고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    1.
    发明公开
    고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    具有高热稳定性和高分辨率的阴离子型感光树脂组合物,以及其制备的硬化过氧化物层

    公开(公告)号:KR1020140042163A

    公开(公告)日:2014-04-07

    申请号:KR1020120108534

    申请日:2012-09-28

    Abstract: The present invention relates to a negative-type photosensitive resin composition having high thermal resistance and high resolution containing an organic siloxane polymer and an acryl copolymer at the same time, and a hardened layer prepared therefrom. The negative-type photosensitive resin composition contains: (1) the organic siloxane polymer; (2) a random copolymer including (2-1) a structure unit induced from ethylene unsaturated carboxylic acid, ethylene unsaturated carboxylic acid anhydride, or a mixture thereof, and (2-2) a structure unit induced from an ethylene unsaturated compound with an aromatic ring; (3) an acrylate based compound with one or more ethylene unsaturated double bond; and (4) a photopolymerization initiator. The organic siloxane polymer includes: a siloxane unit (a) with a (meth)acrylate group as a polymerization unit; and a siloxane unit (b) with one or more functional groups selected from an epoxy group, an oxetane group, a hydroxy group, and a thiol group.

    Abstract translation: 本发明涉及同时具有有机硅氧烷聚合物和丙烯酸共聚物的耐热性和高分辨率的负型感光性树脂组合物及其制备的硬化层。 负型感光性树脂组合物含有:(1)有机硅氧烷聚合物; (2)包含(2-1)由乙烯不饱和羧酸,乙烯不饱和羧酸酐或其混合物引发的结构单元的无规共聚物,(2-2)由乙烯不饱和化合物诱导的结构单元, 芳香环 (3)具有一个或多个乙烯不饱和双键的丙烯酸酯类化合物; 和(4)光聚合引发剂。 有机硅氧烷聚合物包括:具有(甲基)丙烯酸酯基的硅氧烷单元(a)作为聚合单元; 和具有一个或多个选自环氧基,氧杂环丁烷基,羟基和硫醇基的官能团的硅氧烷单元(b)。

    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    3.
    发明公开
    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    阳离子型感光树脂组合物和硬化过氧化物层

    公开(公告)号:KR1020140049722A

    公开(公告)日:2014-04-28

    申请号:KR1020120115875

    申请日:2012-10-18

    Abstract: The present invention relates to a positive photosensitive resin composition and a hardened film prepared therefrom. The positive photosensitive resin composition includes: one or more compounds selected from a group consisting of an silane compound represented by chemical formula 1, its hydrolyzate, and condensate of the hydrolyzate; 1, 2-diazide compounds; and an amino-based silane coupling agent represented by chemical formula 2. The hardened film prepared using the photosensitive resin composition of the present invention has improved physical properties like adhesion on a silicon nitride (SiNx) substrate, pattern developing properties, heat resistance, and light transmittance, thereby being able to be used as a protective film for electronic parts.

    Abstract translation: 本发明涉及一种正型感光性树脂组合物及其制备的硬化膜。 正型感光性树脂组合物包括:选自由化学式1表示的硅烷化合物,其水解物和水解产物的缩合物的一种或多种化合物; 1,2二叠氮化合物; 和由化学式2表示的氨基类硅烷偶联剂。使用本发明的感光性树脂组合物制备的硬化膜具有改善的物理性能,如对氮化硅(SiNx)基材的粘附性,图案显影性,耐热性和 透光率,因此能够用作电子部件的保护膜。

    유기실록산 중합체를 포함하는 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    4.
    发明公开
    유기실록산 중합체를 포함하는 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 无效
    包含有机硅氧烷聚合物的负型型感光树脂组合物和其制备的硬化过氧化物层

    公开(公告)号:KR1020140049717A

    公开(公告)日:2014-04-28

    申请号:KR1020120115860

    申请日:2012-10-18

    Abstract: The present invention relates to a negative photosensitive resin composition including an organosiloxane polymer and a hardened film prepared therefrom. The negative photosensitive resin composition includes: an rganosiloxane polymer; an allyl-based compound having at least one ethylenically unsaturated double bond, a vinyl-based compound, or a mixture thereof; and a photopolymerization initiator. The hardened film prepared using the negative photosensitive resin composition has improved physical properties like pattern developing properties, surface hardness, heat resistance, light transmittance, acid resistance, alkali resistance, and solvent resistance, thereby being able to be used as a protective film for electronic parts.

    Abstract translation: 本发明涉及包含有机硅氧烷聚合物和由其制备的硬化膜的负型感光性树脂组合物。 负型感光性树脂组合物包括:粗硅氧烷聚合物; 具有至少一个烯键式不饱和双键的烯丙基类化合物,乙烯基类化合物或其混合物; 和光聚合引发剂。 使用负型感光性树脂组合物制备的硬化膜具有如图案显影性能,表面硬度,耐热性,透光性,耐酸性,耐碱性和耐溶剂性等改善的物理性能,因此能够用作电子保护膜 部分。

    유무기 복합 실록산계 고분자 및 이를 포함하는 포지티브형 감광성 수지 조성물
    5.
    发明公开
    유무기 복합 실록산계 고분자 및 이를 포함하는 포지티브형 감광성 수지 조성물 审中-实审
    有机无机混合硅氧烷基聚合物和包含相同的阳离子型感光树脂组合物

    公开(公告)号:KR1020140058847A

    公开(公告)日:2014-05-15

    申请号:KR1020120125187

    申请日:2012-11-07

    Abstract: The present invention relates to an organic-inorganic hybrid siloxane-based polymer and a positive photosensitive resin composition including the same. The organic-inorganic hybrid siloxane-based polymer includes one or more of structural units (A) and one or more of structural units (B). Structural units (A) are derived from a silane-based compound selected from a group constituted by a silane compound represented by chemical formula (1), its hydrolyzate and a condensate of the hydrolyzate. Structural units (B) are derived from an organometallic compound represented by chemical formula (2). The weight-average molecular weight of the siloxane-based inorganic polymer compound is 500 to 200,000. A cured film produced by using a photosensitive resin composition including the siloxane-based inorganic polymer compound is highly heat-resistant and highly transparent and has excellent physical properties such as sensitivity, hardness, adhesion to a substrate, and the refractive index.

    Abstract translation: 本发明涉及一种有机 - 无机杂化硅氧烷基聚合物和包含其的正性感光性树脂组合物。 有机 - 无机杂化硅氧烷类聚合物包括结构单元(A)和结构单元(B)中的一种或多种中的一种或多种。 结构单元(A)衍生自选自由化学式(1)表示的硅烷化合物,其水解产物和水解产物的缩合物构成的基团的硅烷类化合物。 结构单元(B)衍生自化学式(2)表示的有机金属化合物。 硅氧烷类无机高分子化合物的重均分子量为500〜200,000。 通过使用包含硅氧烷类无机高分子化合物的感光性树脂组合物而制造的固化膜具有高耐热性和高透明性,并且具有优异的物理性能,例如灵敏度,硬度,对基材的粘附性和折射率。

Patent Agency Ranking