公开(公告)号：WO2022037921A1

公开(公告)日：2022-02-24

申请号：PCT/EP2021/071359

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04

Abstract: Described herein is a method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.

公开(公告)号：EP4200671A1

公开(公告)日：2023-06-28

申请号：EP21752530.2

申请日：2021-07-29

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04