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公开(公告)号：KR101684288B1
公开(公告)日：2016-12-08
申请号：KR1020150187126
申请日：2015-12-28
Applicant: 코리아테크노(주)
IPC: H01L21/78 , H01L21/683 , H01L21/687
Abstract: 개시된내용은웨이퍼를탑재하여전,후진이송시키는스테이지이송부와, 상기스테이지이송부와별개로스테이지이동궤적의후방에설치되는제1승강부및 상기제1승강부의하강상태에서웨이퍼보호용필름에흡착되는흡착부재를구비한제2승강부를포함하는웨이퍼보호용필름의분리장치로서, 웨이퍼를탑재하여전,후진이송시키는스테이지이송부와, 상기스테이지이송부와별개로스테이지이동궤적의후방에설치되는제1승강부와, 상기제1승강부의하강상태에서웨이퍼보호용필름에흡착되는흡착부재를구비한제2승강부를포함하여원형웨이퍼의표면에부착된보호용필름을웨이퍼로부터흡착하여분리하는웨이퍼보호용필름의분리장치를제공한다.
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公开(公告)号：KR101510224B1
公开(公告)日：2015-04-09
申请号：KR1020140001847
申请日：2014-01-07
Applicant: 코리아테크노(주)
IPC: H01L21/68 , H01L21/677
Abstract: 얼라이너와이것을이용한웨이퍼분류장치에관한발명이개시된다. 개시된얼라이너는외관을형성하는바디와, 상기바디에구비되어웨이퍼를회전시키거나상기웨이퍼를수평이동시키는얼라인유닛과, 상기웨이퍼의회전에따라상기웨이퍼의수평방향변위량과상기웨이퍼에형성되는노치부를측정하는변위감지부및 상기웨이퍼가상기얼라인유닛에안착된상태를확인하는확인부; 를포함하고, 상기얼라인유닛은상기웨이퍼가기설정된위치에정위치되도록상기웨이퍼의회전각에대응하는상기변위량과상기노치부의위치에따라상기웨이퍼를회전시키거나상기웨이퍼를수평이동시키는것을특징으로한다.
Abstract translation: 公开了使用该对准器和晶片分选装置的对准器和晶片分选装置。 所公开的对准器包括：形成对准器外观的主体; 安装在所述主体上以使晶片旋转或水平移动的对准单元; 位移检测单元，其根据晶片的旋转和形成在晶片上的切口部来测量晶片的水平位移; 以及检查安装在对准单元上的晶片的安装状态的检查单元。 对准单元根据切口部分的位置和对应于晶片的旋转角度的位移来旋转或水平移动晶片，以使晶片被规则地放置在预定位置上。
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公开(公告)号：KR101377657B1
公开(公告)日：2014-03-25
申请号：KR1020130030845
申请日：2013-03-22
Applicant: 코리아테크노(주)
IPC: H01L21/66
Abstract: Disclosed is an invention relating to a supply nozzle for a processing substrate. The supply nozzle for a processing substrate includes a nozzle body which has a receiving space for receiving a process solution for processing a substrate, a heat radiation part which is separated and fixed to the nozzle body part, a transfer body part which is reciprocally moved and combined between the nozzle body and the heat radiation part, and a reciprocating part which make the transfer body part reciprocate. When a process solution is supplied to the supply nozzle for processing a substrate, the surface tension of the process solution which is stored in the supply nozzle can be increased.
Abstract translation: 本发明涉及一种用于处理基板的供给喷嘴。 用于处理基板的供应喷嘴包括：喷嘴体，其具有用于接收用于处理基板的处理溶液的接收空间;分离并固定到喷嘴主体部分的散热部分;往复移动的传送体部分; 组合在喷嘴体和散热部分之间，以及使转印体部分往复运动的往复运动部件。 当将处理液提供给用于处理基板的供应喷嘴时，可以增加存储在供应喷嘴中的处理溶液的表面张力。
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Patent Agency Ranking
公开(公告)号：KR102038875B1
公开(公告)日：2019-10-31
申请号：KR1020180016143
申请日：2018-02-09
Applicant: 코리아테크노(주)
IPC: H01L21/677
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公开(公告)号：KR1020170077879A
公开(公告)日：2017-07-07
申请号：KR1020150187116
申请日：2015-12-28
Applicant: 코리아테크노(주)
IPC: H01L21/677
Abstract: 본발명은자박스(jar box)에수납된웨이퍼를풉(FOUP, front opening unified pod)으로이동시킬때, 자박스에서웨이퍼만을안정되게흡착분리시킬수 있고, 웨이퍼에간격부재가붙는것을방지할수 있는웨이퍼플립장치와웨이퍼플립방법에관한것이다. 이를위해웨이퍼플립장치는덮개가개방된자박스가지지되는박스지지유닛과, 자박스에서웨이퍼를인출하여웨이퍼를풉에적층시키는웨이퍼이송유닛에전달하는웨이퍼인출유닛및 웨이퍼인출유닛에의해자박스에서인출되는웨이퍼로부터간격부재를분리시키는웨이퍼분리유닛을포함한다.
Abstract translation: 本发明现在可以盒以移动容纳在（罐箱）脱离（FOUP，前开式盒）的晶片，并sikilsu单独只吸附在字符框稳定晶片，防止间隔构件粘到晶片 晶圆翻转装置和晶圆翻转方法。 为此，在晶片搬送单元晶片倒装装置晶片由晶片取单元传递通过层叠在框中的FOUP晶片支撑单元的晶片，所述盖被拉出取单元和框字符，字符框是开放字符框已经 从要绘制的晶片包括分离单元，用于分离晶片间隔部件。
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公开(公告)号：KR101699882B1
公开(公告)日：2017-01-31
申请号：KR1020150187095
申请日：2015-12-28
Applicant: 코리아테크노(주)
IPC: H01L21/677 , H01L21/68
Abstract: 본발명은자박스(jar box)에수납된웨이퍼를풉(FOUP, front opening unified pod)에상호이격된상태에서간편하게적층할수 있고, 웨이퍼와함께자박스(jar box)에수납된완충부재와간격부재를분리배출시킬수 있는웨이퍼이송장치에관한것이다. 이를위해웨이퍼이송장치는자박스(jar box)에수납된웨이퍼를풉(FOUP, front opening unified pod)에상호이격된상태로적층하는웨이퍼이송장치이고, 덮개가개방되지않은자박스가지지되는자박스준비유닛과, 웨이퍼가모두배출된자박스가배출되는자박스배출유닛과, 자박스준비유닛에지지되는자박스에서덮개를개방시키거나자박스배출유닛에지지되는자박스에덮개를결합시키는덮개개폐유닛과, 자박스에서웨이퍼와함께적재된완충부재와간격부재를각각자박스에서흡착분리시키는부재배출유닛과, 자박스에서웨이퍼를흡착분리시키는웨이퍼플립유닛과, 웨이퍼플립유닛으로분리되는웨이퍼를풉에적층시키는웨이퍼이송유닛을포함한다.
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公开(公告)号：KR101402165B1
公开(公告)日：2014-07-01
申请号：KR1020130002829
申请日：2013-01-10
Applicant: 코리아테크노(주)
CPC classification number: Y02A30/25 , Y02B80/24 , E06B3/677 , E06B3/6612 , E06B3/663
Abstract: The present invention is related to a pillar separation device for vacuum windows comprising a hopper storing pillars; and an array of nozzles discharging an array of pillars in sequence. The array of nozzle is connect to the hopper and comprises a discharging passage that forms a passage in which the array of pillars moves; an outlet installed on the edge of the discharging passage for discharging the pillars; and a shooting unit separately discharging each pillar installed on the discharging passage.
Abstract translation: 本发明涉及一种用于真空窗的支柱分离装置，其包括储存柱的料斗; 以及排列排列阵列的喷嘴阵列。 喷嘴阵列连接到料斗，并且包括形成柱体阵列移动的通道的排出通道; 出口安装在排放通道的边缘以排出柱子的出口; 以及分别排出安装在排放通道上的每个柱的射击单元。
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