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    MONITORING AND CONTROLLING INDEPENDENT SYSTEMS IN A FACTORY
    1.
    发明申请
    MONITORING AND CONTROLLING INDEPENDENT SYSTEMS IN A FACTORY 审中-公开
    监控和控制工厂中的独立系统

    公开(公告)号：WO03040882A3

    公开(公告)日：2003-09-12

    申请号：PCT/US0235415

    申请日：2002-11-05

    Applicant: ADVANCED TECH MATERIALS ,  LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

    Inventor： LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

    IPC: G05B23/02 ,  G06F19/00 ,  G06F11/30

    CPC classification number: G05B21/02 ,  G05B2219/13 ,  G05B2219/25204 ,  G05B2219/31457 ,  Y02P80/40 ,  Y02P90/86

    Abstract: A method and apparatus (400) are provided for remotely configuring, operating and monitoring equipment (320, 330) in a manufacturing facility. An interface (230) is provided that allows a remote user to establish a connection with desired equipment (320, 330) in order to configure, operate or monitor the equipment (320,330). The disclosed interface (230) performs any required translation between the diverse equipment (320, 330) and protocols of different equipment manufacturers. A web-based connection to remote equipment allows a variety of diverse equipment systems to be accessed and controlled in a uniform manner. Historical data can be analyzed following a failure using pattern recognition techniques to identify data patterns that suggest an imminent failure.

    Abstract translation: 提供了一种方法和装置（400），用于在制造设施中远程配置，操作和监视设备（320,330）。 提供了一种接口（230），其允许远程用户与所需设备（320,330）建立连接，以便配置，操作或监视设备（320,330）。 公开的接口（230）执行不同设备（320,330）和不同设备制造商的协议之间的任何所需的转换。 与远程设备的基于Web的连接允许以统一的方式访问和控制各种各样的设备系统。 历史数据可以在故障之后使用模式识别技术进行分析，以识别提示即将发生故障的数据模式。

    IN-SITU GAS BLENDING AND DILUTION SYSTEM FOR DELIVERY OF DILUTE GAS AT A PREDETERMINED CONCENTRATION
    3.
    发明申请
    IN-SITU GAS BLENDING AND DILUTION SYSTEM FOR DELIVERY OF DILUTE GAS AT A PREDETERMINED CONCENTRATION 审中-公开
    用于在预定浓度下输送稀释气体的现场气体混合和稀释系统

    公开(公告)号：WO2004088718A3

    公开(公告)日：2005-04-28

    申请号：PCT/US2004009168

    申请日：2004-03-25

    Applicant: ADVANCED TECH MATERIALS ,  ARNO JOSE I ,  DIETZ JAMES A

    Inventor： ARNO JOSE I ,  DIETZ JAMES A

    IPC: G01N21/35 ,  H01L21/66 ,  G05D11/00

    CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

    Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

    Abstract translation: 用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。 输送系统包括主动流体源，稀释液流体源，用于以预定流量分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配 通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率 的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

    Fluid distribution system and process, and semiconductor fabrication facility utilizing same
    4.
    发明专利
    Fluid distribution system and process, and semiconductor fabrication facility utilizing same 未知

    公开(公告)号：AU7712201A

    公开(公告)日：2002-02-05

    申请号：AU7712201

    申请日：2001-07-23

    Applicant: ADVANCED TECH MATERIALS

    Inventor： WANG LUPING ,  TABLER TERRY A ,  DIETZ JAMES A

    IPC: F17C11/00 ,  F17C13/04 ,  F17D1/04 ,  B01D53/04

    Abstract: A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

    IN-SITU GAS BLENDING AND DILUTION SYSTEM FOR DELIVERY OF DILUTE GAS AT A PREDETERMINED CONCENTRATION
    6.
    发明公开
    IN-SITU GAS BLENDING AND DILUTION SYSTEM FOR DELIVERY OF DILUTE GAS AT A PREDETERMINED CONCENTRATION 审中-公开
    原位气体混合和稀释SYSTEM FOR DELIVERY稀薄气体具有预定浓度

    公开(公告)号：EP1627265A4

    公开(公告)日：2006-07-26

    申请号：EP04758340

    申请日：2004-03-25

    Applicant: ADVANCED TECH MATERIALS

    Inventor： ARNO JOSE I ,  DIETZ JAMES A

    IPC: G05D11/00 ,  G01N21/35 ,  H01L21/66

    CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

    Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

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