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    SYSTEMS, PRODUCTS, AND METHODS FOR IMAGE-BASED PATTERN SELECTION
    1.
    发明申请
    SYSTEMS, PRODUCTS, AND METHODS FOR IMAGE-BASED PATTERN SELECTION 审中-公开

    公开(公告)号：WO2022037921A1

    公开(公告)日：2022-02-24

    申请号：PCT/EP2021/071359

    申请日：2021-07-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

    IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04

    Abstract: Described herein is a method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.

    PATTERN SELECTION SYSTEMS AND METHODS
    2.
    发明申请
    PATTERN SELECTION SYSTEMS AND METHODS 审中-公开

    公开(公告)号：WO2023046385A1

    公开(公告)日：2023-03-30

    申请号：PCT/EP2022/073313

    申请日：2022-08-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIU, Meng ,  CHEN, Been-Der ,  SHAO, Debao ,  WUU, Jen-Yi ,  CHEN, Hao ,  HAMOUDA, Ayman ,  CHENG, Jianhua

    IPC: G03F1/36 ,  G03F7/20 ,  G06N3/08 ,  G06N20/00

    Abstract: Selecting an optimized, geometrically diverse subset of clips for a design layout for a semiconductor wafer is described. A complete representation of the design layout is received. A set of representative clips of the design layout is determined such that individual representative clips comprise different combinations of one or more unique patterns of the design layout. A subset of the representative clips is selected based on the one or more unique patterns. The subset of the representative clips is configured to include: (1) each geometrically unique pattern in a minimum number of representative clips; or (2) as many geometrically unique patterns of the design layout as possible in a maximum number of representative clips. The subset of representative clips is provided as training data for training an optical proximity correction or source mask optimization semiconductor process machine learning model, for example.

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