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公开(公告)号:WO2016030255A3
公开(公告)日:2016-03-03
申请号:PCT/EP2015/069062
申请日:2015-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor: BHATTACHARYYA, Kaustuve , VAN BUEL, Henricus, Wilhelmus, Maria , FOUQUET, Christophe, David , SMILDE, Hendrik, Jan, Hidde , VAN DER SCHAAR, Maurits , DEN BOEF, Arie, Jeffrey , VAN HAREN, Richard, Johannes, Franciscus , LIU, Xing Lan , BELTMAN, Johannes, Marcus, Maria , FUCHS, Andreas , ADAM, Omer, Abubaker, Omer , KUBIS, Michael , JAK, Martin, Jacobus, Johan
IPC: G03F7/20
Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer. A method of devising such a measurement target involving locating an assist feature at a periphery of the sub-targets, the assist feature being configured to reduce measured intensity peaks at the periphery of the sub-targets.
Abstract translation: 具有至少第一子目标和至少第二子目标的衍射测量目标,并且其中(1)所述第一和第二子目标均包括一对周期性结构,以及 第一子目标具有与第二子目标不同的设计,包括第一子目标周期性结构的不同设计具有与第二子目标周期性结构不同的间距,特征宽度,空间宽度和/或分段 或(2)第一和第二子目标分别在第一层中包括第一和第二周期性结构,并且第三周期性结构至少部分地位于第一层下的第二层中的第一周期性结构的下方,并且存在 在第二层中的第二周期性结构下方没有周期性结构,并且第四周期性结构至少部分地位于第二层下方的第三层中的第二周期性结构下方。 一种设计这种测量目标的方法涉及在辅助目标的外围定位辅助特征,辅助特征被配置为减少在辅助目标的外围处测量的强度峰值。 p>