公开(公告)号：WO03040882A3

公开(公告)日：2003-09-12

申请号：PCT/US0235415

申请日：2002-11-05

Applicant: ADVANCED TECH MATERIALS ,  LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

Inventor： LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

IPC: G05B23/02 ,  G06F19/00 ,  G06F11/30

CPC classification number: G05B21/02 ,  G05B2219/13 ,  G05B2219/25204 ,  G05B2219/31457 ,  Y02P80/40 ,  Y02P90/86

Abstract: A method and apparatus (400) are provided for remotely configuring, operating and monitoring equipment (320, 330) in a manufacturing facility. An interface (230) is provided that allows a remote user to establish a connection with desired equipment (320, 330) in order to configure, operate or monitor the equipment (320,330). The disclosed interface (230) performs any required translation between the diverse equipment (320, 330) and protocols of different equipment manufacturers. A web-based connection to remote equipment allows a variety of diverse equipment systems to be accessed and controlled in a uniform manner. Historical data can be analyzed following a failure using pattern recognition techniques to identify data patterns that suggest an imminent failure.

Abstract translation: 提供了一种方法和装置（400），用于在制造设施中远程配置，操作和监视设备（320,330）。 提供了一种接口（230），其允许远程用户与所需设备（320,330）建立连接，以便配置，操作或监视设备（320,330）。 公开的接口（230）执行不同设备（320,330）和不同设备制造商的协议之间的任何所需的转换。 与远程设备的基于Web的连接允许以统一的方式访问和控制各种各样的设备系统。 历史数据可以在故障之后使用模式识别技术进行分析，以识别提示即将发生故障的数据模式。

公开(公告)号：WO0128917A9

公开(公告)日：2002-08-08

申请号：PCT/US0028846

申请日：2000-10-18

Applicant: ADVANCED TECH MATERIALS

Inventor： HOLST MARK ,  DUBOIS RAY ,  ARNO JOSE ,  FALLER REBECCA ,  TOM GLENN

IPC: B01D53/64 ,  B01D53/04 ,  B01J20/08 ,  B01J20/10 ,  B01J20/20 ,  B01J20/34 ,  C23C16/18 ,  C23C16/44 ,  C01B7/00 ,  B01D47/00 ,  C01C3/00

CPC classification number: B01D53/04 ,  B01D53/0446 ,  B01D53/06 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/108 ,  B01D2256/26 ,  B01D2257/706 ,  B01D2258/0216 ,  B01D2259/40096 ,  B01D2259/40098 ,  C23C16/18 ,  C23C16/4412

Abstract: A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to an organic or organometallic molecule such that upon exposure to heat (36) such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate (32) by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition (16) for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing Cu(hfac)TMVS as a copper source reagent (14).

Abstract translation: 一种使用具有松散地结合有机或有机金属分子的金属有机物的源试剂从CVD工艺中消除流出物的方法和装置，使得在暴露于热（36）时，这种结合易于切割，例如涉及 通过利用用于这种成膜的前体组合物（16）的金属有机化学气相沉积（CVD）在衬底（32）上形成膜。 在具体实施方案中的减排方法有利于利用Cu（hfac）TMVS作为铜源试剂（14）从铜沉积过程中高效地减少废水。

公开(公告)号：WO0129281A9

公开(公告)日：2001-09-27

申请号：PCT/US0041253

申请日：2000-10-18

Applicant: ADVANCED TECH MATERIALS

Inventor： HOLST MARK ,  FALLER REBECCA ,  DUBOIS RAY ,  ARNO JOSE

IPC: B01D53/72 ,  B01D53/04 ,  B01D53/34 ,  B01D53/64 ,  B01J20/08 ,  B01J20/10 ,  B01J20/18 ,  B01J20/20 ,  B01J20/26 ,  B01J20/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/56

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D53/64 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/108 ,  B01D2258/0216 ,  C23C16/409 ,  C23C16/4412

Abstract: Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products for the effluent. An endpoint detector (62) such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.

Abstract translation: 用于使用金属源试剂液体溶液沉积的多组分金属氧化物排出的流出物的装置和方法，所述金属源试剂液体溶液包含至少一种金属配位络合物，所述金属配位络合物包括与稳定络合物中的至少一个配位体配位结合的金属， 用于该金属配位络合物的溶剂介质，例如用于在基底上形成钛酸钡锶（BST）薄膜的金属有机化学气相沉积（MOCVD）工艺。 废水被吸附处理以除去流出物的前体物质和MOCVD过程副产物。 可以使用诸如石英微量天平检测器的端点检测器（62）来检测吸附处理单元中的初始突破条件。

公开(公告)号：AU2114301A

公开(公告)日：2001-04-30

申请号：AU2114301

申请日：2000-10-18

Applicant: ADVANCED TECH MATERIALS

Inventor： HOLST MARK ,  FALLER REBECCA ,  DUBOIS RAY ,  ARNO JOSE

IPC: B01D53/72 ,  B01D53/04 ,  B01D53/34 ,  B01D53/64 ,  B01J20/08 ,  B01J20/10 ,  B01J20/18 ,  B01J20/20 ,  B01J20/26 ,  B01J20/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/56

Abstract: Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.

公开(公告)号：AU2002336720A1

公开(公告)日：2003-05-19

申请号：AU2002336720

申请日：2002-11-05

Applicant: ADVANCED TECH MATERIALS

Inventor： DUBOIS RAY ,  LURCOTT STEVEN M ,  TOM GLENN M ,  ZITZMANN OLIVER A ,  DIETZ JAMES A

IPC: G05B23/02 ,  G06F19/00 ,  G06F11/30

公开(公告)号：EP1230420A4

公开(公告)日：2006-02-01

申请号：EP00984541

申请日：2000-10-18

Applicant: ADVANCED TECH MATERIALS

Inventor： HOLST MARK ,  FALLER REBECCA ,  DUBOIS RAY ,  ARNO JOSE

IPC: B01D53/72 ,  B01D53/04 ,  B01D53/34 ,  B01D53/64 ,  B01J20/08 ,  B01J20/10 ,  B01J20/18 ,  B01J20/20 ,  B01J20/26 ,  B01J20/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/56

CPC classification number: B01D53/02 ,  B01D53/04 ,  B01D53/64 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/108 ,  B01D2258/0216 ,  C23C16/409 ,  C23C16/4412

Abstract: Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products for the effluent. An endpoint detector (62) such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.