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公开(公告)号：US20210335569A1
公开(公告)日：2021-10-28
申请号：US17369746
申请日：2021-07-07
Applicant: Applied Materials Israel Ltd.
Inventor： Itay Asulin , Emil Weisz , Eitam Yitzchak Vinegrad , Menachem Lapid , Boris Rozensvaig
IPC: H01J37/244 , H01J37/28
Abstract: A scanning electron microscope and a method for evaluating a sample, the method may include (a) illuminating the sample with a primary electron beam, (b) directing secondary electrons emitted from the sample and propagated above a first scintillator, towards an upper portion of the first scintillator, wherein the first scintillator and a second scintillator are positioned between the sample and a column electrode of the column; wherein the first scintillator is positioned above the second scintillator; (c) detecting the secondary electrons by the first scintillator; (d) directing backscattered electrons emitted from the sample towards a lower portion of the second scintillator; and (e) detecting the backscattered electrons by the second scintillator.
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公开(公告)号：US20230055035A1
公开(公告)日：2023-02-23
申请号：US17404900
申请日：2021-08-17
Applicant: Applied Materials Israel Ltd.
Inventor： Eitam Yitzchak Vinegrad , Itay Asulin
IPC: G02B6/35 , H01J37/304 , H01J37/244
Abstract: An adjustable attenuation optical unit that may include a lightguide that includes a core, wherein the core comprises an output, an input and an exterior surface; and an adjustable attenuator that is configured to define an interfacing parameter related to an area of the exterior surface thereby receiving at least some of the light that impinges on the area.
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公开(公告)号：US20240057957A1
公开(公告)日：2024-02-22
申请号：US18110328
申请日：2023-02-15
Applicant: Applied Materials Israel Ltd.
Inventor： Martin Chauvin , Eugene Brozgol , Marat Feldman , Yosef Basson , Itay Asulin , Shmuel Nakash , Jacob Levin
IPC: A61B6/00
Abstract: An energy-dispersive x-ray spectroscopy (EDX) sensing unit, the EDX sensing unit include a protective unit and an x-ray sensor that includes one or more sensing regions. The protective unit is configured to (i) introduce a change in one or more properties of electrons emitted from a sample, thereby preventing the electrons emitted from the sample from reaching the one or more sensing regions, the electrons are emitted from the sample due to an illuminating of the sample by a primary electron beam, and (ii) increase a safety of operation of the EDX sensing unit. The x-ray sensor is configured to (i) receive, by the one or more sensing regions, x-ray photons emitted from the sample due to the illuminating of the sample, and (ii) generate detection signals indicative of the x-ray photons.
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公开(公告)号：US11189451B2
公开(公告)日：2021-11-30
申请号：US17110167
申请日：2020-12-02
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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公开(公告)号：US20240060912A1
公开(公告)日：2024-02-22
申请号：US17891473
申请日：2022-08-19
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Martin Chauvin , Eitam Vinegrad , Itay Asulin
IPC: G01N23/20091 , G01N23/2252
CPC classification number: G01N23/20091 , G01N23/2252 , G01N2223/079
Abstract: An EDX sensing unit that includes an x-ray sensor including one or more sensing regions, and a protective unit that is configured to introduce a change in one or more properties of electrons emitted from the sample, thereby preventing the electrons emitted from the sample from reaching the one or more sensing regions; wherein the electrons are emitted from the sample due to an illuminating of the sample by a primary electron beam. The x-ray sensor is configured to (i) receive, by the one or more sensing regions, x-ray photons emitted from the sample due to the illuminating of the sample, and (ii) generate detection signals indicative of the x-ray photons.
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Patent Agency Ranking
公开(公告)号：US11835769B2
公开(公告)日：2023-12-05
申请号：US17404900
申请日：2021-08-17
Applicant: Applied Materials Israel Ltd.
Inventor： Eitam Yitzchak Vinegrad , Itay Asulin
IPC: G02B6/35 , H01J37/244 , H01J37/304
CPC classification number: G02B6/3538 , H01J37/244 , H01J37/3045 , H01J2237/28
Abstract: An adjustable attenuation optical unit that may include a lightguide that includes a core, wherein the core comprises an output, an input and an exterior surface; and an adjustable attenuator that is configured to define an interfacing parameter related to an area of the exterior surface thereby receiving at least some of the light that impinges on the area.
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公开(公告)号：US20210175040A1
公开(公告)日：2021-06-10
申请号：US17110167
申请日：2020-12-02
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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公开(公告)号：US11646173B2
公开(公告)日：2023-05-09
申请号：US17369746
申请日：2021-07-07
Applicant: Applied Materials Israel Ltd.
Inventor： Itay Asulin , Emil Weisz , Eitam Yitzchak Vinegrad , Menachem Lapid , Boris Rozensvaig
IPC: H01J37/244 , H01J37/28
CPC classification number: H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/2445 , H01J2237/2448 , H01J2237/24475
Abstract: A scanning electron microscope and a method for evaluating a sample, the method may include (a) illuminating the sample with a primary electron beam, (b) directing secondary electrons emitted from the sample and propagated above a first scintillator, towards an upper portion of the first scintillator, wherein the first scintillator and a second scintillator are positioned between the sample and a column electrode of the column; wherein the first scintillator is positioned above the second scintillator; (c) detecting the secondary electrons by the first scintillator; (d) directing backscattered electrons emitted from the sample towards a lower portion of the second scintillator; and (e) detecting the backscattered electrons by the second scintillator.
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公开(公告)号：US10886092B2
公开(公告)日：2021-01-05
申请号：US16839986
申请日：2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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10.发明申请公开(公告)号：US20200234907A1
公开(公告)日：2020-07-23
申请号：US16839986
申请日：2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
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