公开(公告)号：WO2015049087A1

公开(公告)日：2015-04-09

申请号：PCT/EP2014/068932

申请日：2014-09-05

Applicant: ASML NETHERLANDS B.V.

Inventor： YPMA, Alexander ,  MENGER, Jasper ,  DECKERS, David ,  HAN, David ,  KOOPMAN, Adrianus ,  LYULINA, Irina ,  MIDDLEBROOKS, Scott ,  VAN HAREN, Richard ,  WILDENBERG, Jochem

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70616 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F9/7092 ,  G06F17/30572

Abstract: In a lithographic process product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each wafer. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose the set of said vectors representing the wafers in said multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using said component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract translation: 在光刻工艺中，诸如半导体晶片的产品单元经受光刻图案化操作和化学和物理处理操作。 在执行过程期间分阶段进行对准数据或其他测量，以获得表示在每个晶片上空间分布的点处测量的位置偏差或其他参数的对象数据。 该对象数据用于通过执行多变量分析来获取诊断信息，以将表示所述多维空间中的晶片的所述矢量的集合分解为一个或多个分量向量。 使用所述分量向量提取关于工业过程的诊断信息。 可以基于提取的诊断信息来控制后续产品单元的工业过程的性能。

公开(公告)号：WO2015090721A1

公开(公告)日：2015-06-25

申请号：PCT/EP2014/074003

申请日：2014-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： RHE, Kyu, Kab ,  DECKERS, David ,  SIMONS, Hubertus, Johannes, Gertrudus ,  THEEUWES, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: Disclosed is a method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method comprises measuring an error in said image characteristic of said substrate; and determining corrections for a subsequent formation of the product features based upon the measured error and a characteristic of one or more of said product feature(s).

Abstract translation: 公开了一种使用光刻工艺校正已经形成了一个或多个产品特征的基板的图像特性的方法，以及相关联的检查装置方法。 该方法包括测量所述衬底的所述图像特性中的误差; 以及基于所测量的误差和一个或多个所述产品特征的特征来确定随后形成所述产品特征的校正。