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公开(公告)号：KR100509522B1
公开(公告)日：2005-08-23
申请号：KR1020020069254
申请日：2002-11-08
Applicant: 성균관대학교산학협력단
Abstract: PDP의 기판상에 증착된 MgO층으로부터 아웃개싱되는 불순물을 감소시키고 동시에 방전 특성을 향상시킬 수 있는 MgO층에 대한 세정방법과 PDP의 제조방법이 개시된다. 본 발명에 따른 MgO층에 대한 세정방법은, MgO층이 외부에 노출되도록 형성된 기판을 플라즈마 반응챔버내로 로딩하는 단계 및 상기 MgO층에 흡착된 불순물들이 제거되도록 상기 MgO층에 대하여 대기압에서 플라즈마 세정을 수행하는 단계 및/또는 열처리를 통하여 세정을 수행하는 단계를 포함한다.
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Patent Agency Ranking
公开(公告)号：KR1020050076108A
公开(公告)日：2005-07-26
申请号：KR1020040003917
申请日：2004-01-19
Applicant: 성균관대학교산학협력단
IPC: H01J37/32
Abstract: 본 발명은 TFT-LCD와 같은 평판 표시 소자 제조에 사용되는 기판을 플라즈마를 이용하여 식각하는 장치이다. 본 발명에 의하면, 식각 공정이 다른 공정과 인라인으로 진행될 수 있도록 기판이송부가 제공되며, 상압에서 플라즈마가 안정하고 균일하게 발생될 수 있도록 글로우 방전을 유도하기 위해 상부전극의 아래에 절연판이 제공되고, 공정진행시 가스의 온도를 낮추기 위해 비반응성 가스가 공급된다.
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公开(公告)号：KR1020040040906A
公开(公告)日：2004-05-13
申请号：KR1020020069254
申请日：2002-11-08
Applicant: 성균관대학교산학협력단
Abstract: PURPOSE: A method for cleaning an MgO layer and a method for manufacturing a plasma display panel are provided to achieve improved characteristics of PDP by reducing the impurity attached on the MgO layer through an atmospheric plasma cleaning and/or heat treatment cleaning process. CONSTITUTION: A method for cleaning an MgO layer comprises a step of loading a substrate with an MgO layer into a plasma reaction chamber; and a step of performing a plasma cleaning process at an atmospheric pressure so as to remove impurities from the MgO layer. A method for manufacturing a plasma display panel comprises a step(S10) of producing an upper panel by forming an MgO layer on the inner surface of the upper panel of a plasma display panel; a step(S20) of producing a lower panel of the plasma display panel; a step(S30) of performing a plasma cleaning process at an atmospheric pressure so as to remove impurities from the MgO layer of the upper panel; a step(S40) of sealing the upper panel and the lower panel and evacuating gases from the space formed between the upper panel and the lower panel; a step(S50) of injecting a discharge gas into the space formed between the upper panel and the lower panel; and a step(S60) of producing a module of the plasma display panel from the assembly of the upper and lower panels.
Abstract translation: 目的：提供一种用于清洗MgO层的方法和等离子体显示面板的制造方法，以通过通过大气等离子体清洗和/或热处理清洗工艺减少附着在MgO层上的杂质来实现PDP的改进的特性。 构成：用于清洗MgO层的方法包括将具有MgO层的衬底加载到等离子体反应室中的步骤; 以及在大气压下进行等离子体清洗处理以从MgO层除去杂质的步骤。 一种等离子体显示面板的制造方法，其特征在于，包括通过在等离子体显示面板的上板的内表面形成MgO层来制造上板的工序（S10） 制造等离子体显示面板的下面板的步骤（S20）; 在大气压下进行等离子体清洗处理以从上层的MgO层除去杂质的工序（S30） 密封上板和下板并从形成在上板和下板之间的空间排出气体的步骤（S40）; 将放电气体注入到形成在上板和下板之间的空间中的步骤（S50） 以及从上板和下板的组装制造等离子体显示面板的模块的步骤（S60）。
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公开(公告)号：KR100775509B1
公开(公告)日：2007-11-15
申请号：KR1020060087073
申请日：2006-09-08
Applicant: 성균관대학교산학협력단
IPC: H05B33/22
CPC classification number: H01L51/5253 , H01L51/5218 , H01L51/5275 , H01L51/56 , H01L2251/5315
Abstract: A top emission organic light emitting display device using an organic protection layer and a method for manufacturing the same are provided to implement an efficient electronic injection by having a barium having a low work function of 2.7eV as a transparent protection layer. A top emission organic light emitting display device using layers protecting organic layers includes an organic protection layer(100). The organic light emitting display device of an active type and a passive type is composed of a transparent conducting electrode. When the transparent conducting electrode is manufactured, the organic protection layer prevents a damage of an organic material which is located on a lower layer from a generated energy. The organic protection layer is manufactured by forming at least one or two layers sequentially. A single layer or a plurality of layers are doped on at least one layer with metal or non-metal.
Abstract translation: 提供了使用有机保护层的顶部发射有机发光显示装置及其制造方法，通过具有作为透明保护层的2.7eV的低功函的钡来实现有效的电子注入。 使用保护有机层的层的顶部发射有机发光显示装置包括有机保护层（100）。 有源类型和无源型的有机发光显示装置由透明导电电极组成。 当制造透明导电电极时，有机保护层可防止位于下层的有机材料受到发生的能量的损害。 通过依次形成至少一层或两层来制造有机保护层。 在金属或非金属的至少一层上掺杂单层或多层。
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公开(公告)号：KR100756227B1
公开(公告)日：2007-09-06
申请号：KR1020040003917
申请日：2004-01-19
Applicant: 성균관대학교산학협력단
IPC: H01J37/32
Abstract: 본 발명은 TFT-LCD와 같은 평판 표시 소자 제조에 사용되는 기판을 플라즈마를 이용하여 식각하는 장치이다. 본 발명에 의하면, 식각 공정이 다른 공정과 인라인으로 진행될 수 있도록 기판이송부가 제공되며, 상압에서 플라즈마가 안정하고 균일하게 발생될 수 있도록 글로우 방전을 유도하기 위해 상부전극의 아래에 절연판이 제공되고, 공정진행시 가스의 온도를 낮추기 위해 비반응성 가스가 공급된다.
플라즈마, 식각, TFT-LCD, FPD, 절연판, 비반응성 가스-
公开(公告)号：KR1020080111964A
公开(公告)日：2008-12-24
申请号：KR1020070060575
申请日：2007-06-20
Applicant: 삼성디스플레이 주식회사 , 성균관대학교산학협력단
IPC: H05B33/10
CPC classification number: C23C16/509 , C23C16/029 , C23C16/30 , C23C16/401 , C23C28/00 , H01J37/32091 , H01L51/5256
Abstract: An apparatus for depositing thin film capable of preventing delamination of protective film and method thereof are provided to reduce moisture permeability by improving light transmission. An apparatus(100) for depositing thin film forms a protective film having a structure in which an inorganic film and an organic film are laminated by turns on a substrate(10), and comprises a reaction chamber(110), a radio frequency electrode(120), a supporting substrate(130), a power supply unit, a first reaction gas supply unit(151), a second reaction gas supply unit(152), and an inert gas supply unit(153). The radio frequency electrode is installed inside the reaction chamber, and receives a radio frequency power. The supporting substrate is installed inside the reaction chamber, supports the substrate, and receives a bias voltage. The power supply unit supplies a radio frequency voltage and the bias voltage to the radio frequency electrode and the substrate. The first reaction gas supply unit supplies a first reaction gas inside the reaction chamber while forming the inorganic film on the substrate. The second reaction gas supply unit supplies a second reaction gas inside the reaction chamber while forming the inorganic film and the organic film on the substrate. The inert gas supply unit supplies an inert gas inside the reaction chamber while forming the inorganic film and the organic film on the substrate.
Abstract translation: 提供一种用于沉积能够防止保护膜分层的薄膜的设备及其方法，以通过改善透光性来降低透湿性。 一种用于沉积薄膜的设备（100）形成了一种保护膜，该保护膜具有将基底（10）上的无机膜和有机膜层叠的结构，并且包括反应室（110），射频电极 120），支撑基板（130），电源单元，第一反应气体供应单元（151），第二反应气体供应单元（152）和惰性气体供应单元（153）。 射频电极安装在反应室内，并接收射频电力。 支撑基板安装在反应室内，支撑基板，并接收偏置电压。 电源单元向射频电极和基板提供射频电压和偏置电压。 第一反应气体供给单元在反应室内供给第一反应气体，同时在基板上形成无机膜。 第二反应气体供给单元在反应室内供给第二反应气体，同时在基板上形成无机膜和有机膜。 惰性气体供给单元在反应室内供给惰性气体，同时在基板上形成无机膜和有机膜。
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