-
公开(公告)号：WO2017190905A1
公开(公告)日：2017-11-09
申请号：PCT/EP2017/058057
申请日：2017-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHOORMANS, Carolus, Johannes, Catharina , BASELMANS, Johannes, Jacobus, Matheus , VAN DER PASCH, Engelbertus, Antonius, Fransiscus , VAN DEN HOMBERG, Johannes, Aldegonda, Theodorus, Marie , SLADKOV, Maksym, Yuriiovych , BROUNS, Andreas, Johannes, Antonius , PADIY, Alexander, Viktorovych
Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
Abstract translation: 利用掩模传感器装置测量目标光栅的位置的光刻方法，所述掩模传感器装置包括多个检测器模块，每个检测器模块包括位于光刻设备的投影系统的掩模侧的衍射光栅，以及 相关联的检测器，所述方法包括以下步骤的第一步骤：当所述掩模传感器装置沿着第一方向相对于所述目标光栅移动时，测量从所述目标光栅衍射的衍射级的组合的第一强度; 第二步骤，在第二方向上使掩模传感器装置相对于目标光栅位移，其中相对位移的大小与潜在误差的空间频率成比例; 以及第三步骤，在掩模传感器装置沿着第一方向相对于目标光栅移动时，测量从目标光栅衍射的衍射级的组合的第二强度。
-
公开(公告)号：WO2017207512A2
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Abstract translation: 图案形成装置，其包括反射标记，其中所述标记包括：多个反射区域，其被配置为优先反射具有给定波长的辐射; 以及配置为优先吸收具有给定波长的辐射的多个吸收区域; 其中所述吸收和反射区域被布置为当用辐射照射时形成从所述标记反射的图案化的辐射束，并且其中所述反射区域包括粗糙的反射表面，所述粗糙的反射表面被配置为漫射从所述反射区域反射的辐射，以及 其中粗糙化的反射表面具有约为给定波长的八分之一或更多的均方根粗糙度。
-
公开(公告)号：WO2017207512A3
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
-
-
Search Results
3
records
(took 0.024 seconds)
