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    CHEMICAL REAGENT DELIVERY SYSTEM UTILIZING IONIC LIQUID STORAGE MEDIUM
    6.
    发明申请
    CHEMICAL REAGENT DELIVERY SYSTEM UTILIZING IONIC LIQUID STORAGE MEDIUM 审中-公开
    化学试剂输送系统利用离子液体储存介质

    公开(公告)号：WO2007134183A3

    公开(公告)日：2008-01-17

    申请号：PCT/US2007068693

    申请日：2007-05-10

    Applicant: ADVANCED TECH MATERIALS ,  ARNO JOSE I ,  WANG LUPING ,  COOPER EMANUEL I

    Inventor： ARNO JOSE I ,  WANG LUPING ,  COOPER EMANUEL I

    IPC: B01J8/02 ,  B01J35/02

    CPC classification number: F17C11/00

    Abstract: A system (10) including a reagent supply container (12) in which a vessel (14) holds a composition including a chemical reagent dissolved or dispersed in a storage liquid (18) that is reversibly interactive with the chemical reagent to store the chemical reagent therein, and an ultrasonic energy source (19, 32, 34) adapted to introduce ultrasonic energy into the composition to liberate the chemical reagent therefrom for dispensing from the vessel of the reagent supply container. The ultrasonic energy source can be internally provided in the container, or may be provided as part of an external ultrasonic energy impingement unit (112), in which the stored chemical reagent, e.g., a microelectronic device manufacturing reagent, is extracted from the liquid storage medium for transport to a reagent-utilizing process or facility (38). The liquid storage medium may for example include an ionic liquid with which the chemical reagent is reversibly taken up, and subsequently released under ultrasonic energy exposure dispensing conditions.

    Abstract translation: 一种系统（10），包括试剂供应容器（12），其中容器（14）保持包含溶解或分散在与化学试剂可逆地相互作用的储存液体（18）中的化学试剂的组合物，以储存化学试剂 和超声能量源（19,32,34），其适于将超声能量引入所述组合物中以释放其中的化学试剂，用于从所述试剂供应容器的容器分配。 超声能量源可以内部设置在容器中，或者可以作为外部超声波能量冲击单元（112）的一部分提供，其中存储的化学试剂例如微电子器件制造试剂从液体存储器 用于运送到试剂利用过程或设施（38）的介质。 液体存储介质可以例如包括离子液体，化学试剂可以通过该离子液体被可逆地吸收，并且随后在超声能量曝光分配条件下释放。

    DELIVERY OF LOW PRESSURE DOPANT GAS TO A HIGH VOLTAGE ION SOURCE
    7.
    发明申请
    DELIVERY OF LOW PRESSURE DOPANT GAS TO A HIGH VOLTAGE ION SOURCE 审中-公开
    将低压多孔气体输送到高压离子源

    公开(公告)号：WO2007027965A2

    公开(公告)日：2007-03-08

    申请号：PCT/US2006034135

    申请日：2006-08-29

    Applicant: ADVANCED TECH MATERIALS ,  ARNO JOSE I ,  OLANDER W KARL ,  KAIM ROBERT

    Inventor： ARNO JOSE I ,  OLANDER W KARL ,  KAIM ROBERT

    IPC: B05D3/00

    CPC classification number: H01J37/08 ,  H01J27/02 ,  H01J37/3172 ,  H01J2237/0203

    Abstract: A system for delivery of low-pressure dopant gas to a high-voltage ion source in the doping of semiconductor substrates, in which undesired ionization of the gas is suppressed prior to entry into the high-voltage ion source, by modulating electron energy upstream of the high-voltage ion source so that electron acceleration effects are reduced to below a level supporting an electronic ionization cascade. The gas delivery system in a specific application includes a gas flow passage, a voltage generator electrically coupled with at least a portion of the gas flow passage to impose an electric field thereon, and an obstructive structure that is deployed to modulate acceleration length of electrons of the low-pressure gas in relation to ionization potential of the gas, to suppress ionization in the gas flow passage.

    Abstract translation: 一种用于在半导体衬底的掺杂中向高电压离子源传送低压掺杂气体的系统，其中在进入高压离子源之前，气体的不期望的电离被抑制，通过调制 高电压离子源，使得电子加速效应降低到低于支持电子离子化级联的水平。 具体应用中的气体输送系统包括气体流动通道，与气体流动通道的至少一部分电耦合以在其上施加电场的电压发生器，以及阻塞结构，其被展开以调制电子的加速度长度 相对于气体的电离电位的低压气体，抑制气体流路中的电离。

    APPARATUS AND METHOD FOR USE OF INDIUM CHLORIDE TO DELIVER INDIUM VAPOR TO ION SOURCE
    10.
    发明申请
    APPARATUS AND METHOD FOR USE OF INDIUM CHLORIDE TO DELIVER INDIUM VAPOR TO ION SOURCE 审中-公开
    使用氯化镉将离子源蒸发的装置和方法

    公开(公告)号：WO2007085008A3

    公开(公告)日：2008-01-03

    申请号：PCT/US2007060810

    申请日：2007-01-20

    Applicant: ADVANCED TECH MATERIALS ,  KAIM ROBERT ,  MARGANSKI PAUL J ,  SWEENEY JOSEPH D ,  ARNO JOSE I

    Inventor： KAIM ROBERT ,  MARGANSKI PAUL J ,  SWEENEY JOSEPH D ,  ARNO JOSE I

    IPC: C07F5/00

    CPC classification number: C23C14/22 ,  C23C16/4485 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006

    Abstract: An ion implantation system (100) including an ion source adapted to ionize a precursor vapor to form ions for implantation in a substrate (30), a material storage and dispensing apparatus including a vessel (102) adapted to hold precursor, and a dispensing assembly (104, 108) coupled to the vessel for dispensing precursor from the vessel. The dispensing assembly is coupled with the ion source (10), and a heater (106) is adapted for heating of the precursor in the vessel so that precursor dispensed from said apparatus to the ion source is maintained in a vapor phase for implantation of ions derived therefrom. Such system is adaptable for delivery of indium monochloride, e.g., from a portable material storage and dispensing apparatus, without the necessity of a vaporizer integrated into the housing of the ion source, and without the handling and processing issues attendant the use of indium trichloride.

    Abstract translation: 一种离子注入系统（100），其包括适于电离前体蒸汽以形成用于注入衬底（30）的离子的离子源，包括适于保持前体的容器（102）的材料储存和分配设备，以及分配组件 （104,108），其耦合到所述容器以从所述容器分配前体。 分配组件与离子源（10）耦合，并且加热器（106）适于加热容器中的前体，使得从所述装置分配到离子源的前体保持在用于注入离子的气相 从其衍生。 这种系统适用于例如从便携式材料储存和分配装置输送一氯化铟，而不需要将蒸发器整合到离子源的壳体中，并且不需要与三氯化铟的使用有关的处理和处理问题。

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