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公开(公告)号：KR1020140132050A
公开(公告)日：2014-11-17
申请号：KR1020130051027
申请日：2013-05-07
Applicant: 한국표준과학연구원
IPC: H05H1/46
CPC classification number: H01J37/3211 , H01J37/32183 , H01Q1/366 , H05H1/46 , H05H2001/4667 , H05H2001/4682
Abstract: 본 발명은 유도 결합 플라즈마 발생용 안테나 구조체를 제공한다. 이 안테나 구조체는 접지 전극판, 접지 전극판의 측면에 연결되고 접지 전극판의 주위에 배치된 유도 결합 안테나, 및 유도 결합 안테나에 전력을 분배하는 전력 분배부를 포함한다. 유도 결합 안테나는 접지 전극판에 각각 연결되고 접지 전극판의 중심을 기준으로 제1 사분면 내지 제4 사분면에 각각 배치된 제1 내지 제4 보조 안테나들을 포함한다. 제2 보조 안테나는 제1 보조 안테나가 시계방향으로 90도 회전한 형상으로 배치된다. 보조 안테나는 홀수 개의 안테나 브랜치들 및 안테나 브랜치들을 서로 연결하는 안테나 연결부들을 포함한다. 이웃한 안테나 브랜치들의 전류는 서로 반대 방향으로 흐른다.
Abstract translation: 本发明提供一种用于产生电感耦合等离子体的天线结构。 天线结构包括：接地电极板，与接地电极板侧连接并且设置在接地电极板周围的电感耦合天线;以及将电力分配给电感耦合天线的配电单元。 电感耦合天线包括连接到接地电极板的第一至第四辅助天线，并且基于接地电极板的中心布置在第一至第四象限上。 第二辅助天线布置成使得第一辅助天线顺时针旋转90度的形状。 辅助天线包括连接天线分支的奇数天线分支和天线连接部分。 相邻天线分支的电流沿相反的方向流动。
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公开(公告)号：KR101225010B1
公开(公告)日：2013-01-22
申请号：KR1020110071352
申请日：2011-07-19
Applicant: 한국표준과학연구원
IPC: H05H1/00 , H01L21/3065 , H05H1/46 , C23C16/50
CPC classification number: H05H1/0081 , H01J37/321 , H01J37/32165 , H01J37/32935
Abstract: PURPOSE: A super-high frequency probe is provided to obtain the accurate plasma density even in a discharging plasma condition difficult to measure by using the same type of radiation antenna with the existing rod antenna. CONSTITUTION: A super-high frequency probe(100) comprises a rod shaped radiation antenna(112) for emitting super high frequency which scans a frequency inside a plasma and a receiving antenna(114) which receives an electromagnetic wave radiated from the radiation antenna. The receiving antenna is inserted inside the plasma. The receiving antenna receives an electromagnetic wave radiated from the radiation antenna with a loop-shaped which covers the surrounding of the radiation antenna. A plasma is formed by an energy approval unit(136) inside the chamber. A power(132) can provide power to the energy approval unit. A chamber(131) can include a substrate holder(138), and a substrate(137) mounted on the substrate holder. [Reference numerals] (AA) Plasma
Abstract translation: 目的：提供超高频探头，即使在使用与现有的棒状天线相同类型的辐射天线难以测量的放电等离子体状态下也能获得准确的等离子体密度。 构成：超高频探头（100）包括用于发射扫描等离子体内的频率的超高频的棒状辐射天线（112）和接收从辐射天线辐射的电磁波的接收天线（114）。 接收天线插入等离子体内。 接收天线接收从辐射天线辐射的电磁波，其具有覆盖辐射天线周围的环形。 等离子体由室内的能量认可单元（136）形成。 电源（132）可以向能量认可单元提供电力。 室（131）可以包括衬底保持器（138）和安装在衬底保持器上的衬底（137）。 （标号）（AA）等离子体
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公开(公告)号：KR101456542B1
公开(公告)日：2014-10-31
申请号：KR1020130051029
申请日：2013-05-07
Applicant: 한국표준과학연구원
IPC: G01N22/00 , H05H1/00 , H01L21/3065 , C23C16/50
CPC classification number: H05H1/0006 , G01N22/00 , H01L21/3065
Abstract: Provided is a microwave plasma diagnosis apparatus which includes a radiation probe radiating a microwave on a plasma after an outer wire and a dielectric layer are removed from a coaxial cable structure; a detection probe detecting the microwave transmitted through the plasma from the radiation probe after an outer wire and a dielectric layer are removed from a coaxial cable structure; an electromagnetic shielding unit surrounding the radiation probe and the detection probe, including an opened portion opened in the axial direction of the radiation probe, and having a mesh structure; and a spectrum analysis unit providing a variable microwave signal to the radiation probe and receiving and analyzing the variable microwave signal transmitted through the plasma from the detection probe.
Abstract translation: 本发明提供一种微波等离子体诊断装置，其包括在从同轴电缆结构除去外线和电介质层之后在等离子体上照射微波的辐射探头; 检测探针，在外线和电介质层从同轴电缆结构中去除之后，检测从辐射探针传输通过等离子体的微波; 围绕所述辐射探头和所述检测探头的电磁屏蔽单元，包括沿所述辐射探头的轴向开放的开口部分，并具有网状结构; 以及频谱分析单元，其向所述辐射探针提供可变微波信号，并且从所述检测探头接收和分析通过所述等离子体传输的可变微波信号。
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公开(公告)号：KR101379701B1
公开(公告)日：2014-04-01
申请号：KR1020120136023
申请日：2012-11-28
Applicant: 한국표준과학연구원
IPC: H01L21/3065
CPC classification number: H01L21/31116 , H01J37/32357 , H01J37/32568 , H01L21/02049
Abstract: Provided are a substrate processing device and a substrate processing method. The substrate processing device includes a chamber; an indirect plasma source which is placed at the outside of the chamber and provides the chamber with activated ammonia and activated hydrogen fluoride; and a direct plasma source which provides a substrate in the chamber with ion energy. The direct plasma source includes multiple grounding electrodes arranged in a row in a first direction on a first plane, which is defined as a second direction vertical to the first direction vertically separated from a plane with the substrate; and power electrodes which are arranged in between the grounding electrodes, arranged in a row in the first direction, and generate plasma between neighboring grounding electrodes using power from an RF power source. The activated ammonia and hydrogen fluoride are supplied on the substrate via spaces between the power electrodes and grounding electrodes.
Abstract translation: 提供了基板处理装置和基板处理方法。 基板处理装置包括： 间接等离子体源，其被放置在室的外部，并且向室提供活化的氨和活化的氟化氢; 以及直接等离子体源，其在腔室中提供离子能量的基底。 直接等离子体源包括在第一平面上沿第一方向排成一行的多个接地电极，其被定义为垂直于与基板的平面垂直分离的第一方向的第二方向; 以及布置在接地电极之间的功率电极，其在第一方向上排成一列，并且使用来自RF电源的功率在相邻的接地电极之间产生等离子体。 活性氨和氟化氢通过电源电极和接地电极之间的空间在基板上提供。
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公开(公告)号：KR101310766B1
公开(公告)日：2013-09-25
申请号：KR1020120028687
申请日：2012-03-21
Applicant: 한국표준과학연구원
IPC: H05H1/00 , H01L21/205 , G01R29/08 , H05H1/46
CPC classification number: H01J37/32935 , H01J37/3211 , H01J37/32174 , H05H1/0018 , H05H1/46 , H05H2001/4667 , H05H2001/4682
Abstract: PURPOSE: A process monitoring method and a processing monitoring apparatus are provided to monitor a thickness of a sheath in real time while minimizing an influence on plasma. CONSTITUTION: A process monitoring apparatus (100) comprises a radiating antenna (112), a receiving antenna (114), a variable frequency generator (124), a penetrated wave processor (126), an assistant measuring unit (142) and a processor (128). The radiating antenna is inserted inside plasma and radiates electromagnetic waves. The receiving antenna is inserted inside plasma and receives the electromagnetic waves passing through the plasma. The variable frequency generator provides scanning frequency to the radiating antenna. The penetrated wave processor is connected to the receiving antenna and extracts a penetration coefficient by treating the penetrated waves passing through the plasma. The assistant measuring unit measures collision frequency. The processor obtains the thickness of sheath by using the collision frequency and transmission coefficient. The processor obtains cut-off angular frequency for the penetration coefficient according to frequency and obtains the thickness of sheath by applying the cut-off frequency and collision frequency to a circuit model which is modeled with plasma and sheath located between the radiating antenna and the receiving antenna. [Reference numerals] (AA) Plasma
Abstract translation: 目的：提供过程监测方法和处理监测装置，以实时监测护套的厚度，同时最小化对等离子体的影响。 构成：过程监控装置（100）包括辐射天线（112），接收天线（114），变频发生器（124），穿透波处理器（126），辅助测量单元（142）和处理器 （128）。 辐射天线插入等离子体内并辐射电磁波。 接收天线插入等离子体内，并接收通过等离子体的电磁波。 可变频发生器向辐射天线提供扫描频率。 穿透波处理器连接到接收天线，并通过处理通过等离子体的穿透波提取穿透系数。 辅助测量单元测量碰撞频率。 处理器通过使用碰撞频率和透射系数获得护套的厚度。 处理器根据频率获得穿透系数的截止角频率，并通过将截止频率和碰撞频率应用于由位于辐射天线和接收器之间的等离子体和护套建模的电路模型获得护套厚度 天线。 （标号）（AA）等离子体
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Patent Agency Ranking
公开(公告)号：KR101225011B1
公开(公告)日：2013-01-22
申请号：KR1020110074994
申请日：2011-07-28
Applicant: 한국표준과학연구원
CPC classification number: H05H1/0081 , G01N27/02 , H01J37/3211 , H01J37/32183 , H01J37/32935 , H05H1/46 , H05H2001/4682
Abstract: PURPOSE: A super high frequency probe using resonance structure is provided to measure a plasma density over again by using the cut-off frequency from a measured antenna and a radiating antenna exposed to plasma. CONSTITUTION: A radiating antenna(112) radiates a super high frequency which scans a frequency from the inside of plasma. A receiving antenna(114) receives an electromagnetic wave radiated from the radiating antenna by being inserted inside of the plasma. A resonance structure(116)which is arranged at the surrounding of the radiating antenna and the receiving antenna is formed with an electrical material which resonances with an electromagnetic wave. The resonance structure provides resonant frequency. The resonance structure comprises a mesh structure or a planar structure. The resonance structure has a cylinder type which covers the radiating antenna and the receiving antenna. [Reference numerals] (AA) Plasma
Abstract translation: 目的：提供使用谐振结构的超高频探头，通过使用来自测量天线和暴露于等离子体的辐射天线的截止频率再次测量等离子体密度。 构成：辐射天线（112）辐射出从等离子体内部扫描频率的超高频。 接收天线（114）通过插入等离子体内部而接收从辐射天线辐射的电磁波。 布置在辐射天线和接收天线的周围的谐振结构（116）形成有与电磁波共振的电材料。 谐振结构提供谐振频率。 共振结构包括网状结构或平面结构。 谐振结构具有覆盖辐射天线和接收天线的圆筒型。 （标号）（AA）等离子体
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公开(公告)号：KR1020110109406A
公开(公告)日：2011-10-06
申请号：KR1020100029120
申请日：2010-03-31
Applicant: 한국표준과학연구원
CPC classification number: H05H1/46 , H01J37/3211 , H01J37/32825 , H01Q1/366 , H05H2001/4667
Abstract: 본 발명은 내부 안테나 및 플라즈마 발생 장치를 제공한다. 이 내부 안테나는 진공용기의 내부에 직접 삽입되어 플라즈마를 발생시킨다. 내부 안테나는 일단에 전력이 공급되고 타단에서 전력이 4갈래로 분배되는 전원 공급부, 전원 공급부와 수직하게 배치된 전력 분배 평면에 배치되고 전원 공급부의 타단에서 대칭적으로 4 갈래로 갈라지는 주 방사상(main radial) 브랜치들, 인접한 주 방사상 브랜치들을 서로 연결시키는 외곽 브랜치들, 외곽 브랜치들의 중심 영역에서 전원 공급부의 타단 방향으로 연장되는 보조 방사상 브랜치들(sub radial), 및 보조 방사상 브랜치들에 각각 연결되고 전원 공급부와 평행하게 연장되는 접지부들을 포함한다.
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公开(公告)号：KR101756325B1
公开(公告)日：2017-07-10
申请号：KR1020160007397
申请日：2016-01-21
Applicant: 한국표준과학연구원
Abstract: 본발명은플라즈마진단장치를제공한다. 이평면형플라즈마진단장치는주파수가가변되는초고주파를플라즈마에방사하는방사안테나; 및상기방사안테나와인접하게배치되고상기플라즈마로부터상기초고주파를수신하는수신안테나를포함한다.
Abstract translation: 本发明提供一种等离子体诊断设备。 不规则表面型等离子体诊断设备包括：辐射天线，用于向等离子体辐射具有可变频率的微波; 并且接收天线被设置成与辐射天线接触并从等离子体接收微波。
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公开(公告)号：KR101473371B1
公开(公告)日：2014-12-16
申请号：KR1020130051027
申请日：2013-05-07
Applicant: 한국표준과학연구원
IPC: H05H1/46
Abstract: 본발명은유도결합플라즈마발생용안테나구조체를제공한다. 이안테나구조체는접지전극판, 접지전극판의측면에연결되고접지전극판의주위에배치된유도결합안테나, 및유도결합안테나에전력을분배하는전력분배부를포함한다. 유도결합안테나는접지전극판에각각연결되고접지전극판의중심을기준으로제1 사분면내지제4 사분면에각각배치된제1 내지제4 보조안테나들을포함한다. 제2 보조안테나는제1 보조안테나가시계방향으로 90도회전한형상으로배치된다. 보조안테나는홀수개의안테나브랜치들및 안테나브랜치들을서로연결하는안테나연결부들을포함한다. 이웃한안테나브랜치들의전류는서로반대방향으로흐른다.
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公开(公告)号：KR101310753B1
公开(公告)日：2013-09-24
申请号：KR1020120043578
申请日：2012-04-26
Applicant: 한국표준과학연구원
IPC: H05H1/46 , H01L21/3065
CPC classification number: H01J37/3211 , H01Q1/02 , H01Q1/366 , H01Q7/00 , H05H1/46 , H05H2001/4667
Abstract: PURPOSE: An inductive antenna is provided to improve power transfer efficiency about plasma by generating inductively coupled plasma. CONSTITUTION: A conductive antenna (130) comprises a first power supply line (131), a second power supply line (132), a core antenna (133), ground outer skins (134), insulation jackets (135) and conductive bridges (136). The first power supply line includes a first core conductive line, a first dielectric body inner skin covering the first core conductive line and a first conductive outer skin covering the first dielectric body inner skin and has a coaxial cable structure. The second power supply line includes a second conductive line, a second dielectric body inner skin covering the second core conductive line and a second conductive outer skin covering the second dielectric body inner skin and has a coaxial cable structure. The core antenna is connected to the first center core conductive line and the second core conductive line and forms a loop. The multiple ground outer skins cover a part of the core antenna and are arranged to be separated from each other. The insulation jackets are arranged between the core antenna and the ground outer skins and cover the core antenna. The conductive bridges connect the ground outer skins which are adjacent to each other.
Abstract translation: 目的：提供感应天线，以通过产生电感耦合等离子体来提高关于等离子体的功率传递效率。 导电天线（130）包括第一电源线（131），第二电源线（132），核心天线（133），接地外皮（134），绝缘护套（135）和导电桥 136）。 第一电源线包括第一芯导电线，覆盖第一芯导电线的第一绝缘体内表皮和覆盖第一绝缘体内皮的第一导电外皮，并具有同轴电缆结构。 第二电源线包括第二导电线，覆盖第二芯导电线的第二介电体内表皮和覆盖第二介电体内表皮的第二导电外皮，并具有同轴电缆结构。 核心天线连接到第一中心芯导电线和第二芯导电线并形成环。 多个地面外皮覆盖核心天线的一部分并且被布置成彼此分离。 绝缘护套布置在核心天线和地面外皮之间，并覆盖核心天线。 导电桥连接彼此相邻的地面外皮。
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