막형성방법 및 막형성장치
    2.
    发明公开
    막형성방법 및 막형성장치 失效
    薄膜成型方法和薄膜成型装置

    公开(公告)号:KR1020080063730A

    公开(公告)日:2008-07-07

    申请号:KR1020080049193

    申请日:2008-05-27

    Abstract: A method and an apparatus for forming films are provided to enhance productivity and reduce the number of ultraviolet lamps by radiating ultraviolet rays while carrying wafers. An apparatus for forming films includes a rotation unit, a supply unit, and a radiation unit(50). The rotation unit supports and rotates a substrate. The supply unit supplies insulation film materials on the substrate while rotating the substrate by the rotation unit. The radiation unit radiates plasma on a surface of an insulation film formed on the substrates by the supply unit while rotating the substrate by the rotation unit. The radiation unit is a plasma generator using inductively coupled plasma.

    Abstract translation: 提供了一种用于形成膜的方法和装置,以便在携带晶片的同时通过辐射紫外线来提高生产率并减少紫外线灯的数量。 一种用于形成膜的设备包括旋转单元,供应单元和辐射单元(50)。 旋转单元支撑并旋转衬底。 供给单元在通过旋转单元旋转基板的同时在基板上提供绝缘膜材料。 辐射单元在通过旋转单元旋转基板的同时通过供给单元在形成在基板上的绝缘膜的表面上辐射等离子体。 辐射单元是使用电感耦合等离子体的等离子体发生器。

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