반도체 패키지
    1.
    发明公开
    반도체 패키지 审中-实审
    半导体

    公开(公告)号:KR1020160072330A

    公开(公告)日:2016-06-23

    申请号:KR1020140179298

    申请日:2014-12-12

    Abstract: 본발명은반도체패키지를제공한다. 반도체패키지는반도체칩이실장되는상부면과그 반대면인하부면을갖는패키지기판, 상기패키지기판내에임베딩되고, 상기패키지기판을관통하는전원통로와접지통로를각각제공하는전원블록과그라운드블록, 상기전원블록및 상기그라운드블록각각으로부터연장되어상기반도체칩에전기적으로연결되는제 1 비아, 상기전원블록및 상기그라운드블록각각으로부터상기패키지기판의하부면을향해연장되는제 2 비아및 상기전원블록과상기그라운드블록을각각관통하여상기반도체칩에전기적으로연결되고, 상기전원블록과상기그라운드블록각각과전기적으로절연된블록비아를포함한다.

    Abstract translation: 本发明涉及半导体封装。 本发明涉及半导体封装。 半导体封装包括:封装衬底,其具有安装半导体芯片的上表面和与其相对的下表面; 电源块和接地块,其分别嵌入在所述封装基板中,并分别提供通过所述封装基板的电源通路和接地通路; 第一通孔,其从每个电源块和接地块延伸并且电连接到半导体芯片; 第二通孔,其从所述电源块和所述接地块朝向所述封装基板的下表面延伸; 并且通过其中的每个电源块和接地块的块电连接到半导体芯片,并且与电源块和接地块电隔离。

    반도체 패키지 제조 방법
    5.
    发明公开
    반도체 패키지 제조 방법 无效
    制造半导体封装的方法

    公开(公告)号:KR1020130050125A

    公开(公告)日:2013-05-15

    申请号:KR1020110115300

    申请日:2011-11-07

    CPC classification number: H01L2224/11 H01L2924/00012

    Abstract: PURPOSE: A method for manufacturing a semiconductor package is provided to prevent the warpage of the semiconductor package by using a conductive bump of a dual layer. CONSTITUTION: A mask pattern is formed on a pad of a substrate. An opening part is formed on the mask pattern. A first metal layer is formed in the opening part. A sphere(100) is arranged on the first metal layer. A pellicle(400) of the sphere is formed on the first metal layer and the second metal layer.

    Abstract translation: 目的:提供一种制造半导体封装的方法,以通过使用双层的导电凸块来防止半导体封装的翘曲。 构成:在基板的焊盘上形成掩模图案。 在掩模图案上形成开口部。 第一金属层形成在开口部中。 球体(100)布置在第一金属层上。 在第一金属层和第二金属层上形成球体的防护薄膜(400)。

    전계 효과 트랜지스터 및 그 제조 방법
    7.
    发明公开
    전계 효과 트랜지스터 및 그 제조 방법 无效
    场效应晶体管及其形成方法

    公开(公告)号:KR1020130120969A

    公开(公告)日:2013-11-05

    申请号:KR1020120084943

    申请日:2012-08-02

    CPC classification number: H01L29/42392 H01L29/1033

    Abstract: Provided is a field effect transistor which includes a drain region, a source region, and a channel region. Provided are a gate electrode which surrounds a part of the channel region and a gate insulation layer which is located between the channel region and the gate electrode. The cross section of the channel region in contact with the source region is smaller than the cross section of the channel region in contact with the drain region.

    Abstract translation: 提供了包括漏极区域,源极区域和沟道区域的场效应晶体管。 提供围绕沟道区的一部分的栅电极和位于沟道区和栅电极之间的栅极绝缘层。 与源极区域接触的沟道区域的截面小于与漏极区域接触的沟道区域的截面。

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