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公开(公告)号：WO2017207512A2
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Abstract translation: 图案形成装置，其包括反射标记，其中所述标记包括：多个反射区域，其被配置为优先反射具有给定波长的辐射; 以及配置为优先吸收具有给定波长的辐射的多个吸收区域; 其中所述吸收和反射区域被布置为当用辐射照射时形成从所述标记反射的图案化的辐射束，并且其中所述反射区域包括粗糙的反射表面，所述粗糙的反射表面被配置为漫射从所述反射区域反射的辐射，以及 其中粗糙化的反射表面具有约为给定波长的八分之一或更多的均方根粗糙度。
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公开(公告)号：WO2017207512A3
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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