公开(公告)号：AU2003237350A1

公开(公告)日：2003-12-22

申请号：AU2003237350

申请日：2003-05-29

Applicant: ADVANCED TECH MATERIALS

Inventor： DONATUCCI MATTHEW B ,  WANG LUPING ,  WODJENSKI MICHAEL J ,  OLANDER KARL W

IPC: F17C7/00 ,  F17C5/00 ,  B08B9/027 ,  B08B5/00 ,  G05B11/01 ,  G06F15/00

Abstract: A method of reducing ventilation gas flow rate through a gas cabinet comprising a gas source vessel and a gas delivery system comprising a gas cabinet.

公开(公告)号：DE60336467D1

公开(公告)日：2011-05-05

申请号：DE60336467

申请日：2003-05-29

Applicant: ADVANCED TECH MATERIALS

Inventor： OLANDER KARL W ,  DONATUCCI MATTHEW B ,  WANG LUPING ,  WODJENSKI MICHAEL J

IPC: B08B9/027 ,  F17C7/00 ,  B08B5/00 ,  F17C5/00 ,  G05B11/01 ,  G06F15/00

公开(公告)号：SG152060A1

公开(公告)日：2009-05-29

申请号：SG2006085476

申请日：2003-05-29

Applicant: ADVANCED TECH MATERIALS

Inventor： OLANDER KARL W ,  DONATUCCI MATTHEW B ,  WANG LUPING ,  WODJENSKI MICHAEL J

IPC: F17C7/00 ,  F17C5/00 ,  B08B5/00 ,  G05B11/01 ,  G06F15/00

Abstract: Apparatus and method for dispensing a gas using a gas source (102) coupled in selective flow relationship with a gas manifold (126). The gas manifold (126) including flow circuitry (110) for discharging gas to a gas-using zone, and the gas source (126) includes a pressure-regulated gas source vessel (126) containing the gas at superatomospheric pressure.

公开(公告)号：AU2002352849A1

公开(公告)日：2003-06-30

申请号：AU2002352849

申请日：2002-11-21

Applicant: ADVANCED TECH MATERIALS

Inventor： DONATUCCI MATTHEW B ,  WANG LUPING ,  MAYER JAMES

IPC: C23C16/448 ,  H01L21/02 ,  H01L21/265 ,  C23C14/24 ,  C23C16/00

Abstract: A vaporizer system for vaporizing solid and/or liquid chemical source materials under uniform heating conditions within the vaporizer system, with reduced condensation of vaporized source materials and minimization of "cold spots" within the vaporizer, to provide a substantially continuous flow of vapor to a downstream implantation or deposition (e.g., MOCVD) system. The vaporizer includes a thermally conductive block having a multiplicity of elongated wells formed therein for holding a vapor source material. Within the thermally conductive block is an interior volume communicating with the elongated wells. The thermally conductive block is sealed to form a closed vessel and heat is applied thereto to evenly heat all the elongated wells simultaneously and vaporize the source material therein.

公开(公告)号：EP1466030A4

公开(公告)日：2008-07-23

申请号：EP02789807

申请日：2002-11-21

Applicant: ADVANCED TECH MATERIALS

Inventor： DONATUCCI MATTHEW B ,  WANG LUPING ,  MAYER JAMES

IPC: C23C14/24 ,  C23C16/448 ,  H01L21/02 ,  H01L21/265

CPC classification number: C23C16/4485

Abstract: A vaporizer system for vaporizing solid and/or liquid chemical source materials under uniform heating conditions within the vaporizer system, with reduced condensation of vaporized source materials and minimization of "cold spots" within the vaporizer, to provide a substantially continuous flow of vapor to a downstream implantation or deposition (e.g., MOCVD )system. The vaporizer includes a thermally conductive block having a multiplicity of elongated wells formed therein for holding a vapor source material. Within the thermally conductive block is an interior volume communicating with the elongated wells. The thermally conductive block is sealed to form a closed vessel and heat is applied thereto to evenly heat all the elongated wells simultaneously and vaporize the source material therein.

公开(公告)号：EP1511583A4

公开(公告)日：2008-12-24

申请号：EP03736812

申请日：2003-05-29

Applicant: ADVANCED TECH MATERIALS

Inventor： OLANDER KARL W ,  DONATUCCI MATTHEW B ,  WANG LUPING ,  WODJENSKI MICHAEL J

IPC: F17C7/00 ,  F17C5/00 ,  B08B9/027 ,  B08B5/00 ,  G05B11/01 ,  G06F15/00

CPC classification number: F17C13/04 ,  F17C5/00 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2205/0111 ,  F17C2205/0176 ,  F17C2205/0326 ,  F17C2205/0332 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/012 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/037 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/036 ,  F17C2225/0123 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2260/036 ,  F17C2260/044 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0324 ,  Y10T137/0419 ,  Y10T137/2569 ,  Y10T137/4259 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/7762 ,  Y10T137/7793 ,  Y10T137/8158 ,  Y10T137/87249

Abstract: Apparatus and method for dispensing a gas using a gas source (102) coupled in selective flow relationship with a gas manifold (126). The gas manifold (126) including flow circuitry (110) for discharging gas to a gas-using zone, and the gas source (126) includes a pressure-regulated gas source vessel (126) containing the gas at superatmospheric pressure.