公开(公告)号：EP2216682A4

公开(公告)日：2012-05-02

申请号：EP08850248

申请日：2008-11-12

Applicant: ADEKA CORP

Inventor： MORITA HIROSHI ,  SATO HIROMI ,  KOBAYASHI ATSUSHI ,  OMI JINICHI ,  SAITO SEIICHI

IPC: G03F7/075 ,  C08G77/16 ,  C08G77/50 ,  C08K5/23 ,  C08L83/06 ,  G03F7/023 ,  G03F7/40 ,  H01L23/29

CPC classification number: C08G77/50 ,  C08G77/14 ,  C08G77/80 ,  C08K5/235 ,  C08K5/5419 ,  C08L83/06 ,  G03F7/0233 ,  G03F7/0758 ,  G03F7/40 ,  H01L23/296 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/124 ,  H01L2924/00

公开(公告)号：JP2009215343A

公开(公告)日：2009-09-24

申请号：JP2008057339

申请日：2008-03-07

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  SATO HIROMI ,  SAITO SEIICHI

IPC: C08G77/04 ,  C08G77/16 ,  H01J9/02 ,  H01J11/02 ,  H01J11/22 ,  H01J11/34 ,  H01J11/38

Abstract: PROBLEM TO BE SOLVED: To provide a low dielectric thermosetting resin which can be formed at a low temperature, is excellent in heat resistance, and can lighten plasma displays. SOLUTION: Provided is a thermosetting resin prepared by hydrolyzing a compound (1) (wherein, R 1 to R 3 are each identically or differently a straight chain or branched chain 1 to 4C alkyl group; R 4 is H or a straight chain or branched chain 1 to 4C alkyl group) and a compound (2) (wherein, R 5 to R 8 are each identically or differently a straight chain or branched chain 1 to 4C alkyl group) in a (1):(2) molar ratio of 70:30 to 90:10, and having a mol.wt. of ≥10,000. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供可以在低温下形成的低介电性热固性树脂，耐热性优异，并且可以减轻等离子体显示器。 解决方案：提供通过水解化合物（1）（其中R 1和R 3各自相同或不同的直链或支链的化合物（1） 1至4C链烷基; R 4是H或直链或支链1至4个碳原子的烷基）和化合物（2）（其中，R 1〜 （1）：（2）摩尔比为70:30至90:10的R“SP”8各自相同或不同的直链或支链1至4C烷基），并且具有摩尔 .wt。 ≥10,000。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008231068A

公开(公告)日：2008-10-02

申请号：JP2007075991

申请日：2007-03-23

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  SATO HIROMI ,  OMI JINICHI ,  SAITO SEIICHI

IPC: C07F7/21 ,  G03F7/039 ,  G03F7/075

CPC classification number: C07F7/21 ,  G03F7/0045 ,  G03F7/0755 ,  G03F7/0757

Abstract: PROBLEM TO BE SOLVED: To provide a cyclosiloxane compound capable of giving a positive resist composition having excellent physical properties as a resist, and to provide a positive resist composition using the cyclosiloxane compound.
SOLUTION: The cyclosiloxane compound is produced by the hydrosilylation of a compound expressed by formula (1) and/or a compound prepared by the hydrosilylation of the compound expressed by formula (1) with a divinyl compound expressed by formula (2): CH
2 =CH-R
2 -CH=CH
2 , and a compound expressed by formula (3): CH
2 =CR
3 -(R
4 )
h -T.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供能够提供具有优异物理性能的正性抗蚀剂组合物作为抗蚀剂的环硅氧烷化合物，并提供使用该环硅氧烷化合物的正性抗蚀剂组合物。 解决方案：通过式（1）表示的化合物的氢化硅烷化和/或通过式（1）表示的化合物的氢化硅烷化由式（2）表示的二乙烯基化合物制备的化合物来制备环硅氧烷化合物， CH 3 = CH-R 2 SP-CH = CH 2 ，由式（3）表示的化合物：CH 2 = CR 3 - （R 4 ）ħ -T。 版权所有（C）2009，JPO＆INPIT