公开(公告)号：WO2022037921A1

公开(公告)日：2022-02-24

申请号：PCT/EP2021/071359

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04

Abstract: Described herein is a method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.

公开(公告)号：WO2020135988A1

公开(公告)日：2020-07-02

申请号：PCT/EP2019/083585

申请日：2019-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Youping ,  GENIN, Maxime, Philippe, Frederic ,  WU, Cong ,  SU, Jing ,  HU, Weixuan ,  ZOU, Yi

IPC: G03F7/20

Abstract: Described herein are methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method of training a machine learning model of a patterning process involves obtaining a training data set comprising: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; training the machine learning model based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model is further used for determining ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.

公开(公告)号：WO2020064544A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/075326

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Youping ,  HU, Weixuan ,  YAN, Fei ,  PENG, Wei ,  JAIN, Vivek, Kumar

IPC: G03F7/20

Abstract: A method of hot spot ranking for a patterning process. The method includes obtaining (i) a set of hot spots of a patterning process, (ii) measured values of parameters of the patterning process corresponding to the set of hot spots, and (ii) simulated values of the parameters of the patterning process corresponding to the set of hot spots; determining a measurement feedback based on the measured values and the simulated values of the parameters of the patterning process; and determining, via simulation of a process model of the patterning process, a ranking of a hot spot within the set of hot spots, generated by the simulation, based on the measurement feedback.

公开(公告)号：EP4200671A1

公开(公告)日：2023-06-28

申请号：EP21752530.2

申请日：2021-07-29

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04