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公开(公告)号：KR1020120082657A
公开(公告)日：2012-07-24
申请号：KR1020110004073
申请日：2011-01-14
Applicant: 성균관대학교산학협력단
Abstract: PURPOSE: An apparatus and a method for depositing a protective thin film are provided to reduce the permeability of water vapor through the polymer wafer while a SiOx(Silicon Dioxide) thin film or a SiON(Silicon Oxynitride) thin film is deposited on the polymer wafer. CONSTITUTION: An apparatus for depositing a protective thin film comprises a chamber(110), a first electrode(120), a first power supply unit, a second electrode(140),a second power supply unit(150), and a fluid supply unit(160). The fluids for generating plasma are injected into the chamber. The chamber comprises a flexible substrate(W) for a display. The first and second electrodes are vertically and oppositely placed each other in the chamber. The first and second power supply units respectively applies first and second pre-set proper power pre-set into the first and second electrodes. The fluid supplying unit supplies the fluids; OMCTS(Octamethylcyclotetrasiloxane) to the chamber. The flexible substrate(W) for the display is placed on the second electrode.
Abstract translation: 目的：提供一种用于沉积保护薄膜的装置和方法，以降低聚合物晶片的水蒸汽渗透性，同时将SiOx（二氧化硅）薄膜或SiON（氮氧化硅）薄膜沉积在聚合物晶片上 。 一种用于沉积保护性薄膜的装置，包括室（110），第一电极（120），第一电源单元，第二电极（140），第二电源单元（150）和流体供应 单元（160）。 用于产生等离子体的流体被注入到腔室中。 腔室包括用于显示器的柔性基底（W）。 第一和第二电极在腔室中彼此垂直相对放置。 第一和第二电源单元分别在第一和第二电极中预先设置预设的第一和第二预定的正确功率。 流体供应单元供应流体; OMCTS（八甲基环四硅氧烷）至室。 用于显示器的柔性基板（W）放置在第二电极上。
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公开(公告)号：KR101280969B1
公开(公告)日：2013-07-02
申请号：KR1020110004073
申请日：2011-01-14
Applicant: 성균관대학교산학협력단
Abstract: 본 발명에 따른 플렉서블 디스플레이의 보호 박막 증착 처리 시, 챔버 내에 상호 수직 대향 배치된 제 1 전극 및 제 2 전극에 각각 인가할 제 1 적정 전력 및 제 2 적정 전력을 설정하고, 플렉서블 디스플레이용 기판을 제 2 전극 상에 배치하고, 챔버 내에 전구체로서 OMCTS(Octamethylcyclotetrasiloxane) 유체를 공급하고, 반응 유체로서 O
2 및 N
2 중 적어도 하나의 반응 유체를 공급하고, 제 1 전극 및 제 2 전극에 각각 제 1 적정 전력 및 제 2 적정 전력을 인가하여 플라즈마를 발생시키고, 기설정된 반응 시간 동안 플렉서블 디스플레이용 기판에 SiO
x 및 SiON 중 어느 하나의 보호 박막을 한층 이상 증착한다.-
公开(公告)号：KR1020120082640A
公开(公告)日：2012-07-24
申请号：KR1020110004040
申请日：2011-01-14
Applicant: 성균관대학교산학협력단
IPC: H05H1/34 , H05H1/46 , H01L21/205
CPC classification number: H01J37/32541 , H01J37/32165 , H01J37/32174 , H01J37/32568 , H01J2237/3321 , H05H1/46 , H05H2001/4645
Abstract: 본발명의일 측면에따른플라즈마기판처리장치는, 상기기판이수납되는챔버; 상기챔버의상부및 하부에서로나란하게각각배치된상부전극및 하부전극을포함하는주 전극; 상기주 전극사이에위치한가상의수평면을따라서서로나란하게배치된일자막대형상의제1 전극및 제2 전극을포함하는보조전극; 및상기주 전극및 상기보조전극에각각연결되어전력을공급하는주 전원및 보조전원을포함하는전력공급부를포함하고, 상기제1 전극과상기제2 전극사이의간격은상기기판의너비와같거나길게구비되고, 상기제1 전극및 상기제2 전극은상기하부전극보다상기상부전극과가까운위치에구비되며, 상기보조전원은상기주 전원에서공급되는전력의주파수보다높은극초단파영역주파수(UHF)의전력을공급한다.
Abstract translation: 目的：提供一种使用等离子体处理衬底的装置及其方法，以通过向主电极和辅助电极供电来提高等离子体产生密度。 构成：主电极（110）包括形成在室（10）的内上部的上电极（111）和形成在室的内下部的底电极（113）。 上电极和下电极产生等离子体产生的电动势。 上电极和下电极从电源单元（150）接收电力。 主电源包括连接到上电极的第一主电源（151a）和连接到底电极的第二主电源（151b）。 流体供应单元（170）在室内供应用于产生等离子体的流体。 辅助电极（130）包括第一电极（131）和第二电极（133）。
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Patent Agency Ranking
公开(公告)号：KR101268101B1
公开(公告)日：2013-05-29
申请号：KR1020110001448
申请日：2011-01-06
Applicant: 성균관대학교산학협력단
Abstract: 기판양면코팅장치는기판의코팅이수행되는챔버및 챔버내에서기판의연속적인이동이이루어지도록챔버의양측에대응되게설치된제 1 롤링부및 제 2 롤링부를포함하되, 챔버는기판의상부면의표면에플라즈마를발생시키는제 1 플라즈마생성부및 기판의하부면의표면에플라즈마를발생시키는제 2 플라즈마생성부를포함하고, 제 1 롤링부및 제 2 롤링부를통해기판을각각의제 1 플라즈마생성부및 제 2 플라즈마생성부에각각포함되고, 서로대향하도록배치된상부전극및 하부전극사이로이동시킨다.
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公开(公告)号：KR1020120108261A
公开(公告)日：2012-10-05
申请号：KR1020110025928
申请日：2011-03-23
Applicant: 주식회사 글라소울 , 성균관대학교산학협력단
IPC: G02F1/1333 , C23C14/22 , H01L21/02 , H01L51/50
CPC classification number: H01L51/5253 , C23C16/345 , H01L51/5237
Abstract: PURPOSE: A polymer glass substrate for a display panel and a manufacturing method thereof are provided to deposit plasma at a low temperature by adjusting bias power applied to an electrode mounted on a polymer substrate. CONSTITUTION: A substrate(10) is made of a polymer. The substrate is a polymer glass substrate. A coating film(20) is deposited on an upper side of the substrate. The coating film is deposited by plasma enhanced chemical vapor deposition. The coating film is made of a silicone compound. The coating film is made of silicon oxide(SiOx), silicon nitride(SiN), or silicon oxynitride(SiON). [Reference numerals] (10) Substrate; (20) Coating layer
Abstract translation: 目的：提供一种用于显示面板的聚合物玻璃基板及其制造方法，用于通过调节施加到安装在聚合物基板上的电极的偏置功率，在低温下沉积等离子体。 构成：基材（10）由聚合物制成。 基板是聚合物玻璃基板。 涂布膜（20）沉积在基板的上侧。 涂膜通过等离子体增强化学气相沉积沉积。 涂膜由硅氧烷化合物制成。 涂膜由氧化硅（SiOx），氮化硅（SiN）或氮氧化硅（SiON）制成。 （附图标记）（10）基板; （20）涂层
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公开(公告)号：KR1020120080024A
公开(公告)日：2012-07-16
申请号：KR1020110001448
申请日：2011-01-06
Applicant: 성균관대학교산학협력단
Abstract: PURPOSE: An apparatus for coating both sides of a substrate and a method thereof are provided to improve the performance of a substrate because one electrode is served as a main electrode for generating plasma and the other electrode is used as an electrode for applying radio frequency bias. CONSTITUTION: An apparatus for coating both sides of a substrate comprises a chamber(110) and first and second rolling units(151,152). A substrate(170) is coated in the chamber and consecutively moves in the chamber through the first and second rolling units. The first and second rolling units are correspondently installed in both sides of the chamber. The chamber comprises a first plasma generating unit(111) and a second plasma generating unit(112). The substrate moves between upper and lower electrodes through the first and second rolling units.
Abstract translation: 目的：提供一种用于涂覆基板的两侧的装置及其方法，以提高基板的性能，因为一个电极用作用于产生等离子体的主电极，另一个电极用作施加射频偏压的电极 。 构成：用于涂覆基底的两侧的装置包括腔室（110）和第一和第二滚动单元（151,152）。 衬底（170）被涂覆在腔室中，并且通过第一和第二轧制单元连续地在腔室中移动。 第一和第二滚动单元相应地安装在腔室的两侧。 该室包括第一等离子体产生单元（111）和第二等离子体产生单元（112）。 基板通过第一和第二滚动单元在上电极和下电极之间移动。
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公开(公告)号：KR101529578B1
公开(公告)日：2015-06-19
申请号：KR1020110004040
申请日：2011-01-14
Applicant: 성균관대학교산학협력단
IPC: H05H1/34 , H05H1/46 , H01L21/205
Abstract: 본발명의일 측면에따른플라즈마기판처리장치는, 상기기판이수납되는챔버; 상기챔버의상부및 하부에서로나란하게각각배치된상부전극및 하부전극을포함하는주 전극; 상기주 전극사이에위치한가상의수평면을따라서서로나란하게배치된일자막대형상의제1 전극및 제2 전극을포함하는보조전극; 및상기주 전극및 상기보조전극에각각연결되어전력을공급하는주 전원및 보조전원을포함하는전력공급부를포함하고, 상기제1 전극과상기제2 전극사이의간격은상기기판의너비와같거나길게구비되고, 상기제1 전극및 상기제2 전극은상기하부전극보다상기상부전극과가까운위치에구비되며, 상기보조전원은상기주 전원에서공급되는전력의주파수보다높은극초단파영역주파수(UHF)의전력을공급한다.
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公开(公告)号：KR1020120108254A
公开(公告)日：2012-10-05
申请号：KR1020110025918
申请日：2011-03-23
Applicant: 주식회사 글라소울 , 성균관대학교산학협력단
Abstract: PURPOSE: A method for forming an anti-fingerprinting film is provided to obtain a high contact angle by using a precursor including one of hexamethyldisilane, hexamethyldisilazane, and perfluorinated polyether. CONSTITUTION: A method for forming an anti-fingerprinting film comprises the steps of: mounting a substrate on a second electrode, supplying a precursor material including methyl group(CH3) or fluoro carbon group(CF3) with reactive gas to the inside of a chamber, applying power to a first electrode or the second electrode to create plasma between the first and second electrodes, and accelerating the plasma to deposit an anti-fingerprinting film on the surface of the substrate. [Reference numerals] (AA,CC,EE) Silicon oxide layer; (BB,DD,FF) Substrate; (GG) Plasma control
Abstract translation: 目的：提供一种形成防指纹膜的方法，通过使用包含六甲基二硅烷，六甲基二硅氮烷和全氟聚醚中的一种的前体来获得高接触角。 构成：形成防指纹膜的方法包括以下步骤：将基板安装在第二电极上，将包含甲基（CH 3）或氟碳基（CF 3））的前体材料与反应气体一起供应到室的内部 向第一电极或第二电极施加电力以在第一和第二电极之间产生等离子体，并且加速等离子体以在基板的表面上沉积防指纹膜。 （标号）（AA，CC，EE）氧化硅层; （BB，DD，FF）基材; （GG）等离子体对照
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