Abstract:
PURPOSE: A roll-to-roll printing system is provided to transfer a flexible substrate with fluid running down after a process, in which the fluid of low viscosity such as a liquid crystal is utilized, by using a torque value of a nib roll driving motor. CONSTITUTION: A roll-to-roll printing system comprises a driven roll(130B), a pair of nib rolls(140B), a nib roll driving motor(142B), and a control device. The driven roll transmits power to a flexible substrate so that flexible substrate is transferred from an unwinding device to a rewinding device. The nib roll is mounted on both end portions of the driven roll, thereby pressurizing both end portions of the flexible substrate. The nib roll driving motor is connected to the nip roll in order to rotate-drive the nib roll. The control device receives the information of changes in a torque value of the nib roll driving motor. The tension of the flexible substrate is controlled by using the information.
Abstract:
Disclosed are a flip chip packaging method, a flux head applied to the method, and a manufacturing method for the flux head. The flip chip packaging method according to an embodiment of the present invention comprises: a pre-fluxing step for priorly printing a flux on a pad of a printed circuit board (PCB); a flip chip mounting step for aligning a flip chip with the pad of the PCB and mounting a bump of the flip chip on the pad of the PCB; and a flip chip reflow step for bonding the bump of the flip chip with the pad of the PCB by the flux.
Abstract:
본 발명은 나노 임프린트 리소그래피 공정에 관한 것으로, 본 발명의 목적은 간단한 장비를 이용하여 몰드와 기판 사이에 정전기적 인력을 발생시킴으로써 잔류층을 최소화할 수 있는 나노 임프린트 리소그래피 공정을 제공함에 있다. 이를 위해 본 발명에 따른 나노 임프린트 리소그래피 공정은 기판 위에 레지스트를 도포하고; 몰드를 가압하여 상기 레지스트에 미세패턴을 임프린팅하고; 대전된 도체판을 상기 기판에 접촉시킨다. 나노 임프린트, 잔류층, 정전기력
Abstract:
PURPOSE: A roll to roll apparatus and a flexible substrate fixing method are provided to uniformly adhere to the front side of a flexible substrate without bending of a substrate. CONSTITUTION: A roll to roll apparatus(1) includes a base plate(10), an external vacuum chuck plate(20), an internal chuck plate(30), an external vacuum chuck(40), an internal vacuum chuck(50), and a guide roller. The external vacuum chuck plate includes the upper side of the base plate. The internal vacuum chuck plate is included in the center of the external vacuum chuck plate. The inside vacuum chuck is included in the lower side of the internal vacuum chuck plate. The pattern region of the flexible substrate is adsorbed.
Abstract:
A nano imprint lithography process is provided to generate electrostatic attraction between the mold and the substrate and to minimize the residual layer. The resist(20) is coated on the substrate(30). The mold(10) is pressurized in the resist. The micro-pattern is imprinted in the resist. The charged conducting plate(40) is contacted with the substrate. The resist is hardened by the thermal scanning or the ultraviolet irradiation after the contact of the substrate. The substrate is earthed and the mold is formed from resist after the contact of resist.