폴리머 후처리 공정을 이용한 무색 투명 FTO 전도막제조 방법
    3.
    发明公开
    폴리머 후처리 공정을 이용한 무색 투명 FTO 전도막제조 방법 有权
    通过聚合反应制备无色和高透明度的多金属氧化铅膜

    公开(公告)号:KR1020090033526A

    公开(公告)日:2009-04-06

    申请号:KR1020070098568

    申请日:2007-10-01

    Abstract: A non-colored FTO(f-dopped tin oxide) conductive film having high quality and high transmittance is provided to reduce optical coloration effect through a series of polymer post-treatment so as to produce a transmittance-increased FTO film. A non-colored FTO(f-dopped tin oxide) conductive film using a series of polymer post-treatment comprises the following steps of: heating a glass substrate up to a temperature range of 400-600°C to form a SiO2 barrier film; forming the FTO film on the SiO2 barrier film using a spray/ultrasonic spraying method; and coating the FTO film with polymer in post-treatment which is performed by dropping a polymer solution onto the FTO film and spin-coating or dip-coating the FTO film with the polymer solution.

    Abstract translation: 提供具有高质量和高透射率的无色FTO(f-掺杂的氧化锡)导电膜,以通过一系列聚合物后处理来降低光学着色效果,从而产生透射率增加的FTO膜。 使用一系列聚合物后处理的无色FTO(f-掺杂的氧化锡)导电膜包括以下步骤:将玻璃基板加热至400-600℃的温度范围以形成SiO 2阻挡膜; 使用喷雾/超声波喷涂方法在SiO 2阻挡膜上形成FTO膜; 并在后处理中用聚合物涂覆FTO膜,其通过将聚合物溶液滴加到FTO膜上并用聚合物溶液旋涂或浸涂FTO膜来进行。

    습기제거용 불소 함유 산화주석(FTO) 투명전도막 유리및 이의 제조방법
    5.
    发明公开
    습기제거용 불소 함유 산화주석(FTO) 투명전도막 유리및 이의 제조방법 有权
    透明导电F-DOPPED氧化锌玻璃,用于防止和制造

    公开(公告)号:KR1020090020136A

    公开(公告)日:2009-02-26

    申请号:KR1020070084613

    申请日:2007-08-22

    Abstract: Transparent conductive F-doped tin oxide glass for defogging is provided to have excellent heat resistance, chemical resistance and abrasion resistance and to include FTO transparent oxide conductive having low resistance and high transmittance. Transparent conductive F-doped tin oxide glass for defogging is made by laminating a glass plate layer, a dielectric barrier layer, a functional layer, a metal electrode layer, a plastic interlayer and a glass plate layer in the order. A molar ratio of F/Sn in the functional layer is 0.5~2. A thickness of the FTO transparency conductive film layer is 0.1~1.3 mum. The dielectric barrier layer is made by SiO2 or mixing a transition metal selected from Ti, Zn and Al with SiO2. A thickness of the thickness is 5 ~ 200 nm.

    Abstract translation: 提供用于除雾的透明导电F掺杂氧化锡玻璃以具有优异的耐热性,耐化学性和耐磨性,并且包括具有低电阻和高透射率的FTO透明氧化物导电。 用于除雾的透明导电F掺杂氧化锡玻璃按照顺序层压玻璃板层,介电阻挡层,功能层,金属电极层,塑料中间层和玻璃板层来制造。 功能层中F / Sn的摩尔比为0.5〜2。 FTO透明导电膜层的厚度为0.1〜1.3μm。 介电阻挡层由SiO 2制成,或将选自Ti,Zn和Al的过渡金属与SiO 2混合。 厚度为5〜200nm。

    2차원 하이브리드 소재 제조 방법
    9.
    发明授权
    2차원 하이브리드 소재 제조 방법 有权
    2由二维板材组成的混合材料的制备方法

    公开(公告)号:KR101583335B1

    公开(公告)日:2016-01-08

    申请号:KR1020140054795

    申请日:2014-05-08

    Inventor: 허승헌 송철규

    Abstract: 본발명은 2차원판상소재들에서발생하는두께문제즉, 2차원판상소재가겹쳐짐에따라발생하는단차문제를해결하여물성을향상시키는방법에관한것이다.본발명은「(a) 전기전도성을갖는유연성판상소재를준비하는단계; 및 (b) 상기유연성판상소재에전기전도성을갖고상기유연성판상소재보다두꺼운두께를갖는제2판상소재를혼합시킴으로써, 상기제2판상소재사이에상기유연성판상소재가구겨져들어가소재간 접촉면이넓어지도록하는단계; 를포함하는 2차원하이브리드소재제조방법」을제공한다.

    전기전도막용 2차원 하이브리드 소재 제조 방법
    10.
    发明授权
    전기전도막용 2차원 하이브리드 소재 제조 방법 有权
    2用于导电膜的二维板材料组成的混合材料的制备方法

    公开(公告)号:KR101582836B1

    公开(公告)日:2016-01-08

    申请号:KR1020140054801

    申请日:2014-05-08

    Inventor: 허승헌 송철규

    Abstract: 본발명은 2차원판상소재들에서발생하는두께문제즉, 2차원판상소재가겹쳐짐에따라발생하는단차문제를해결하여물성을향상시키는방법에관한것이다. 본발명은「(a) 유연성판상소재를준비하는단계; 및 (b) 상기유연성판상소재에두께가다른제2판상소재를혼합시키는단계; 를포함하는 2차원하이브리드소재제조방법」을제공한다.

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