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公开(公告)号：KR2019970046612U
公开(公告)日：1997-07-31
申请号：KR2019950048845
申请日：1995-12-27
Applicant: 삼성전자주식회사
IPC: H01L21/18
Abstract: 본고안은반도체웨이퍼등을가공처리하기위한진공처리장치의진공챔버의플레이트구조에관한것으로서, 상기플레이트(10)에 O-링(12)을수납하기위해형성된제1홈(14)과; 상기제1홈(14)의일부분에형성되고그리고상기제1홈(14)의직경보다비교적큰 직경을갖는제2홈(16)을포함하는구조를갖는다. 상술한플레이트구조에의하면, 진공챔버의수리중상기 O-링을제거할때 손가락으로간단히제거할수 있기때문에 O-링에어떠한손상을입히지않게되어진공누설의발생을방지할수 있다.
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公开(公告)号：KR1020080093336A
公开(公告)日：2008-10-21
申请号：KR1020070037158
申请日：2007-04-16
Applicant: 삼성전자주식회사
Inventor： 박해식
IPC: H01L21/265
Abstract: An acceleration device and an ion implantation apparatus with the same are provided to improve the reliability of a device and process production by maintaining a uniform contact state at the repetition use to stably apply an acceleration voltage or a deceleration voltage. An acceleration device includes an acceleration column(220), an acceleration ring(210), and a contact unit(600). Ion beam is accelerated or decelerated to the acceleration column to implant ions in a wafer. The acceleration ring forms an electric field in a periphery of the acceleration column. The contact unit has a contact(640) and a contact conveying means. The contact applies an acceleration voltage accelerating the ion beam and a deceleration voltage decelerating the ion beam to the acceleration ring. The contact conveying means conveys the contact in a straight line so that the contact contacts or separates with or from the acceleration ring to switch the acceleration voltage or the deceleration voltage.
Abstract translation: 提供一种加速装置及其离子注入装置，以通过在重复使用时保持均匀的接触状态来稳定地施加加速电压或减速电压来提高装置的可靠性和加工生产。 加速装置包括加速柱（220），加速环（210）和接触单元（600）。 离子束被加速或减速到加速度柱以将离子注入到晶片中。 加速环在加速度柱的周围形成电场。 接触单元具有触点（640）和触点输送装置。 接触器施加加速离子束的加速电压和将离子束减速到加速环的减速电压。 触点输送装置以直线传送触点，使得触点与加速环接触或分离，以切换加速电压或减速电压。
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公开(公告)号：KR1020070020755A
公开(公告)日：2007-02-22
申请号：KR1020050074975
申请日：2005-08-16
Applicant: 삼성전자주식회사
Inventor： 박해식
IPC: H01L21/265 , H01L21/68
Abstract: 이온 주입 설비의 웨이퍼 안착 장치가 개시된다. 웨이퍼 안착 장치는 도전성 패드 및 접지용 캡을 가지고, 웨이퍼의 정전기력을 제거한다. 웨이퍼의 정전기력을 제거하고자 하는 경우, 도전성 패드 및 접지용 캡을 통해 웨이퍼는 접지된다. 또한, 웨이퍼의 배면에는 접지핀이 접촉된다. 따라서, 웨이퍼에 잔존하는 정전기는 신속하게 제거될 수 있다.
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公开(公告)号：KR1020000026886A
公开(公告)日：2000-05-15
申请号：KR1019980044617
申请日：1998-10-23
Applicant: 삼성전자주식회사
IPC: H01L21/265 , H01L21/68
Abstract: PURPOSE: A method of transferring a wafer of an ion injecting apparatus for manufacturing a semiconductor device is provided to improve productivity by minimizing defects when loading/unloading the wafer by using a left handler and a right handler. CONSTITUTION: In a method of transferring a wafer of an ion injecting apparatus equipped with a left handler and a right handler, the wafer is loaded/unloaded after confirming the state of the wafer on the left handler and the right handler when loading and unloading the wafer by using the left handler and the right handler.
Abstract translation: 目的：提供一种转移用于制造半导体器件的离子注入装置的晶片的方法，以通过使用左处理器和右处理器来最小化加载/卸载晶片时的缺陷来提高生产率。 构成：在配备有左处理器和右处理器的离子注入装置的晶片的传送方法中，在确认在左处理器和右处理器上的晶片的状态装载/卸载时，晶片被加载/卸载 使用左处理程序和正确的处理程序。
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Patent Agency Ranking
公开(公告)号：KR1019990027992A
公开(公告)日：1999-04-15
申请号：KR1019970050531
申请日：1997-09-30
Applicant: 삼성전자주식회사
IPC: F04D1/02
Abstract: 본 발명에 그리스 레벨 센서가 설치된 진공 펌프에 관한 것으로, 베어링의 윤활을 위하여 공급되는 그리스 양의 부족에 따른 펌핑 불량을 방지하기 위하여 상방향으로 흡입구가 형성되며, 좌우 방향으로 배기구가 설치된 원통형 몸체와; 흡입구로 흡입된 입자를 배기하기 위한 회전 원반을 포함하는 복수개의 원반과; 원반의 회전 원반에 결합되어 회전 원반을 회전시키는 회전축을 포함하는 모터와; 회전축의 일끝단에 결합되어 회전축을 지지하는 베어링과; 원통형 몸체의 하부에 설치되며, 베어링에 그리스를 공급하는 그리스 박스와; 그리스 박스의 하부에 설치되며, 그리스 박스로 그리스를 공급하는 오일 박스; 및 오일 박스의 외측에 오일 박스에 담긴 그리스 양을 체크하기 위해 설치된 그리스 레벨 센서;를 포함하는 진공 펌프를 제공한다.
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公开(公告)号：KR1020000026271A
公开(公告)日：2000-05-15
申请号：KR1019980043735
申请日：1998-10-19
Applicant: 삼성전자주식회사
IPC: F04F5/54
Abstract: PURPOSE: A venturi pump is provided to reduce errors due to instantaneous stoppage by improving the change of the pressure flowed into a venturi pump despite the change of the primary pressure by installing a pressure regulator in an air line of a venturi pump. CONSTITUTION: A venturi pump is composed of an air input unit(100) to flow air into a venturi pump(180), an air line(220) which is the channel of air flow connecting the air input unit and the venturi pump, many pneumatic units(140) connected to the air line and a pressure regulator(160) formed in the air line. Herein, the pressure is not changed according to the installation of the pressure regulator even though the pressure of the air flowed into the venturi pump from the air input unit is changed due to the pneumatic units or air leakage(120).
Abstract translation: 目的：尽管通过在文丘里泵的空气管路中安装压力调节器来改变初级压力，但通过提高流入文丘里泵的压力变化，可以提供文丘里泵来减少由于瞬时停止引起的误差。 构成：文丘里泵由空气输入单元（100）组成，以将空气流入文丘里泵（180），空气管线（220），其是连接空气输入单元和文丘里泵的空气流通道，许多 连接到空气管路的气动单元（140）和形成在空气管路中的压力调节器（160）。 这里，即使由气动单元或空气泄漏（120）改变从空气输入单元流入文丘里泵的空气的压力，也可以根据压力调节器的安装来改变压力。
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公开(公告)号：KR1020000021918A
公开(公告)日：2000-04-25
申请号：KR1019980041198
申请日：1998-09-30
Applicant: 삼성전자주식회사
IPC: H01L21/66
Abstract: PURPOSE: A vacuum gauge is to improve a quality of a material and a thickness of a locking nut assembled/dis assembled into/from the vacuum gauge, thereby preventing a damage of the locking nut when assembling or disassembling the vacuum gauge. CONSTITUTION: A vacuum gauge for a semiconductor device manufacturing equipment comprises a locking nut(3) removably assembled into a body(1) of the vacuum gauge, a screw portion(2) formed on an outer face of the body. Other screw portion is formed on an inner face of the locking nut so as to be engaged with the screw portion of the body of the vacuum gauge. The locking nut is made of stainless steel material and its thickness is thicker than a conventional one. And the locking nut has a frictional face(4) on an outer face thereof to facilitate the assembling or disassembling of the locking nut into/from the body of the vacuum gauge.
Abstract translation: 目的：真空计是为了提高材料的质量和组装成/从真空计装配的锁紧螺母的厚度，从而防止在组装或拆卸真空计时损坏锁紧螺母。 构成：用于半导体器件制造设备的真空计包括可拆卸地组装到真空计的本体（1）中的锁定螺母（3），形成在主体外表面上的螺纹部分（2）。 其他螺纹部分形成在锁紧螺母的内表面上，以与真空计本体的螺纹部分接合。 锁紧螺母由不锈钢材料制成，厚度比常规厚。 并且锁定螺母在其外表面上具有摩擦面（4），以便于将锁紧螺母组装或拆卸到真空计的主体中或从其排出。
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公开(公告)号：KR2019970056138U
公开(公告)日：1997-10-13
申请号：KR2019960004283
申请日：1996-03-08
Applicant: 삼성전자주식회사
IPC: H01R13/05
Abstract: 본고안은플러그(plug)에관한것으로서, 구체적으로는비직선형의플러그-핀(plug pin)의구조를갖는플러그에관한것이다. 종래의플러그는플러그-핀이직선형으로되어있으므로콘센트의홀에삽입후 쉽게이탈될수 있는문제점과, 사용함에따라콘센트의홀의유격이넓어져접촉불량을유발하게될 수있는문제점이있었다. 고안은플러그-핀이콘센트의홀에삽입된후 쉽게이탈되지않고, 양호한접촉상태를갖는플러그를제공하기위해복수개의플러그-핀중 하나이상의플러그-핀이각각종방향에대해서비직선형이고단부가직선형인구조를갖도록하여플러그의이탈방지및 플러그-핀의접촉불량을방지할수 있다.
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公开(公告)号：KR1020000030950A
公开(公告)日：2000-06-05
申请号：KR1019980044012
申请日：1998-10-20
Applicant: 삼성전자주식회사
IPC: H01L21/68
Abstract: PURPOSE: A transfer device for the wafer of a semiconductor is provided to prevent a metallic particle from being generated in a tip chuck of the wafer transfer device using the tip chuck. CONSTITUTION: A transfer device(10) for the wafer of a semiconductor contains a tip chuck(20). The tip chuck is used to control the vacuum absorption force of the wafer transfer device of the semiconductor. A vacuum line(40) is connected at the combined surface of the tip chuck. Thus, the tip chuck controls the vacuum absorption force formed in the wafer transfer device of the semiconductor by the vacuum line. A screw of the tip chuck is made of polytetrafluoethylene, which is the same material as TEFLON. The wafer transfer device of the semiconductor prevents the generation of a particle in the tip chuck while preventing the leakage of vacuum.
Abstract translation: 目的：提供用于半导体晶片的转印装置，以防止在使用尖端卡盘的晶片转印装置的尖端卡盘中产生金属颗粒。 构成：用于半导体晶片的转移装置（10）包含尖端卡盘（20）。 尖端卡盘用于控制半导体的晶片传送装置的真空吸收力。 真空管线（40）连接在尖端卡盘的组合表面。 因此，尖端卡盘通过真空管线控制在半导体的晶片传送装置中形成的真空吸收力。 尖端卡盘的螺丝由聚四氟乙烯制成，它与TEFLON是相同的材料。 半导体的晶片传送装置防止在尖端卡盘中产生颗粒，同时防止真空泄漏。
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