公开(公告)号：WO2012051380A3

公开(公告)日：2012-07-12

申请号：PCT/US2011056084

申请日：2011-10-13

Applicant: ADVANCED TECH MATERIALS ,  COOPER EMANUEL I ,  TOTIR GEORGE GABRIEL ,  PAYNE MAKONNEN ,  IBM

Inventor： COOPER EMANUEL I ,  TOTIR GEORGE GABRIEL ,  PAYNE MAKONNEN

IPC: C11D7/32 ,  C09K13/00 ,  G03F7/42 ,  H01L21/027 ,  H01L21/304

CPC classification number: C11D3/0073 ,  C11D3/046 ,  C11D3/26 ,  C11D3/3942 ,  C11D3/3947 ,  C11D11/0047 ,  G03F7/423 ,  G03F7/425 ,  H01L21/02063 ,  H01L21/02074 ,  H01L21/76814

Abstract: Cleaning compositions and processes for cleaning residue from a microelectronic device having said residue thereon. The composition comprises at least one amine, at least one oxidizing agent, water, and at least one borate species and achieves highly efficacious cleaning of the residue material, including post-ash residue, post-etch residue, post-CMP residue, particles, organic contaminants, metal ion contaminants, and combinations thereof from the microelectronic device while simultaneously not damaging the titanium nitride layers and low-k dielectric materials also present on the device.

Abstract translation: 用于从其上具有所述残余物的微电子器件清洁残留物的清洁组合物和方法。 组合物包含至少一种胺，至少一种氧化剂，水和至少一种硼酸盐物质，并且实现残余物质的高效清洁，包括后灰渣残留物，蚀刻后残留物，CMP后残留物，颗粒， 有机污染物，金属离子污染物及其组合，同时不损坏也存在于该装置上的氮化钛层和低k电介质材料。

公开(公告)号：WO2012027667A3

公开(公告)日：2012-05-10

申请号：PCT/US2011049347

申请日：2011-08-26

Applicant: ADVANCED TECH MATERIALS ,  CHEN TIANNIU ,  BILODEAU STEVEN ,  SHEU CHIMIN ,  NAKANISHI MUTSUMI ,  MATSUOKA MASAHIRO ,  NAKAYAMA FUMIO ,  ZHANG PENG ,  KORZENSKI MICHAEL B ,  COOPER EMANUEL I ,  VECCHARELLI KATE ,  PAYNE MAKONNEN

Inventor： CHEN TIANNIU ,  BILODEAU STEVEN ,  SHEU CHIMIN ,  NAKANISHI MUTSUMI ,  MATSUOKA MASAHIRO ,  NAKAYAMA FUMIO ,  ZHANG PENG ,  KORZENSKI MICHAEL B ,  COOPER EMANUEL I ,  VECCHARELLI KATE ,  PAYNE MAKONNEN

IPC: H01L21/302

CPC classification number: C09C3/08 ,  B81C1/00619 ,  B81C1/00928 ,  H01L21/02082 ,  H01L21/302 ,  H01L21/306

Abstract: Methods of reducing the capillary forces experienced by fragile high aspect ratio structures during drying to substantially prevent damage to said high aspect ratio structures during drying. They include modifying the surface of the high aspect ratio structures such that the forces are sufficiently minimized and as such less than 10% of the high aspect ratio features will have bent or collapsed during drying of the structure having said features thereon.

Abstract translation: 在干燥过程中减少脆性高纵横比结构所经受的毛细管力的方法，以基本上防止在干燥过程中对所述高纵横比结构造成损坏。 它们包括改变高纵横比结构的表面，使得力被充分地最小化，并且因此在其具有所述特征的结构的干燥期间，小于10％的高纵横比特征将具有弯曲或折叠。

公开(公告)号：WO2010091045A3

公开(公告)日：2010-11-25

申请号：PCT/US2010022987

申请日：2010-02-03

Applicant: ADVANCED TECH MATERIALS ,  WARNER BABCOCK INST FOR GREEN CHEMISTRY LLC ,  KORZENSKI MICHAEL B ,  JIANG PING ,  WARNER JOHN ,  MENDUM TED ,  LUGUS MICHELLE ,  WHITFIELD JUSTIN ,  VANBENSCHOTEN HELEN ,  PAYNE MAKONNEN

Inventor： KORZENSKI MICHAEL B ,  JIANG PING ,  WARNER JOHN ,  MENDUM TED ,  LUGUS MICHELLE ,  WHITFIELD JUSTIN ,  VANBENSCHOTEN HELEN ,  PAYNE MAKONNEN

IPC: G03F7/42

CPC classification number: G03F7/425 ,  G03F7/426

Abstract: Removal compositions and processes for removing polymers and/or other organic materials from a surface having same thereon. The semi-aqueous composition is substantially devoid of fluoride species.

Abstract translation: 去除组合物和从其上具有相同表面的聚合物和/或其他有机材料去除的方法。 半含水组合物基本上不含氟化物物质。

公开(公告)号：SG187959A1

公开(公告)日：2013-03-28

申请号：SG2013014071

申请日：2011-08-26

Applicant: ADVANCED TECH MATERIALS

Inventor： CHEN TIANNIU ,  BILODEAU STEVEN ,  SHEU CHIMIN ,  NAKANISHI MUTSUMI ,  MATSUOKA MASAHIRO ,  NAKAYAMA FUMIO ,  ZHANG PENG ,  KORZENSKI MICHAEL B ,  COOPER EMANUEL I ,  VECCHARELLI KATE ,  PAYNE MAKONNEN

Abstract: Methods of reducing the capillary forces experienced by fragile high aspect ratio structures during drying to substantially prevent damage to said high aspect ratio structures during drying. They include modifying the surface of the high aspect ratio structures such that the forces are sufficiently minimized and as such less than 10% of the high aspect ratio features will have bent or collapsed during drying of the structure having said features thereon.