 유닛(66L, 66R) 사이에 1대의 반송 장치(68)가 설치된다.
처리 시스템, 감압 건조 유닛, 반송 장치, 카세트 스테이션, 인터페이스 스테이션

公开(公告)号：KR1020100022439A

公开(公告)日：2010-03-02

申请号：KR1020090075956

申请日：2009-08-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  오오따요시하루

IPC: H01L21/67 ,  H01L21/302

CPC classification number: H01L21/67173 ,  G03F7/16 ,  G03F7/30

Abstract: PURPOSE: A processing system is provided to short a total length size by arranging a processing unit in a process flow order. CONSTITUTION: A processing system comprises a first process line, a second process line, a processing unit, and a first transfer system(22) of a third group. The first process line arranges the processing unit of the first group in a row through a transfer system unit. The second process line arranges the processing unit of the second group in a row through a transfer system unit. The second process line forms the first process line and an internal space. The processing unit of a third group is arranged in the internal space. The first transfer system carries the substrate from the processing unit into a substrate transfer unit.

Abstract translation: 目的：提供处理系统，通过以处理流程顺序布置处理单元来缩短总长度大小。 构成：处理系统包括第三组的第一处理线，第二处理线，处理单元和第一传送系统（22）。 第一处理线通过传送系统单元将第一组的处理单元一行排列。 第二处理线通过传送系统单元将第二组的处理单元排成一列。 第二个生产线形成第一个生产线和一个内部空间。 第三组的处理单元布置在内部空间中。 第一传送系统将基板从处理单元传送到基板传送单元。

公开(公告)号：KR1020070093845A

公开(公告)日：2007-09-19

申请号：KR1020070024367

申请日：2007-03-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  사까이미쯔히로 ,  가끼노아끼라

IPC: B65G49/06 ,  H01L21/68 ,  H01L21/67

Abstract: A substrate buffer device, a method of buffering a substrate, a substrate processing apparatus, and a computer readable storage medium are provided to prevent the dispersion of particles and to improve a throughput. A substrate buffer device includes a shelf portion(5), an elevator, a controller, a conveyor, and a detector(105). The shelf portion is moved to a conveying line. The shelf portion includes plural loading frames for loading a substrate to the conveying line. The elevator elevates the shelf portion to move one of the plural loading frames to the conveying line. The controller controls an elevation of the shelf portion by the elevator based on a detection signal of the detector. The conveyor conveys the substrate along a conveying direction when the plural loading frames are moved to the conveying line. The detector is provided at an upstream of the conveying direction to be spaced apart from the loading frames, and detects the substrate conveyed to the conveying line.

Abstract translation: 提供衬底缓冲装置，缓冲衬底的方法，衬底处理装置和计算机可读存储介质，以防止颗粒的分散并提高生产量。 衬底缓冲装置包括搁架部分（5），电梯，控制器，传送器和检测器（105）。 搁板部分移动到输送线。 搁架部分包括用于将基板装载到输送线的多个装载框架。 电梯提升架子部分，使多个装载框架中的一个移动到传送线。 控制器基于检测器的检测信号控制电梯的货架部分的高度。 当多个装载架移动到输送线时，输送机沿输送方向输送基板。 检测器设置在输送方向的上游，与装载框架间隔开，并且检测输送到输送线的基板。

公开(公告)号：KR1020140043863A

公开(公告)日：2014-04-11

申请号：KR1020130109049

申请日：2013-09-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이케다가츠히로 ,  사카이미츠히로 ,  가지와라히로노부 ,  오가타츠네모토 ,  히메노가즈오미

IPC: H01L21/208 ,  H01L21/302

CPC classification number: G03F7/168

Abstract: The objective of the present invention is to conveniently and efficiently suppress the generation of frames at the peripheral part of the coating film (RM) formed at a substrate (G) in a drying process and to improve uniformity in the thickness of the film after drying. In a process for suppressing the generation of a frame, when solvent is drying at each part of the coating film (RM), which is in a liquid state, of the substrate (G) in an infrared radiation chamber in a drying process, the liquid flows from the central part to the peripheral part at the coating film (RM) due to the high drying speed of the solvent at the peripheral part where the surface in contact with the outer part is larger than the central part of the coating film, and also certain temperature difference between the central part and the peripheral part of the coating film (RM) is generated due to the local infrared radiation for the peripheral part of the coating film (RM). Therefore, the generation of a frame is prevented or suppressed, since surface tension between the central part and the peripheral part of the coating film (RM) is balanced.

Abstract translation: 本发明的目的是在干燥过程中方便有效地抑制在形成于基板（G）的涂膜（RM）的周边部分处的框架的产生，并且改善干燥后的膜厚度的均匀性 。 在抑制框的产生的过程中，当在干燥过程中在红外线辐射室中的基板（G）的液膜状态的各部分的溶剂干燥时， 由于在与外部部分接触的表面大于涂膜中心部分的周边部分处的溶剂的高干燥速度，液体在涂膜（RM）从中心部​​分流向周边部分， 并且由于涂膜（RM）的周边部分的局部红外辐射，也产生涂膜（RM）的中心部分和周边部分之间的某些温度差。 因此，由于涂膜（RM）的中心部分和周边部分之间的表面张力平衡，所以防止或抑制了框架的产生。

公开(公告)号：KR101268261B1

公开(公告)日：2013-05-31

申请号：KR1020070024367

申请日：2007-03-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  사까이미쯔히로 ,  가끼노아끼라

IPC: B65G49/06 ,  H01L21/68 ,  H01L21/67

Abstract: 기판버퍼장치(36)는반송라인(A)에진출가능하고, 또한반송라인(A)을반송된기판(G)을적재가능한적재대(5a 내지 5f)를상하로복수단갖는선반부(5)와, 선반부(5)를승강시켜적재대(5a 내지 5f) 중어느하나를반송라인(A)에진출시키는승강기구(6)를구비하고, 각적재대(5a 내지 5f)는반송라인(A)에진출하였을때에, 기판(G)을반송방향을따라반송하는컨베이어기구(50a 내지 50f)를갖고반송라인(A)의일부로서기능하고, 반송라인(A)에진출하고있는적재대(5a)에반송라인(A)을반송되어온 기판(G)을적재하고, 승강기구(6)에의해선반부(5)가승강되어기판(G)을적재대(5a)와함께반송라인(A)으로부터퇴피시킨다.

公开(公告)号：KR1020120064038A

公开(公告)日：2012-06-18

申请号：KR1020110130164

申请日：2011-12-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  가지와라히로노부 ,  도노까와가쯔히로

IPC: H01L21/027 ,  H01L21/302

CPC classification number: H01L21/302 ,  G03F7/32 ,  G03F7/70916 ,  H01L21/0274

Abstract: PURPOSE: A developer, a developing coating system including the same, and a developing process are provided to prevent the degradation of yield by suppressing the damage of a base layer due to a developing solution. CONSTITUTION: A transferring device sends back a substrate(S). A developing solution supplier supplies a developing solution(DL) to the substrate which is returned by the transferring device. A developing region is installed at the downstream side of a returning direction of the substrate. The substrate which is covered with the developing solution at the developing region is returned by the transferring device. A washing solution supplier supplies a washing solution to the substrate which exists in the developing region.

Abstract translation: 目的：提供一种显影剂，包含其的显影涂布体系和显影方法，以通过抑制由于显影液而导致的基底层的损伤来防止产率的降低。 构成：转印装置发回衬底（S）。 开发解决方案供应商向转移装置返回的基板提供显影液（DL）。 显影区域安装在基板返回方向的下游侧。 在显影区域被显影液覆盖的基板由转印装置返回。 洗涤液供应商将洗涤液供给存在于显影区域中的基材。

公开(公告)号：KR1020100036974A

公开(公告)日：2010-04-08

申请号：KR1020090092088

申请日：2009-09-29

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오오따요시하루 ,  가지와라히로노부 ,  다나까시노부

IPC: G03F7/26

CPC classification number: G03F7/16 ,  G03F7/26 ,  G03F7/3057 ,  G03F7/7075 ,  H01L21/6715

Abstract: PURPOSE: A resist coating and developing processing system is provided to efficiently realize the shortening of tact time or total length size by arranging a plurality of treatment units in an order of a process flow. CONSTITUTION: An inline type resist coating and developing processing system(10) for performing a series of processing including resist coating and developing processes on an untreated substrate by connecting a plurality of processing units as a process flow, comprises a proceeding process line and a returning process line. The proceeding process line arranges at least a cleaning part(26), a resist coating part(28), and a first drying/heat treatment part(30) in a longitudinal direction of a system in a process order. The returning process line arranges at least a developing part(92) and a second drying/heat treatment part in a second direction opposite to the first direction.

Abstract translation: 目的：提供一种抗蚀剂涂层和显影处理系统，通过以处理流程的顺序布置多个处理单元，有效地实现了节拍时间或总长度尺寸的缩短。 构成：用于通过连接作为处理流程的多个处理单元在未处理的基板上进行包括抗蚀剂涂覆和显影处理的一系列处理的在线型抗蚀剂涂覆和显影处理系统（10）包括进行的处理线和返回的 生产线。 前进处理线按照处理顺序在系统的纵向方向至少布置清洁部件（26），抗蚀剂涂覆部分（28）和第一干燥/热处理部分（30）。 返回处理线在与第一方向相反的第二方向上至少布置显影部（92）和第二干燥/热处理部。