公开(公告)号：KR1020100028499A

公开(公告)日：2010-03-12

申请号：KR1020090082873

申请日：2009-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가또오히또시 ,  혼마마나부 ,  하네이시도모끼

IPC: H01L21/20 ,  H01L21/683

CPC classification number: C23C16/4585 ,  C23C16/401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45551

Abstract: PURPOSE: A film forming apparatus, a substrate processing apparatus and a rotating table are provided to prevent contamination of a rotator table and around it by supplying a plurality of reaction gases successively. CONSTITUTION: A film forming apparatus comprises a spinning table(2), a substrate mounting domain, a first reaction gas supply unit, a second reaction gas supply unit, an isolation region, a center part region, an exhaust pipe(61), an upper fixture, and a lower fixture. The spinning table is installed within the vacuum container(1). The substrate mounting unit places the substrate in the spinning table. The first reaction gas supply unit supplies the first reaction gas. The second reaction gas supply unit supplies the second reaction gas. The isolation region comprises a separation gas supply unit and a ceiling surface. The separation gas supply unit supplies the separation gas. The separation gas divides the first process region and the second process region. The center part region comprises a discharge hole. The discharge hole discharges the separation gas. The exhaust pipe exhausts the separation gas and the reaction gas.

Abstract translation: 目的：提供成膜装置，基板处理装置和旋转台，以通过连续供给多个反应气体来防止旋转台及其周围的污染。 构成：成膜装置包括纺丝台（2），基板安装区域，第一反应气体供应单元，第二反应气体供应单元，隔离区域，中心区域，排气管（61），排气管 上夹具和下夹具。 旋转台安装在真空容器（1）内。 基板安装单元将基板放置在旋转台中。 第一反应气体供给单元供应第一反应气体。 第二反应气体供给单元供给第二反应气体。 隔离区域包括分离气体供应单元和天花板表面。 分离气体供给单元供给分离气体。 分离气体分割第一处理区域和第二处理区域。 中心部分区域包括排放孔。 排放孔排出分离气体。 排气管排出分离气体和反应气体。

公开(公告)号：KR101563749B1

公开(公告)日：2015-10-27

申请号：KR1020090082743

申请日：2009-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가또오히또시 ,  혼마마나부 ,  하네이시도모끼

IPC: H01L21/20

CPC classification number: C23C16/45551 ,  C23C16/401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/4583

Abstract: 성막장치는, 회전테이블과, 회전테이블의주연으로부터회전중심을향하여설치되는제1 반응가스공급부및 제2 반응가스공급부와, 그사이에설치되는제1 분리가스공급부를포함한다. 제1 반응가스공급부를포함하고제1 높이를갖는제1 공간과, 제2 반응가스공급부를포함하고제2 높이를갖는제2 공간과, 제1 분리가스공급부를포함하고제1 및제2 높이보다낮은제3 공간이형성된다. 회전테이블의회전중심의하방에설치된모터가, 회전테이블을회전구동시킨다. 회전테이블의회전축과모터의구동축은공전하지않도록결합된다.

公开(公告)号：KR101343250B1

公开(公告)日：2013-12-18

申请号：KR1020070102328

申请日：2007-10-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 나까오겐 ,  가또오히또시 ,  오까베쯔네유끼 ,  오까다미쯔히로 ,  혼마마나부 ,  하네이시도모끼

IPC: H01L21/304

CPC classification number: C23C16/4405 ,  B08B7/00 ,  B08B9/00 ,  B08B9/027 ,  C23C16/455

Abstract: 박막형성장치(1)는, 반응실(2)과, 반응실(2)에연결된배기관(5)을갖고, 반응실(2) 또는배기관(5)에불소와수소를포함하는클리닝가스를공급하기위해, 불소도입관(17c)과수소도입관(17d)이반응실(2)에연결되어있다. 이중 수소도입관(17d)은, 내부유로(174)와, 내부유로(174)를덮도록형성된외부유로(175)를갖고있다. 내부유로(174)로부터수소가공급되고, 외부유로(175)로부터질소가공급된다. 이로인해, 내부유로(174)로부터공급된수소는, 그주위가질소로덮인상태에서수소도입관(17d)으로부터공급된다.

公开(公告)号：KR1020100028497A

公开(公告)日：2010-03-12

申请号：KR1020090082870

申请日：2009-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가또오히또시 ,  혼마마나부 ,  하네이시도모끼 ,  아이까와가쯔요시

IPC: H01L21/205 ,  C23C16/00 ,  H01L21/02

CPC classification number: C23C16/4585 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45551 ,  C23C16/52

Abstract: PURPOSE: An apparatus and a method for forming a film, a substrate process apparatus and a computer-readable storage media are provided to reduce a detection error of the rotation position of a rotating table using a position detection unit. CONSTITUTION: An apparatus for forming a film includes a rotating table(2), a first reaction gas supply unit, a second reaction gas supply unit, a first separation gas supply unit, a position detection unit and an area to be detected(25). A recess part is formed on the surface of the rotating table. A substrate is loaded on the rotating table. The rotation position of the rotating table is detected by the position detection unit. The area to be detected is arranged in the peripheral of the rotating table.

Abstract translation: 目的：提供一种用于形成膜的装置和方法，基板处理装置和计算机可读存储介质，以减少使用位置检测单元的旋转台的旋转位置的检测误差。 构成：用于形成膜的装置包括旋转台（2），第一反应气体供应单元，第二反应气体供应单元，第一分离气体供应单元，位置检测单元和待检测区域（25） 。 在旋转台的表面上形成凹部。 将基板装载在旋转台上。 旋转台的旋转位置由位置检测单元检测。 要检测的区域布置在旋转台的周边。

公开(公告)号：KR1020100028492A

公开(公告)日：2010-03-12

申请号：KR1020090082743

申请日：2009-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가또오히또시 ,  혼마마나부 ,  하네이시도모끼

IPC: H01L21/20

CPC classification number: C23C16/45551 ,  C23C16/401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/4583

Abstract: PURPOSE: An apparatus and a method for forming a film, a substrate process apparatus and a computer-readable storage media are provided to detect the rotation position of a rotatable table using a position detection unit. CONSTITUTION: An apparatus for forming a film includes a rotatable table(2), a first reaction gas supply unit, a second reaction gas supply unit, a fist separation gas supply unit, a position detection unit and an area to be detected(25). A substrate is loaded on the rotatable table. The rotation position of the rotatable table is detected by the position detection unit. The area to be detected is arranged on the peripheral of the rotatable table and is detected by the position detection unit.

Abstract translation: 目的：提供一种用于形成膜的装置和方法，基板处理装置和计算机可读存储介质，以使用位置检测单元来检测可旋转台的旋转位置。 构成：用于形成膜的装置包括可转动台（2），第一反应气体供应单元，第二反应气体供应单元，第一分离气体供应单元，位置检测单元和待检测区域（25） 。 基板被装载在可旋转工作台上。 旋转台的旋转位置由位置检测单元检测。 要检测的区域被布置在可旋转台的周边上，并由位置检测单元检测。

公开(公告)号：KR1020080033102A

公开(公告)日：2008-04-16

申请号：KR1020070102328

申请日：2007-10-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 나까오겐 ,  가또오히또시 ,  오까베쯔네유끼 ,  오까다미쯔히로 ,  혼마마나부 ,  하네이시도모끼

IPC: H01L21/304

CPC classification number: C23C16/4405 ,  B08B7/00 ,  B08B9/00 ,  B08B9/027 ,  C23C16/455

Abstract: A gas supply apparatus, a gas supply method, a cleaning method of a thin-film forming apparatus, a thin-film forming method and a thin-film forming apparatus are provided to clean a heat treatment apparatus stably by preventing damage of components near a nozzle of a hydrogen inlet. A thin-film forming apparatus(1) comprises a reaction chamber(2) and an exhaust tube(5). A fluorine inlet and a hydrogen inlet are connected with the reaction chamber, so as to supply a cleaning gas containing the fluorine and hydrogen into the reaction chamber or exhaust tube. The hydrogen inlet comprises an internal flow channel and an external flow channel which covers the internal flow channel. The hydrogen is supplied through the internal flow channel, and the nitrogen is supplied from the external flow channel. Thus, the hydrogen supplied from the internal flow channel is supplied from the hydrogen inlet, in a state that the hydrogen is surrounded with the nitrogen.

Abstract translation: 提供气体供给装置，气体供给方法，薄膜形成装置的清洁方法，薄膜形成方法和薄膜形成装置，以通过防止在附近的部件的损坏来稳定地清洁热处理装置 喷嘴的氢气入口。 薄膜形成装置（1）包括反应室（2）和排气管（5）。 氟入口和氢气入口与反应室连接，以将含氟和氢气的清洁气体供应到反应室或排气管中。 氢气入口包括内部流动通道和覆盖内部流动通道的外部流动通道。 通过内部流路供给氢，从外部流路供给氮。 因此，在氢被氮气包围的状态下，从氢气入口供给从内部流路供给的氢。