Abstract:
Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
Abstract:
Disclosed herein is a computer-implemented method including: determining a first partial image formed from a first radiation portion propagating along a first group of one or more directions, by a lithographic projection apparatus; determining a second partial image formed from a second radiation portion propagating along a second group of one or more directions, by the lithographic projection apparatus; determining an image by incoherently adding the first partial image and the second partial image; wherein the first group of one or more directions and the second group of one or more directions are different.