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Patent Agency Ranking
公开(公告)号：KR1020140110632A
公开(公告)日：2014-09-17
申请号：KR1020130025283
申请日：2013-03-08
Applicant: 삼성전자주식회사
IPC: H01L21/66
CPC classification number: H01L22/12 , G01N21/21 , G01N21/33 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/8848 , G03F7/70625
Abstract: Described herein is an apparatus for manufacturing a semiconductor which comprises a chamber having a susceptor for attaching a processed product on the lower inner portion and a polarization spectral reflection module located in the upper portion of the chamber. The polarization spectral reflection module comprises: a light source for generating light; a beam splitter for receiving the light generated from the light source to reflect a portion; an objective polarizer for polarizing the light reflected by the beam splitter to irradiate a processed product on the susceptor; a reflective aperture in which the reflected polarized light reflected from the processed product counter-passes the object polarizer, a portion of the reflected polarized light passes through the beam splitter, and a portion of the reflected polarized light passed through the beam splitter passes through the reflective aperture; a blaze grating for reflecting the reflected polarized light passed through the reflective aperture; and an array director for sensing the reflected polarized light separated and reflected by the blaze grating.
Abstract translation: 本文描述了一种用于制造半导体的装置，其包括具有用于将加工产品附接在下部内部的基座的腔室和位于腔室上部的偏振光谱反射模块。 偏振光谱反射模块包括：用于产生光的光源; 分束器，用于接收从光源产生的光以反射一部分; 用于偏振由分束器反射的光以将加工产品照射在基座上的物镜偏振器; 反射孔，其中从加工产品反射的反射偏振光反射通过目标偏振器，反射的偏振光的一部分通过分束器，并且穿过分束器的一部分反射的偏振光穿过 反光孔; 用于反射穿过反射孔的反射的偏振光的火焰光栅; 以及用于感测由火焰光栅分离和反射的反射的偏振光的阵列导向器。
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公开(公告)号：KR1020080013629A
公开(公告)日：2008-02-13
申请号：KR1020060075392
申请日：2006-08-09
Applicant: 삼성전자주식회사
Abstract: An air purifying filter is provided to extend the life of an activated carbon fiber filter, construct the activated carbon fiber filter in a simple structure, and reduce operating and maintaining costs of the activated carbon fiber filter. An air purifying filter(100) comprises: a filter case(110) for accommodating the activated carbon fiber filter; an activated carbon fiber filter(120) installed in the filter case such that the activated carbon fiber filter can travel to adsorb and remove polluted gas components; a nanoparticle spray(140) for spraying the functional nanoparticles onto the activated carbon fiber filter to coat functional nanoparticles on a surface of the activated carbon fiber filter; and an ultraviolet lamp(150) for irradiating ultraviolet rays onto the activated carbon fiber filter. The filter case has an inlet(111) formed in a front side thereof, and an outlet(112) formed in a rear side thereof. The air purifying filter further comprises a pair of rollers(131,133) installed within the filter case and spaced apart from each other to run the activated carbon fiber filter.
Abstract translation: 提供空气净化过滤器，延长活性炭纤维过滤器的使用寿命，以简单的结构构造活性炭纤维过滤器，降低活性炭纤维过滤器的运行和维护成本。 空气净化过滤器（100）包括：用于容纳活性碳纤维过滤器的过滤器壳体（110）; 安装在过滤器壳体中的活性炭纤维过滤器（120），使得活性炭纤维过滤器可以行进以吸附和去除污染的气体组分; 纳米颗粒喷雾（140），用于将活性碳纤维过滤器上的功能性纳米颗粒喷涂到活性碳纤维过滤器表面上的功能纳米颗粒; 以及用于将紫外线照射到活性碳纤维过滤器上的紫外线灯（150）。 过滤器壳体具有形成在其前侧的入口（111）和形成在其后侧的出口（112）。 空气净化过滤器还包括一对安装在过滤器壳体内并彼此分开的辊（131,133），以运行活性碳纤维过滤器。
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3.发明公开
公开(公告)号：KR1020150141241A
公开(公告)日：2015-12-18
申请号：KR1020140069372
申请日：2014-06-09
Applicant: 삼성전자주식회사
CPC classification number: G01N21/95607 , G01N21/211 , G01N2021/213
Abstract: 반도체소자의검사방법, 반도체검사시스템, 및이를이용한반도체소자의제조방법이제공된다. 검사방법은, 반도체기판에형성된검사패턴의신호를측정하되, 상기신호는상기검사패턴의스펙트럼데이터를포함하고, 상기측정된신호로부터제1 스펙트럼을갖는제1 성분및 제2 스펙트럼을갖는제2 성분을추출하는것, 상기제1 스펙트럼및 상기제2 스펙트럼의차이를이용하여스큐스펙트럼을획득하는것, 및상기스큐스펙트럼을이용하여, 상기검사패턴의비대칭신호를획득하는것을포함한다. 상기비대칭신호를획득하는것은소정파장범위의상기스큐스펙트럼을이용하여상기비대칭신호의방향을획득하는것, 및상기스큐스펙트럼의면적을이용하여상기비대칭신호의양을획득하는것을포함한다.
Abstract translation: 提供了一种用于检查半导体器件，半导体检查系统和使用该半导体器件制造半导体器件的方法。 检查半导体器件的方法是通过以下步骤来执行：测量形成在半导体衬底上的检查图案的包括检查图案的光谱数据的信号; 从所测量的信号中提取具有第一光谱的第一元件和具有第二光谱的第二成分; 通过使用第一光谱和第二光谱之间的差来获得偏斜光谱; 以及通过使用偏斜谱来获得检查图案的不对称信号，以通过使用预定频率范围内的歪斜频谱来获得非对称信号的方向，并且通过使用歪斜谱的区域来获得不对称信号的量。
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公开(公告)号：KR1020120035422A
公开(公告)日：2012-04-16
申请号：KR1020100096916
申请日：2010-10-05
Applicant: 삼성전자주식회사
IPC: H01L21/66
CPC classification number: G06T7/0002 , G06T2207/10016 , G06T2207/10061 , G06T2207/30148 , G06T2207/30168
Abstract: PURPOSE: A method of forming an image of a semiconductor device and a method for inspecting defects of a semiconductor device using the same are provided to simply produce the final image of a specimen by selecting partial image frames of a plurality of image frames. CONSTITUTION: A semiconductor device having an interest area and a peripheral area is prepared(S110). A plurality of image frames, which includes the interest image and the peripheral area image respectively corresponding to the interest area and the peripheral area, is obtained(S120). At least a part of the plurality of image frames is selected(S130). The image of the semiconductor device is obtained by integrating selected image frames(S140).
Abstract translation: 目的：提供一种形成半导体器件的图像的方法和使用其的半导体器件的缺陷检查方法，以通过选择多个图像帧的部分图像帧来简单地产生样本的最终图像。 构成：准备具有感兴趣区域和周边区域的半导体装置（S110）。 获得包括感兴趣图像和分别对应于感兴趣区域和周边区域的周边区域图像的多个图像帧（S120）。 选择多个图像帧中的至少一部分（S130）。 通过对所选择的图像帧进行积分来获得半导体器件的图像（S140）。
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