公开(公告)号：US11687007B2

公开(公告)日：2023-06-27

申请号：US17423325

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud Hubaux ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F1/70 ,  G03F7/30 ,  G03F7/00 ,  G06F30/392

CPC classification number: G03F7/70508 ,  G03F1/70 ,  G03F7/70616 ,  G06F30/392 ,  G05B2219/45028 ,  G05B2219/45031

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US12204252B2

公开(公告)日：2025-01-21

申请号：US18212334

申请日：2023-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud Hubaux ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F1/70 ,  G03F7/00 ,  G06F30/392

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US20230333482A1

公开(公告)日：2023-10-19

申请号：US18212334

申请日：2023-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud HUBAUX ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F7/20 ,  G06F30/392 ,  G03F1/70

CPC classification number: G03F7/70508 ,  G06F30/392 ,  G03F1/70 ,  G03F7/70616 ,  G05B2219/45028 ,  G05B2219/45031

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.