펜타신으로 구성되는 그라핀 보호막 및 그 형성 방법
    2.
    发明公开
    펜타신으로 구성되는 그라핀 보호막 및 그 형성 방법 无效
    保护层与PENTACENE及其形成方法

    公开(公告)号:KR1020110001621A

    公开(公告)日:2011-01-06

    申请号:KR1020090059213

    申请日:2009-06-30

    Abstract: PURPOSE: A grapheme protective layer and a forming method thereof are provided to prevent the electrical property of a grapheme due to an external factor such as the air and the water by using pentacene as a grapheme protective layer. CONSTITUTION: A pentacene vapor is generated by heating and vaporizing pentacene(S100). The thickness of the pentacene is 1nm~2nm. The pentacene is deposited to the surface of the graphene(S110). The graphene and the pentacene are composed of silicon(Si) or silicon carbide(SiC).

    Abstract translation: 目的:提供一种图形保护层及其形成方法,以通过使用并五苯作为刻画保护层来防止由空气和水等外部因素引起的图形的电学性质。 构成:并五苯蒸气通过加热和蒸发并五苯(S100)而产生。 并五苯的厚度为1nm〜2nm。 并五苯沉积到石墨烯的表面(S110)。 石墨烯和并五苯由硅(Si)或碳化硅(SiC)组成。

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